CH408223A - Method for manufacturing a semiconductor device - Google Patents

Method for manufacturing a semiconductor device

Info

Publication number
CH408223A
CH408223A CH554164A CH554164A CH408223A CH 408223 A CH408223 A CH 408223A CH 554164 A CH554164 A CH 554164A CH 554164 A CH554164 A CH 554164A CH 408223 A CH408223 A CH 408223A
Authority
CH
Switzerland
Prior art keywords
manufacturing
semiconductor device
semiconductor
Prior art date
Application number
CH554164A
Other languages
German (de)
Inventor
Karl Dr Siebertz
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of CH408223A publication Critical patent/CH408223A/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/042Coating on selected surface areas, e.g. using masks using masks
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/482Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Physical Vapour Deposition (AREA)
  • Bipolar Transistors (AREA)
CH554164A 1963-08-28 1964-04-28 Method for manufacturing a semiconductor device CH408223A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DES0086952 1963-08-28

Publications (1)

Publication Number Publication Date
CH408223A true CH408223A (en) 1966-02-28

Family

ID=7513395

Family Applications (1)

Application Number Title Priority Date Filing Date
CH554164A CH408223A (en) 1963-08-28 1964-04-28 Method for manufacturing a semiconductor device

Country Status (5)

Country Link
CH (1) CH408223A (en)
DE (1) DE1439280A1 (en)
FR (1) FR1405134A (en)
GB (1) GB1010984A (en)
NL (1) NL6407702A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4536419A (en) * 1983-03-10 1985-08-20 Hitachi, Ltd. Method for forming tapered films
DE3374790D1 (en) * 1983-03-11 1988-01-14 Hitachi Ltd Method for forming thin films
DE102006024175B3 (en) * 2006-05-23 2007-09-27 Touchtek Corporation, Chunan Light emitting diode primary multi-layer electrodes manufacturing method for e.g. backlight, involves masking epitaxial substrate with magnetizable mask that is hold by magnet, where magnetizable mask has contact windows

Also Published As

Publication number Publication date
FR1405134A (en) 1965-07-02
GB1010984A (en) 1965-11-24
DE1439280A1 (en) 1968-11-14
NL6407702A (en) 1965-03-01

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