CA860872A - Production of super-purity nickel powder - Google Patents

Production of super-purity nickel powder

Info

Publication number
CA860872A
CA860872A CA860872A CA860872DA CA860872A CA 860872 A CA860872 A CA 860872A CA 860872 A CA860872 A CA 860872A CA 860872D A CA860872D A CA 860872DA CA 860872 A CA860872 A CA 860872A
Authority
CA
Canada
Prior art keywords
super
production
nickel powder
purity nickel
purity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA860872A
Inventor
Zubryckyj Nicolas
Kunda Wasyl
J. I. Evans David
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Viridian Inc Canada
Original Assignee
Sherritt Gordon Mines Ltd
Publication date
Application granted granted Critical
Publication of CA860872A publication Critical patent/CA860872A/en
Expired legal-status Critical Current

Links

CA860872A Production of super-purity nickel powder Expired CA860872A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CA860872T

Publications (1)

Publication Number Publication Date
CA860872A true CA860872A (en) 1971-01-12

Family

ID=36346294

Family Applications (1)

Application Number Title Priority Date Filing Date
CA860872A Expired CA860872A (en) Production of super-purity nickel powder

Country Status (1)

Country Link
CA (1) CA860872A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7435325B2 (en) 2001-08-01 2008-10-14 Nippon Mining & Metals Co., Ltd Method for producing high purity nickle, high purity nickle, sputtering target comprising the high purity nickel, and thin film formed by using said spattering target

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7435325B2 (en) 2001-08-01 2008-10-14 Nippon Mining & Metals Co., Ltd Method for producing high purity nickle, high purity nickle, sputtering target comprising the high purity nickel, and thin film formed by using said spattering target

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