CA2566854A1 - Abrasive material and method of forming same - Google Patents

Abrasive material and method of forming same Download PDF

Info

Publication number
CA2566854A1
CA2566854A1 CA002566854A CA2566854A CA2566854A1 CA 2566854 A1 CA2566854 A1 CA 2566854A1 CA 002566854 A CA002566854 A CA 002566854A CA 2566854 A CA2566854 A CA 2566854A CA 2566854 A1 CA2566854 A1 CA 2566854A1
Authority
CA
Canada
Prior art keywords
protrusions
base
photoresist
pyramidal
abrasive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
CA002566854A
Other languages
French (fr)
Inventor
Anthony David Pollasky
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of CA2566854A1 publication Critical patent/CA2566854A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B24D11/001Manufacture of flexible abrasive materials
    • B24D11/003Manufacture of flexible abrasive materials without embedded abrasive particles
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/14Anti-slip materials; Abrasives
    • C09K3/1409Abrasive particles per se

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

The present invention provides an abrasive material comprising a base surface having a plurality of pyramidal shapes protruding therefrom the base surface and the protrusions being formed of the same material, each protrusion having a substantially triangular, square, or polygonal base and triangular sides which meet at an apex which substantially forms a point. The pyramidal shapes have apexes in at least two distinct planes with a portion of the pyramidal shapes extending further from the base surface than others, with the apexes of the protrusions providing intermixing cutting and planning edges in a pattern such that the material is capable of abrading independent of direction of use.

Description

ABRASIVE MATERIAL AND METHOD OF FORMING SAME

[0001] FIELD OF THE INVENTION
[0002] The present invention relates to an abrasive material produced by an etching process and suitable for sanding or smoothing a variety of surfaces and to a method of forming the abrasive material.
[0003] BACKGROUND OF THE INVENTION
[0004] Various abrading surfaces have been suggested over the years. Such surfaces include those wherein abrasive particles such as gamet, aluminum oxide, silicon carbide, grit of zirconia and alpha aluminum oxide monohydrate, single crystals of diamond or cubic boron nitride are adhered to a substrate.
Also known are abrasive surfaces which are scored to provide grooves or punched to provide holes or openings with projections or burs surrounding the holes. Where grooves have been formed in metal sheets such as steel sheets, coating the surface or the cutting edge formed by the groove are also known. Metal abrasive sheets are known which are prepared by forming a cured polyvinylchloride negative master using a sheet of sandpaper and, then, electroplating the master to form the sheet.
[0005] Etching processes using a suitable resist to form a desired pattern in a metal substrate are also known. In one such technique, a resist pattern is applied to a thin flat steel plate in a predetermined pattern such as equal sized spots which can be round, elongate or polygonal. The plate is etched with an etchant such as an aqueous solution of ferric chloride to remove the desired amount of metal and form the pattern elements. It is reported that through variations of spraying mode, composition and temperature of the etching solution, the angle between the side of the protruding cutting elements and the original plate surface, as I well as how far under the edge of the protecting pattern elements the etching will reach. One improvement suggested is to provide parallel ridges on the etched side of the plate in the form of rhombic quadrangles either tangentially or helically to prevent the plate from curling.
[0006] Another improvement suggested is a resist pattem which is reported to give an even intermixing of fast working sharp points with smooth planing edges. The cutting teeth are formed in the shape of triangles or squares which come out of the etch process still sharp and usable due to the resist pattern which accentuates the corner points and eliminates under cutting of the upper surfaces of the cutting teeth. Each tooth bears an upper flat surface and is amenable to hardening by heat treating without excessive brittleness due to the tooth configuration. The upper flat surface of each tooth is reported to be typically about 3 mils with the width of the base and the height of the tooth being about twice that of the upper flat surface.
[0006] A process for producing cutting dies, particularly for use such as, for example, cutting adhesive tape to form labels, has been disclosed wherein multiple etching steps are used. A resist corresponding to the contour of a label to be propertied is formed on a steel plate and a first etching step is carried out, thereby forming a convex portion of a prescribed height. A
second etching step is carried out whereby the resist extending from both sides of the top of the convex portion is removed and the steel plate is subjected to further etching. This second etching step may be carried out multiple times. The resist remaining on the top of the convex portion is then removed.
[0007] A metal abrasive has been described having substantially uniform pyramidal protrusions extending from a base surface which is formed by etching of metal sheet material.

SUMMARY OF THE INVENTION
[0008] The present invention, in one aspect, provides an abrasive material comprising a base surface having a plurality of pyramidal shapes protruding therefrom, the base surface and the protrusions being formed of the same material, each protrusion having a substantially triangular, square, or polygonal base and triangular sides which meet at an apex which substantially forms a point, the pyramidal shapes having apexes in at least two distinct planes with a portion of the pyramidal shapes extending further from the base surface than others, with the apexes of the protrusions providing intermixing cutting and planing edges in a pattern such that the material is capable of abrading independent of direction of use.
[0009] The apexes of the pyramidal shapes extending a lesser distance from the base surface retaining their apexes which substantially form points after a period of use during which the pyramidal shapes extending a further distance from the base material may have their apexes worn to less than substantially a point. This retention of the apexes of those pyramidal shapes extending a lesser distance from the base material provides the abrasive material with greater length of service life and effectiveness.
[0010] Preferably, the pyramidal shapes extending a lesser distance from the base material, extend at least about ten percent less, more preferably at least about twenty percent less, most preferably at least about thirty percent less, than those of the pyramidal shapes extending a further distance from the base material.
[0011] The pyramidal shapes of an abrasive material of the invention may be the same or different in shape. For example, various pyramidal shapes may have different bases configurations, i.e., different numbers of sides, and/or different degrees of slope.
[0012] Optional performance enhancing surface treatments may be applied to the protrusions and/or the base surface to improve abrasive performance, aid in non-loading characteristics due to the lubricity of certain coatings, and reduce surface porosity.
[0013] Preferably, the triangular sides of the pyramidal protrusions have an inward arcuate slope. Such a slope provides greater longevity of the abrasive material due to lack of loading of material being abraded. The present invention provides rapid material removal from a workpiece, yet leaves a smooth surface on the workpiece.
[0014] The abrasive material of the invention can be provided with protrusions on both surfaces of the base material to prevent curling when the material is thin. Alternatively, to prevent curling of thin materials, i.e., relieve internal stress or tension, protrusions can be provided on one surface and the opposing surface can simply be etched.
[0015] The present invention, in a further aspect, provides a method of forming an abrasive material comprising the steps of:
(a) providing a base material;
(b) applying to at least one surface of the base material a photoresist coating;
(c) placing over the photoresist a mask having a randomly directional triangular, square or polygonal pattem thereon, the individual elements forming the pattern having at least two different surface areas;
(d) curing the photoresist not covered by the mask;
(e) removing said mask and unexposed photoresist;
(f) applying an etchant suitable for etching the base material for a time sufficient to provide a plurality of pyramidal protrusions on the base surface, each protrusion having a substantially triangular, square or polygonal base and triangular sides which meet at an apex which substantially forms a point, the pyramidal shapes having apexes in at least two distinct planes with a portion of the pyramidal shapes extending further from the base surface than others.
[0016] The surface of the protrusions and the base surface can optionally be provided with performance enhancing coatings or treatments to improve abrasive performance, aid in non-loading characteristics due to the lubricity of certain coatings, and reduce surface porosity. Plating can be used to provide such enhanced surfaces. The surface can be heat treated or metallurically altered to form a thin harder layer on the surface of the base surface and protrusions to improve hardness as is well known to those skilled in the art.
Other performance enhancing treatments such as, for example, diamond surface treatments can be useful. A particularly useful diamond surface treatment using laser technology is described in U.S. Patent No. 5,620,754.

BRIEF DESCRIPTION OF THE DRAWINGS
[0017] FIGS. 1A, 1 B, and 1 C are perspective views of pyramidal protrusions useful in the invention.
[0018] FIG. 2 is a perspective view of a preferred pyramidal protrusion of the invention having inward arcuate triangular sides.
[0019] FIG. 3 is a top view showing a preferred pyramidal protrusion of the invention having inward arcuate triangular sides.
[0020] FIG. 4A is a top view of a photoresist mask suitable for use in producing an abrasive material of the invention.
[0021] FIG. 4B is a top view of another photoresist mask suitable for use in producing an abrasive material of the invention.
[0022] FIG. 4C is a top view of another photoresist mask suitable for use in producing an abrasive material of the invention.
[0023] FIG. 5 is side view of a pyramidal protrusion useful in the invention having a performance enhancing coating thereon.
[0024] FIG. 6 is a fragmented cross-section of an abrasive material of the present invention having pyramidal protrusions on each surface thereof.
DETAILED DESCRIPTION OF THE INVENTION
[0025] The abrasive material of the invention can be formed from any material susceptible to etching including, for example, stainless steel, carbon steel, aluminum alloys, iron-nickel-chrome alloys, and titanium; boron-filled elastomers, silica composites, fluorocarbon materials, graphite alloys, plastics, and the like.
[0026] Stainless steel is a particularly preferred base material in the present invention due to the intrinsic resistance of the material to corrosion, the good high and excellent low temperature strength and toughness over a broad range of temperatures, the non-magnetic properties of austenitic grades, and aesthetic appeal. Stainless steel can also be readily reproducibly etched to form the abrasive material of the invention.
(0027] The thickness of the material is not particularly limited, but after etching should be suitably flexible where it will be used over a roller or suitably stiff when used as a flat abrasive. Of course, stiffness can be provided, if necessary, by attachment to a stiff substrate such as, for example, a metal plate or synthetic resin plate having suitable stiffness.
[0028] Typical surface treatments particularly preferred for stainless steel base material include, but are not limited to, nickel or chrome plating or diamond coating or plating in combination with diamond dust or boron nitride.

The base and pyramidal protrusions can be exposed to heat treatment or metallurical alteration, e.g., case hardening, to effect, for example, surface hardness by forming a thin harder layer on the base surface and protrusions to improve performance.
[0029] With respect to the drawings, like references number will be used with reference to like parts. FIGS. 1A, 1 B, and 1 C depict various possible embodiments of the pyramidal protrusions of the abrading material of the invention with the bases of the pyramidal protrusions being triangular, square and pentagonal, respectively. Of course, other polygonal shapes can be used. In FIG. 1A, protrusion 10a is shown having triangular base 12a, triangular side 14a, and apex 16a. In FIG. 1 B, protrusion 10b is shown having square base 12b, triangular side 14b and apex 16 b. In FIG. 1 C, protrusion 10c is shown having polygonal base 12c, triangular side 14c and apex 16c.
[0030] The apex of each protrusion need not form a true point as shown in the FIGS., although this is the preferred configuration. The apexes of the protrusions may be slightly rounded or flat. However, this portion of the apexes should preferably be no greater in width than 20 percent of edges L, more preferably no more than 10 percent of edges L, edges L being shown in FIG. 5.
[0031] The depth of the inward arcuate slope on the triangular sides of the pyramidal protrusions which are found in the preferred embodiments of the invention can be from very slight, e.g., 1 m, to as great as about 175 m.
Such actuate slopes can readily be seen in FIGS. 2 and 3 wherein protrusion 20 has actuate sloped surfaces 22. The greater the size of the protrusions, the deeper the inward actuate slope can be formed.
[0032] Preferably, the height H of the pyramidal protrusions from the etched surface can be in the range of about 25 m to 1.5 mm, with higher pyramidal protrusions for normal coarse abrading, i.e., from about 125 m to 375 m, and lower pyramidal protrusions for finer abrading, i.e., from about 75 m to 125 m. The length of the edges L of the base is dependent on the height of the protrusions. Preferably, the ratio of the height of the protrusions from the etched surface to the length of the edge of the base is in the range of about 1:1 to 1:5, more preferably about 1:2 to 1:4, most preferably about 1:3. The thickness of the remaining base material B can vary widely and is not critical, with thinner base materials being used for more flexible abrasive materials and thicker base materials being used for stiffer abrasive materials as is well known to those skilled in the art. Such dimensions are indicated in the enlarged view of a portion of a hard coated abrasive material, seen in cross-section in FIG. 5.
[0033] The spacing S of the pyramidal protrusions can also vary widely, from about 0.75 mm to 30 mm apart, as measured from center to center of the pyramidal protrusions, with greater spacing for coarse abrading, i.e., 2 to 10 mm or more apart and less spacing for finer abrading, i.e., from about 0.75 to 1.5 mm apart.
[0034] The fineness or coarseness of the abrasive material can also be adjusted by maintaining the height of the protrusions and the length of the base of the protrusions and adjusting the size of the resist pattern. Greater spacing between the protrusions provides coarser abrading material, while lesser spacing between the protrusions provides finer abrading material.
[0035] A photoresist mask suitable for a fine abrasive grit is shown in FIG.
4A. A photoresist mask suitable for a medium abrasive grit is shown in FIG.
4B while that shown in FIG. 4C is suitable for producing coarse grit.
[0036] It is important that the pyramidal protrusions be oriented such that the cutting edges of the individual protrusions are oriented in different directions to provide the capability of abrading independent of direction of use. The pyramidal protrusions can be randomly oriented in various directions such as by designing the etching mask through the use of a computer-based random generator or an etching mask can be patterned which ensures random orientation as is well known to those skilled in the art. Examples of randomly oriented patterns are shown in FIGS. 4A, 4B, and 4C
[0037] As previously described, a coating such as nickel or chrome plating; a diamond coating; or nickel or chrome plating in combination with diamond dust or Teflon , tungsten, carbide or boron nitride particles can be applied to the surface of the abrasive material such as is shown in FIG. 5, wherein a portion of abrasive material 59 has protrusion 52, remaining base material 54, and coating 56.
[0038] The etching process can be carried out using well-known resist and etching materials and processes. Prior to application of the photoresist to the base material, cleaning of the base material is preferably carried out. Where the base material is stainless steel, such cleaning may involve rinsing with deionized water and drying. Alternatively, or in addition to such rinsing, the stainless steel surface may also be subjected to a pumice scrub or passivation treatment. Passivation which removes free iron contaminants, if present, as well as other contaminants is generally carried out with the use of solutions of ferric chloride, nitric acid or other solutions know to those skilled in the art.
[0039] The resist coating can be applied using, for example, hot roll lamination, screen printing, gravure printing, dip coating and the like. When a resist is applied in the form of a polymeric film to a stainless steel base material, the base material is preferably pre-heated and the film is applied using sufficient heat and pressure to ensure good adhesion. Curing of the resist must be avoided at this point in the process.
[0040] The mask which is used to provide the desired abrasive pattern surface is then placed on the resist covered base material. Good, i.e., intimate, contact between the resist coating and the mask is needed to achieve the desired pattern on the base material when the photoresist not covered by the mask is cured. Such contact can be enhanced by use of vacuum techniques.
[0041] Curing, or imaging, is achieved by exposure to light sufficient to cure, i.e., cross-link, the polymeric resist. The mask is then removed from the base material/photoresist/mask composite and the uncured, photoresist is removed from the base material using a developing solution, or developer. The selection of the developer is dependent on the composition of the photoresist.
If desired, the photoresist then remaining on the base material may be imaged again prior to etching to further ensure good adhesion of the photoresist to the base material during etching.
[0042] Etching is then performed on those portions of the base material not protected by the photoresist. For example, when the substrate is stainless steel, carbon steel, or the like, suitable etchants include ferric chloride, hydrochloric acid, nitric acid, mixtures of these acids and sodium hydroxide;
for aluminum or aluminum alloys, suitable etchants include sodium hydroxide;
for titanium, suitable etchants include hydrofluoric acid; and plastics are generally etchable using various acids. The degree of etching can be adjusted by altering the concentration and temperature of the etchant solution and the method of application as is known to those skilled in the art. For example, when the base material, or substrate, is stainless steel, an aqueous ferric chloride solution of about 370 to 42 Baume can be used, the lower the of the solution, generally the more arcuate the slope of the sides of the protrusions.
[0043] After etching, any remaining photoresist may optionally be removed by techniques well known to those skilled in the art. In some cases with certain mask patterns and etching parameters, much of the photoresist is removed in the etching process. Removal of remaining photoresist is generally preferable, particularly when the pyramidal protrusions are to be plated and the photoresist may act as a plating resist.
[0044] Alternatively, the resist can be retained on the surface of the resultant abrasive material, particularly on the non-abrasive side of the material when only one side is masked and pattern etched, which aids in prevention of curling. A suitable method of preventing curling involves etching both surfaces of the base material as shown in FIG. 6, wherein abrasive material 60 has protrusions 62a, 62b on each surface 61, 63 extending from the remaining base material 64.
[0045] Objects and advantages of this invention are further illustrated by the following examples, but the particular materials and amounts thereof recited in these examples, as well as other conditions and details, should not be construed to unduly limit this invention. All parts and percentages are by weight unless otherwise indicated.

EXAMPLES
[0046] Example 1 [0047] A sheet of 301 high tensile stainless steel having a thickness of about 0.02000 inch was cleaned using a pumice scrub and passivated for 30 seconds with a 40 Baum6 solution of ferric chloride. A 0.0013 inch thick photoresist film, Type EM213, available from DuPont Co., was adhered to the passivated stainless steel and a mask having a pattern like that shown in FIG. 4C was applied over the photoresist.
[0048] The stainless steel/photoresist/mask composite was exposed to 60 millijoules of light to effect initial imaging of the photoresist. The uncrosslinked photoresist was removed by rinsing with a developer solution of 1% aqueous potassium carbonate at pH 10.5. The stainless steel having the photoresist pattern thereon was re-exposed to 100 millijoules light to ensure adherence of the photoresist to the stainless steel during etching.
[0049] The stainless steel was etched to a depth of about 0.011 inches using a 40 Baume ferric chloride solution. The resutting etched sheet was rinsed with water and remaining photoresist was. removed using a't5-% potassium hydroxide aqueous stripping solution.
[0050] The pyramidal protrusions had a triangular base. The height of the, protrusions whose apexes were the greatest distance from the base material was about 0.004: The resutting sheet performecf exceEtentty in a manner similar to a coarse grit sandpaper, but without loading problems typical with sandpaper.
[0051] Example 2 [0052] A sheet of 302 full hard stainless steel having a thickness of about 0.006 inch, available from Ulbrich of Catifornia. was cteaned using apumice scrub and passivated for 30 seconds with a 40 BaumL& solution of ferric chloride as in Example 1. A photoresist film was adhered to the passivated.
stainless steel and a mask having a pattem like that shown in FIG. 4A was applied over the photoresist. The. staihiess steel was etchecf to a depth of about 0.0040 0.0005 inches using a 40 Baume ferric chloride solution over a period of about 4 minutes. The nrsuiting etched sheet was rinsed with water a~d remaining photoresist was removed using a 15% potassium hydroxide aqueous stripping sotution.
[0053] The pyramidal protrusions had a triangular base. The height of the pnotru.sions whose apexes were the greatest distance from the base materiat was about 0.004 inch. The resulting abrasive material performed in a manner similar to fine sandpaper but significantly more efficiently and with greater longevity than standard sandpaper.
[0054] Example 3 [0055] ] A sheet of 301 high tensile stainless steel having a thickness of about 0.013 inch was cleaned using a pumice scrub and passivated for 30 seconds with an acid solution of ferric chloride. A 0.0015 inch thick photoresist film, Type E1215, available from McDermid, was adhered to the passivated stainless steel and a mask having a pattern like that shown in FIG. 4C was applied over the photoresist. The stainless steeUphotoresist/mask composite was imaged as in Example 1.
[0055] The stainless steel was etched to a depth of about 0.008 inches using a 40 Baume ferric chloride solution. The resulting etched sheet was rinsed with water and remaining photoresist was removed using a 15% potassium hydroxide aqueous stripping solution.
[0056] The pyramidal protrusions had a triangular base. The height of the protrusions whose apexes were the greatest distance from the base material was about 0.007. The resulting sheet performed excellently in a manner similar to a coarse grit sandpaper, but without loading problems typical with sandpaper.
[0057] Example 4 [0058] A sheet of 304 full hard stainless steel having a thickness of about 0.010 inch was cleaned as in Example 3. A photoresist film was adhered to the passivated stainless steel and a mask having a pattern like that shown in FIG. 4A was applied over the photoresist. The stainless steel was etched to a depth of about 0.0050 inch using a 40 Baume ferric chloride solution over a period of about 4 minutes. The resulting etched sheet was rinsed with water and a 15% potassium hydroxide aqueous stripping solution.
[0059] The pyramidal protrusions had a triangular base. The height of the protrusions whose apexes were the greatest distance from the base material was about 0.005 inch. The resulting abrasive material performed in a manner similar to fine sandpaper but significantly more efficiently and with greater longevity than standard sandpaper.
[0060] Various modifications and alterations of this invention will become apparent to those skilled in the art without departing from the scope and spirit of this invention, and it should be understood that this invention is not to be unduly limited to the illustrative embodiments set forth herein.

Claims

What is claimed is:
1. An abrasive material comprising a base surface having a plurality of pyramidal shapes protruding therefrom, the base surface and the protrusions being formed of the same material, each protrusion having a substantially triangular, square, or polygonal base and triangular sides which meet at an apex which substantially forms a point, the pyramidal shapes having apexes in at least two distinct planes with a portion of the pyramidal shapes extending further from the base surface than others, with the apexes of the protrusions providing intermixing cutting and planning edges in a pattern such that the material is capable of abrading independent of direction of use.
CA002566854A 2004-05-17 2005-05-17 Abrasive material and method of forming same Abandoned CA2566854A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/847,902 2004-05-17
US10/847,902 US20050255801A1 (en) 2004-05-17 2004-05-17 Abrasive material and method of forming same
PCT/US2005/017998 WO2005113197A2 (en) 2004-05-17 2005-05-17 Abrasive material and method of forming same

Publications (1)

Publication Number Publication Date
CA2566854A1 true CA2566854A1 (en) 2005-12-01

Family

ID=35310036

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002566854A Abandoned CA2566854A1 (en) 2004-05-17 2005-05-17 Abrasive material and method of forming same

Country Status (6)

Country Link
US (1) US20050255801A1 (en)
EP (1) EP1750903A4 (en)
JP (1) JP2007537892A (en)
CN (1) CN100577364C (en)
CA (1) CA2566854A1 (en)
WO (1) WO2005113197A2 (en)

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8080073B2 (en) * 2007-12-20 2011-12-20 3M Innovative Properties Company Abrasive article having a plurality of precisely-shaped abrasive composites
US20110081830A1 (en) * 2009-10-07 2011-04-07 Anthony David Pollasky Method for finishing and fitting dental restorations and an abrasive material for doing same
US20110081835A1 (en) * 2009-10-07 2011-04-07 Anthony David Pollasky Method for making polished gemstones and an abrasive material for doing same
KR101849797B1 (en) * 2010-04-27 2018-04-17 쓰리엠 이노베이티브 프로퍼티즈 컴파니 Ceramic shaped abrasive particles, methods of making the same, and abrasive articles containing the same
US8758461B2 (en) 2010-12-31 2014-06-24 Saint-Gobain Ceramics & Plastics, Inc. Abrasive particles having particular shapes and methods of forming such particles
US8986409B2 (en) 2011-06-30 2015-03-24 Saint-Gobain Ceramics & Plastics, Inc. Abrasive articles including abrasive particles of silicon nitride
US8840694B2 (en) 2011-06-30 2014-09-23 Saint-Gobain Ceramics & Plastics, Inc. Liquid phase sintered silicon carbide abrasive particles
EP2760639B1 (en) 2011-09-26 2021-01-13 Saint-Gobain Ceramics & Plastics, Inc. Abrasive articles including abrasive particulate materials, coated abrasives using the abrasive particulate materials and methods of forming
WO2013102170A1 (en) 2011-12-30 2013-07-04 Saint-Gobain Ceramics & Plastics, Inc. Composite shaped abrasive particles and method of forming same
WO2013102177A1 (en) 2011-12-30 2013-07-04 Saint-Gobain Ceramics & Plastics, Inc. Shaped abrasive particle and method of forming same
WO2013106602A1 (en) 2012-01-10 2013-07-18 Saint-Gobain Ceramics & Plastics, Inc. Abrasive particles having particular shapes and methods of forming such particles
BR112014017050B1 (en) 2012-01-10 2021-05-11 Saint-Gobain Ceramics & Plastics, Inc. molded abrasive particle
US9242346B2 (en) 2012-03-30 2016-01-26 Saint-Gobain Abrasives, Inc. Abrasive products having fibrillated fibers
CN110013795A (en) 2012-05-23 2019-07-16 圣戈本陶瓷及塑料股份有限公司 Shape abrasive grain and forming method thereof
EP2866977B8 (en) 2012-06-29 2023-01-18 Saint-Gobain Ceramics & Plastics, Inc. Abrasive particles having particular shapes and methods of forming such particles
CA2887561C (en) 2012-10-15 2019-01-15 Saint-Gobain Abrasives, Inc. Abrasive particles having particular shapes and methods of forming such particles
JP2016503731A (en) 2012-12-31 2016-02-08 サン−ゴバン セラミックス アンド プラスティクス,インコーポレイティド Particulate material and method for forming the same
CA2907372C (en) 2013-03-29 2017-12-12 Saint-Gobain Abrasives, Inc. Abrasive particles having particular shapes and methods of forming such particles
TW201502263A (en) 2013-06-28 2015-01-16 Saint Gobain Ceramics Abrasive article including shaped abrasive particles
MX2016004000A (en) 2013-09-30 2016-06-02 Saint Gobain Ceramics Shaped abrasive particles and methods of forming same.
EP2941354B1 (en) 2013-12-19 2017-03-22 Klingspor AG Abrasive particles and abrasion means with high abrasive power
KR102081045B1 (en) 2013-12-31 2020-02-26 생-고뱅 어브레이시브즈, 인코포레이티드 Abrasive article including shaped abrasive particles
US9771507B2 (en) 2014-01-31 2017-09-26 Saint-Gobain Ceramics & Plastics, Inc. Shaped abrasive particle including dopant material and method of forming same
JP6321209B2 (en) 2014-04-14 2018-05-09 サン−ゴバン セラミックス アンド プラスティクス,インコーポレイティド Abrasive articles containing shaped abrasive particles
CA2945493C (en) 2014-04-14 2020-08-04 Saint-Gobain Ceramics & Plastics, Inc. Abrasive article including shaped abrasive particles
US9902045B2 (en) 2014-05-30 2018-02-27 Saint-Gobain Abrasives, Inc. Method of using an abrasive article including shaped abrasive particles
WO2015192829A1 (en) * 2014-06-18 2015-12-23 Klingspor Ag Multilayer grinding particle
US9914864B2 (en) 2014-12-23 2018-03-13 Saint-Gobain Ceramics & Plastics, Inc. Shaped abrasive particles and method of forming same
US9707529B2 (en) 2014-12-23 2017-07-18 Saint-Gobain Ceramics & Plastics, Inc. Composite shaped abrasive particles and method of forming same
US9676981B2 (en) 2014-12-24 2017-06-13 Saint-Gobain Ceramics & Plastics, Inc. Shaped abrasive particle fractions and method of forming same
US10196551B2 (en) 2015-03-31 2019-02-05 Saint-Gobain Abrasives, Inc. Fixed abrasive articles and methods of forming same
TWI634200B (en) 2015-03-31 2018-09-01 聖高拜磨料有限公司 Fixed abrasive articles and methods of forming same
JP2018516767A (en) 2015-06-11 2018-06-28 サン−ゴバン セラミックス アンド プラスティクス,インコーポレイティド Abrasive articles containing shaped abrasive particles
EP3455321B1 (en) 2016-05-10 2022-04-20 Saint-Gobain Ceramics&Plastics, Inc. Methods of forming abrasive particles
KR102422875B1 (en) 2016-05-10 2022-07-21 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 Abrasive particles and methods of forming same
US11230653B2 (en) 2016-09-29 2022-01-25 Saint-Gobain Abrasives, Inc. Fixed abrasive articles and methods of forming same
US10759024B2 (en) 2017-01-31 2020-09-01 Saint-Gobain Ceramics & Plastics, Inc. Abrasive article including shaped abrasive particles
US10563105B2 (en) 2017-01-31 2020-02-18 Saint-Gobain Ceramics & Plastics, Inc. Abrasive article including shaped abrasive particles
EP3642293A4 (en) 2017-06-21 2021-03-17 Saint-Gobain Ceramics&Plastics, Inc. Particulate materials and methods of forming same
DE102018222444A1 (en) 2018-12-20 2020-06-25 Robert Bosch Gmbh Shaped ceramic abrasive grain and process for producing a shaped ceramic abrasive grain
CN114867582A (en) 2019-12-27 2022-08-05 圣戈本陶瓷及塑料股份有限公司 Abrasive article and method of forming the same

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5489235A (en) * 1993-09-13 1996-02-06 Minnesota Mining And Manufacturing Company Abrasive article and method of making same
JPH11501439A (en) * 1995-03-02 1999-02-02 ミネソタ・マイニング・アンド・マニュファクチャリング・カンパニー Method for texturing a support using a structured abrasive article
US5888119A (en) * 1997-03-07 1999-03-30 Minnesota Mining And Manufacturing Company Method for providing a clear surface finish on glass
BR9904869A (en) * 1998-02-27 2000-09-26 Anthony David Pollasky Abrasive material, abrasive article and process for forming an abrasive material
US6773475B2 (en) * 1999-12-21 2004-08-10 3M Innovative Properties Company Abrasive material having abrasive layer of three-dimensional structure
US6776699B2 (en) * 2000-08-14 2004-08-17 3M Innovative Properties Company Abrasive pad for CMP
US6821189B1 (en) * 2000-10-13 2004-11-23 3M Innovative Properties Company Abrasive article comprising a structured diamond-like carbon coating and method of using same to mechanically treat a substrate

Also Published As

Publication number Publication date
CN100577364C (en) 2010-01-06
WO2005113197A3 (en) 2006-04-27
JP2007537892A (en) 2007-12-27
EP1750903A2 (en) 2007-02-14
CN101142057A (en) 2008-03-12
US20050255801A1 (en) 2005-11-17
EP1750903A4 (en) 2010-10-13
WO2005113197A2 (en) 2005-12-01

Similar Documents

Publication Publication Date Title
US20050255801A1 (en) Abrasive material and method of forming same
EP1758713B1 (en) Abrasive material and method of forming same
US4456500A (en) Method of manufacturing a polisher
JP5384326B2 (en) Structured abrasive articles and methods of making and using the same
EP1016133B1 (en) Method of planarizing the upper surface of a semiconductor wafer
US6194317B1 (en) Method of planarizing the upper surface of a semiconductor wafer
JP5597140B2 (en) Plasma-treated abrasive article and method for producing the article
EP1371451B1 (en) Abrasive tools with precisely controlled abrasive array and method of fabrication
AU613895B2 (en) Flexible abrasives
EP1138221B1 (en) File, particularly nail file
JP2012525263A (en) Fixed abrasive sawing wire with rough interface between core and outer sheath
US20110081830A1 (en) Method for finishing and fitting dental restorations and an abrasive material for doing same
EP1016479A3 (en) Cutting tool
CA2288022A1 (en) Abrasive material and method of forming same
JP2008006507A (en) Diamond polishing tool, method for preparing diamond polishing tool and method for reproducing diamond polishing tool
JP2004358640A (en) Method for manufacturing electroplated tool and electroplated tool
US20050066988A1 (en) Filing tool for hardened-skin care and method of manufacturing the same
MXPA99009782A (en) Abrasive material and method of forming same
JPS6017648B2 (en) metal polishing body
US20110081835A1 (en) Method for making polished gemstones and an abrasive material for doing same
CA1114499A (en) Controlled surface finish for flexible disk stabilizing plate
JPH11179702A (en) Saw and production of saw
JPS6317653Y2 (en)
GB2193133A (en) Metallic polishing element

Legal Events

Date Code Title Description
EEER Examination request
FZDE Dead

Effective date: 20140520