CA2216296A1 - Imaging method for manufacture of microdevices - Google Patents
Imaging method for manufacture of microdevicesInfo
- Publication number
- CA2216296A1 CA2216296A1 CA002216296A CA2216296A CA2216296A1 CA 2216296 A1 CA2216296 A1 CA 2216296A1 CA 002216296 A CA002216296 A CA 002216296A CA 2216296 A CA2216296 A CA 2216296A CA 2216296 A1 CA2216296 A1 CA 2216296A1
- Authority
- CA
- Canada
- Prior art keywords
- imaging method
- microdevices
- manufacture
- directions
- center
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
An imaging method for imaging a fine pattern having linear features extending along orthogonal first and second directions, is disclosed which method is characterized by: providing a light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the first and second directions, respectively; and illuminating the pattern with light from the light source.
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3028631A JP2633091B2 (en) | 1991-02-22 | 1991-02-22 | Image projection method, circuit manufacturing method, and projection exposure apparatus |
JP028631/1991 | 1991-02-22 | ||
JP128446/1991 | 1991-04-30 | ||
JP3128446A JP2890892B2 (en) | 1991-04-30 | 1991-04-30 | Exposure apparatus and element manufacturing method using the same |
CA002061499A CA2061499C (en) | 1991-02-22 | 1992-02-19 | Imaging method for manufacture of microdevices |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA002061499A Division CA2061499C (en) | 1991-02-22 | 1992-02-19 | Imaging method for manufacture of microdevices |
Publications (2)
Publication Number | Publication Date |
---|---|
CA2216296A1 true CA2216296A1 (en) | 1992-08-23 |
CA2216296C CA2216296C (en) | 2003-04-15 |
Family
ID=27169025
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA002216296A Expired - Lifetime CA2216296C (en) | 1991-02-22 | 1992-02-19 | Imaging method for manufacture of microdevices |
Country Status (1)
Country | Link |
---|---|
CA (1) | CA2216296C (en) |
-
1992
- 1992-02-19 CA CA002216296A patent/CA2216296C/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
CA2216296C (en) | 2003-04-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EEER | Examination request | ||
MKEX | Expiry |