CH417118A - Verfahren zur Herstellung von Tantal oder Niob durch Reduktion von Tantal- oder Niobpentachlorid im Wasserstoff-Plasmastrahl - Google Patents

Verfahren zur Herstellung von Tantal oder Niob durch Reduktion von Tantal- oder Niobpentachlorid im Wasserstoff-Plasmastrahl

Info

Publication number
CH417118A
CH417118A CH1366561A CH1366561A CH417118A CH 417118 A CH417118 A CH 417118A CH 1366561 A CH1366561 A CH 1366561A CH 1366561 A CH1366561 A CH 1366561A CH 417118 A CH417118 A CH 417118A
Authority
CH
Switzerland
Prior art keywords
tantalum
niobium
production
plasma jet
hydrogen plasma
Prior art date
Application number
CH1366561A
Other languages
English (en)
Inventor
Walter Dr Scheller
Claude Dr Beguin
Klaus Dr Schuett
Original Assignee
Ciba Geigy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy filed Critical Ciba Geigy
Priority to CH1366561A priority Critical patent/CH417118A/de
Priority to US239166A priority patent/US3211548A/en
Priority to DEC28480A priority patent/DE1295194B/de
Priority to GB44282/62A priority patent/GB1013340A/en
Publication of CH417118A publication Critical patent/CH417118A/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B34/00—Obtaining refractory metals
    • C22B34/20—Obtaining niobium, tantalum or vanadium
    • C22B34/24—Obtaining niobium or tantalum
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00—Making metallic powder or suspensions thereof
    • B22F9/16—Making metallic powder or suspensions thereof using chemical processes
    • B22F9/18—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B4/00—Electrothermal treatment of ores or metallurgical products for obtaining metals or alloys
    • C22B4/005—Electrothermal treatment of ores or metallurgical products for obtaining metals or alloys using plasma jets
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/08—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal halides
    • C23C16/14—Deposition of only one other metal element
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Geology (AREA)
  • Analytical Chemistry (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Manufacture Of Metal Powder And Suspensions Thereof (AREA)
  • Chemical Vapour Deposition (AREA)
  • Manufacture And Refinement Of Metals (AREA)
CH1366561A 1961-11-23 1961-11-23 Verfahren zur Herstellung von Tantal oder Niob durch Reduktion von Tantal- oder Niobpentachlorid im Wasserstoff-Plasmastrahl CH417118A (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
CH1366561A CH417118A (de) 1961-11-23 1961-11-23 Verfahren zur Herstellung von Tantal oder Niob durch Reduktion von Tantal- oder Niobpentachlorid im Wasserstoff-Plasmastrahl
US239166A US3211548A (en) 1961-11-23 1962-11-21 Process for the production of tantalum or niobium in a hydrogen plasma jet
DEC28480A DE1295194B (de) 1961-11-23 1962-11-22 Verfahren zur Herstellung von Tantal- und/oder Niobmetall durch Reduktion von Tantal- und/oder Niobpentachlorid mit Wasserstoff
GB44282/62A GB1013340A (en) 1961-11-23 1962-11-22 Process for the production of tantalum or niobium pentachloride in a hydrogen plasmajet

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1366561A CH417118A (de) 1961-11-23 1961-11-23 Verfahren zur Herstellung von Tantal oder Niob durch Reduktion von Tantal- oder Niobpentachlorid im Wasserstoff-Plasmastrahl

Publications (1)

Publication Number Publication Date
CH417118A true CH417118A (de) 1966-07-15

Family

ID=4394302

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1366561A CH417118A (de) 1961-11-23 1961-11-23 Verfahren zur Herstellung von Tantal oder Niob durch Reduktion von Tantal- oder Niobpentachlorid im Wasserstoff-Plasmastrahl

Country Status (4)

Country Link
US (1) US3211548A (de)
CH (1) CH417118A (de)
DE (1) DE1295194B (de)
GB (1) GB1013340A (de)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3442690A (en) * 1964-05-13 1969-05-06 Minnesota Mining & Mfg Coating solid particles with refractory metals
CH457868A (de) * 1965-06-25 1968-06-15 Ciba Geigy Verfahren zur Herstellung von feinteiligem, nicht pyrophorem Molybdän, Wolfram und Rhenium
CH458753A (de) * 1965-06-25 1968-06-30 Ciba Geigy Verfahren zur Herstellung von feinteiligen, nicht pyrophoren Metallen der Gruppen IVa, Va und VIa und der Actiniumreihe des Periodensystems
AU415625B2 (en) * 1965-11-02 1971-07-27 Commonwealth Scientific And Industrial Research Organization Production of metals from their halides
US3366090A (en) * 1966-04-07 1968-01-30 Air Force Usa Glow discharge vapor deposition apparatus
US3533756A (en) * 1966-11-15 1970-10-13 Hercules Inc Solids arc reactor method
US3906892A (en) * 1971-04-27 1975-09-23 Cit Alcatel Plasma deposition of thin layers of substrated or the like
US3810637A (en) * 1972-01-14 1974-05-14 Mecanique Ind Int Shaft packing
US3814447A (en) * 1972-11-02 1974-06-04 Ramsey Corp Sealing element for use in internal combustion engines
FR2236963B1 (de) * 1973-07-13 1977-02-18 Cit Alcatel
US3974245A (en) * 1973-12-17 1976-08-10 Gte Sylvania Incorporated Process for producing free flowing powder and product
DE2516747A1 (de) * 1975-04-16 1976-10-28 Battelle Institut E V Verfahren zur herstellung von duktilen und eigenstabilen supraleitenden werkstoffen
US4356029A (en) * 1981-12-23 1982-10-26 Westinghouse Electric Corp. Titanium product collection in a plasma reactor
JPS58171502A (ja) * 1982-04-02 1983-10-08 Toyota Motor Corp セラミック―金属複合微粉末体の製造方法
US4410358A (en) * 1982-12-13 1983-10-18 Thermo Electron Corporation Plasma recovery of tin from smelter dust
AT378539B (de) * 1983-08-18 1985-08-26 Voest Alpine Ag Verfahren zur herstellung von metallen oder metallegierungen sowie vorrichtung zur durchfuehrung des verfahrens
US5100463A (en) * 1990-07-19 1992-03-31 Axel Johnson Metals, Inc. Method of operating an electron beam furnace
US5222547A (en) * 1990-07-19 1993-06-29 Axel Johnson Metals, Inc. Intermediate pressure electron beam furnace
US6821500B2 (en) 1995-03-14 2004-11-23 Bechtel Bwxt Idaho, Llc Thermal synthesis apparatus and process
US5749937A (en) * 1995-03-14 1998-05-12 Lockheed Idaho Technologies Company Fast quench reactor and method
US7576296B2 (en) * 1995-03-14 2009-08-18 Battelle Energy Alliance, Llc Thermal synthesis apparatus
AU2906401A (en) * 1999-12-21 2001-07-03 Bechtel Bwxt Idaho, Llc Hydrogen and elemental carbon production from natural gas and other hydrocarbons
US7354561B2 (en) * 2004-11-17 2008-04-08 Battelle Energy Alliance, Llc Chemical reactor and method for chemically converting a first material into a second material
US7399335B2 (en) * 2005-03-22 2008-07-15 H.C. Starck Inc. Method of preparing primary refractory metal
US8591821B2 (en) * 2009-04-23 2013-11-26 Battelle Energy Alliance, Llc Combustion flame-plasma hybrid reactor systems, and chemical reactant sources
WO2013006600A1 (en) 2011-07-05 2013-01-10 Orchard Material Technology, Llc Retrieval of high value refractory metals from alloys and mixtures

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2761776A (en) * 1956-03-29 1956-09-04 Bichowsky Foord Von Process for the manufacture of particulate metallic niobium

Also Published As

Publication number Publication date
DE1295194B (de) 1969-05-14
GB1013340A (en) 1965-12-15
US3211548A (en) 1965-10-12

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