CA2063241A1 - Vacuum vapor deposition - Google Patents
Vacuum vapor depositionInfo
- Publication number
- CA2063241A1 CA2063241A1 CA002063241A CA2063241A CA2063241A1 CA 2063241 A1 CA2063241 A1 CA 2063241A1 CA 002063241 A CA002063241 A CA 002063241A CA 2063241 A CA2063241 A CA 2063241A CA 2063241 A1 CA2063241 A1 CA 2063241A1
- Authority
- CA
- Canada
- Prior art keywords
- vacuum vapor
- vapor deposition
- organic
- protective layer
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
VACUUM VAPOR DEPOSITION
ABSTRACT OF THE DISCLOSURE
A process for vacuum vapor deposition, particularly the process for applying an organic protective layer to an inorganic material deposited on optical articles by using porous ceramic material in a vacuum vapor deposition apparatus equipped with both organic material vaporizing means and inorganic material vaporizing means therein.
According to the process of the present invention, organic protective layer can be easily applied quantatively to the deposited inorganic material. Any solvent and washing step before coating organic protective layer needed in the prior art can be completely eliminated.
ABSTRACT OF THE DISCLOSURE
A process for vacuum vapor deposition, particularly the process for applying an organic protective layer to an inorganic material deposited on optical articles by using porous ceramic material in a vacuum vapor deposition apparatus equipped with both organic material vaporizing means and inorganic material vaporizing means therein.
According to the process of the present invention, organic protective layer can be easily applied quantatively to the deposited inorganic material. Any solvent and washing step before coating organic protective layer needed in the prior art can be completely eliminated.
Description
~32~
VACUU~ VAPOR DEPOSITION
BACKGROUND OF THE INVENTION
. .. _ ._.__.__ . ___ . _. _ _. ~
FIELD OF THE INVENTION
This lnvention relates to a process for vacuum vapor deposl~lon, par~iculaly ~o a process for vacuum vapor deposltion by coatlng an organlc protectlve fllm on an lnorganic material deposlted on optlcal ar~lcles.
PRIOR ART
As well known, bolllng polnt of ma~erlal depend~ on atmospherlc pressure and evaporatlon of the material can be a~talned by lowering ~urroundlng pressure. Thua, vacuum vapor depositlon can be attalned by depOsl~lng vapors on the surface o~ solid articles positioned ln v~por flow in vacuum. Vapor deposlt10n of lnorganlc materlals on optlcal artlcles forms non-smoothed lrregular surface of non-con~rolled op~lcal charac~eris~ics, because of adhered lrreegular crystalR deposl~ed on the surface. Thus spaces between ~he lrregular crystals are filled with an organlc fllm formlng ma~erial to obtain flat and smooth surface of the ar~lcles of deslred optlcal charac~erlstlcs, thereby al~o obtalnlng a protectlng film on the surface of the op~lcal artlcles from acclden~al ~taln troubles by human hand~, etc.
~3~
The organlc pro~ec~lng fllm can be prepared by dlssolving organic mat,erlals ~o be coated ln a solv~nt to obtain ~ sollltion an~ evapor~ting the solvcnt ~fter co~ting ~ owever, a very dilute solution ls ~o be used for ob~alnlng a very ~hln org~nic film, requirlng a large amount of solvent and the CFC type solvents used in the prlor art are known as ~he ozone destroyin~ compounds.
~ecently developed non-C~'C-t~ype solvents are also lncluding fluorine or chlorlne a~oms to be lnhiblted ln future.
Ano~her problem ln the prlo~ art is the washlng process. As well known, ~he pro~ectlve coat,lng process lncludes con~rolllng of the concentra~lon of the solut,ion, coat,ing of ~he solution and evaporati.ng of the solvent,.
Every ~tep ls conduc~ed after removlng vapor deposited ar~lcles from vapor deposl~lon apparatus. The ~resh surface of the vapor deposited ar~icles is covered by small crystalllne par~lcles deposited and very sensitive to dllst m~teri~ls in atomosphere, The floating dust material~ by flowlng of air or lnner~ gas ln~o ~he apparatus exposed to air are adhered to ~he surface, requiring further washlng step before organic l)rotective coatin~, As lllust.rated above, envlronmental pollutlon by t,he solvent used and ~he surface washlng process of t,he deposi~lon product before coat,ing organlc ma~erial are lmportan~ proble~s to be solved in the prlor ar~.
Accordlngly, the ob~ec~ of the presen~ inven~lon ls to ellmlnate such dlsadvantages ln ~he prior ar~ and to provlde a novel process for coating the org~nic 2 ~
fllm wl~hout uslng any solvent and any washlng process.
SUMMARY OF THE INVENTION
The present invention relatea to a process for vacuum vapor deposltion, particularly to A process for ~pplying an organic protective layer to ~n inorg~nic material deposited on optical articles by means of ceramic porous materi~l in an ~pparatus having both i.nor~anic m~teri~l v~porizing ~eans an~ organic material vaporizing ~eans, wherein an or~anic protective film can be e~sily obtained ~y heating the porous ceramic material impregnate(l with the organic protective film forming materinl.
Accordlng to the process of the present lnventlon, coatlng of deposlted lnorganic materlal by organlc pro~ec~ive fllm can be ea811y attalned ln a vacuum vapor deposltion appara~us requ.~rlng no solvent and no washlng process.
Thus, ~he washing step ln the prlor art beiore coatlng organlc pro~ective film can be ellmina~ed, Also, the solvent for preparing the solution is not required.
By employlng the porous ceramlc materlal, the amoun~
of organic protec~lve fllm formlng materlal can be ea~lly controlled and controlled amount o~ the organlc ma~erlal can ~e applled to the artlcles to be coated by ad~usting par~icle ~lze of the porou~ ceramlc materlal, viscoslty of the solutlon to be absorbed, e~c. Particularly, very ~32~1 small amount of the organlc materlal can be supplled easlly by uslng con~rolled amoun~ of the organlc ma~erlal and controLled quantl~a~ive coatlng wlth the organic ma~erlal can be easlly attalned wlthout requlrlng any preclse determlnatlon apparatus.
Further, accordlng to the present lnvention, chemlcal vapor deposi~ion can be algo attalned easily by polymerlzing materlals deposlted on the ar~lcles to be coated, as well as physical vapor deposltlon.
DESCRIPTION OF THE PR~FERRED EMBODIMENTS
.. ... ......... .. .............. . .. _ .. . _ .. .. . .. ... .. . . . .
The followlng examples are presented ~or bet~er understandlng of the presen~ lnvention to those skilled in ~he art, It is also to be unders~ood ~h~ these examples are lntended ~o be illustratlve only and are no~ ln~ended to llmlt the lnventlon ln any way.
~ ully drled 15x15xl mm of porous ceramic plates were lmpregnated wi~h polyethylene wax molten. l'he welght of the ceramlc plate were lncreased by 0.20gr for respec~ive pla~e.
One of the ceramlc pla~e thus obtalned was pu~ ln a vacuum vapor deposltlon appara~us having the radlus of 600 mm and evaporated by heating to 85C, after vapor deposltlon of lnorganlc materlal. ~etermlnatlon of the film ~hus prepared by in~erferometer gave 0,03~m of film thicknes~, satisfled thlckness for use in a protective _ 4 2~32`~
fllm.
A solution of slllcon regln compound was u~ed for the organlc fllm formlng material, havlng 3~ of residues by evapora~lon. Fully drled porous ceramlc balls were impregnated with the slllcon resin solutoln and then dried under ~va~ua~i~n to 10 6 torr, in ~ ~ricr hl~ving ~olvent recovery means ~o remove vaporized materlals. Thus, ~he welgh~ of the ceramlc ball were lncreased by O.SOgr.
Two of the ceramlc balls thug prep~ret~ were put lnto a vacuum vapor deposltlng apparatus havlng the radius o~
600mm and heated to 150 ~ after vacuum vapor depositlon of lnorganlc material. Determlnation of the organlc film thus obtalned gave 0.08 ~ m of fllm thlckness clearly sa~lsfled thlckness for use ln a protecting film.
Urethane monomer solutlon wa~ used ~or the organlc f ilm forming materlal, having 25~ residuals by evaporation.
Crushe~ porous ceramic particlea were fully drled and lmpregnated wlth ~he monomer solutlon and ~hen drled ln a drier as ln Example 2. The weight of the ceramic partlcles were increased from l.Ogr to 1.2gr, namely the lncrea~e by 20~. 2gr of the ceramic par~lcles thus ob~alned were pu~ ln a vacuum vapor depositlng apparatus having the radius of 6~ mm and he~ted to ~C after vacuum vapor deposltion of inorganlc matelal, ~Inder _ 5 _ 2~32~
hea~lng the ar~lcles to be coated at 150~ by means of another heater. De~erminatlon of the organlc fllm thu~
obtalned gave 0.05am of ~ilm thlckness, clearly satlsfied thlckness for use ln a protecting fllm.
VACUU~ VAPOR DEPOSITION
BACKGROUND OF THE INVENTION
. .. _ ._.__.__ . ___ . _. _ _. ~
FIELD OF THE INVENTION
This lnvention relates to a process for vacuum vapor deposl~lon, par~iculaly ~o a process for vacuum vapor deposltion by coatlng an organlc protectlve fllm on an lnorganic material deposlted on optlcal ar~lcles.
PRIOR ART
As well known, bolllng polnt of ma~erlal depend~ on atmospherlc pressure and evaporatlon of the material can be a~talned by lowering ~urroundlng pressure. Thua, vacuum vapor depositlon can be attalned by depOsl~lng vapors on the surface o~ solid articles positioned ln v~por flow in vacuum. Vapor deposlt10n of lnorganlc materlals on optlcal artlcles forms non-smoothed lrregular surface of non-con~rolled op~lcal charac~eris~ics, because of adhered lrreegular crystalR deposl~ed on the surface. Thus spaces between ~he lrregular crystals are filled with an organlc fllm formlng ma~erial to obtain flat and smooth surface of the ar~lcles of deslred optlcal charac~erlstlcs, thereby al~o obtalnlng a protectlng film on the surface of the op~lcal artlcles from acclden~al ~taln troubles by human hand~, etc.
~3~
The organlc pro~ec~lng fllm can be prepared by dlssolving organic mat,erlals ~o be coated ln a solv~nt to obtain ~ sollltion an~ evapor~ting the solvcnt ~fter co~ting ~ owever, a very dilute solution ls ~o be used for ob~alnlng a very ~hln org~nic film, requirlng a large amount of solvent and the CFC type solvents used in the prlor art are known as ~he ozone destroyin~ compounds.
~ecently developed non-C~'C-t~ype solvents are also lncluding fluorine or chlorlne a~oms to be lnhiblted ln future.
Ano~her problem ln the prlo~ art is the washlng process. As well known, ~he pro~ectlve coat,lng process lncludes con~rolllng of the concentra~lon of the solut,ion, coat,ing of ~he solution and evaporati.ng of the solvent,.
Every ~tep ls conduc~ed after removlng vapor deposited ar~lcles from vapor deposl~lon apparatus. The ~resh surface of the vapor deposited ar~icles is covered by small crystalllne par~lcles deposited and very sensitive to dllst m~teri~ls in atomosphere, The floating dust material~ by flowlng of air or lnner~ gas ln~o ~he apparatus exposed to air are adhered to ~he surface, requiring further washlng step before organic l)rotective coatin~, As lllust.rated above, envlronmental pollutlon by t,he solvent used and ~he surface washlng process of t,he deposi~lon product before coat,ing organlc ma~erial are lmportan~ proble~s to be solved in the prlor ar~.
Accordlngly, the ob~ec~ of the presen~ inven~lon ls to ellmlnate such dlsadvantages ln ~he prior ar~ and to provlde a novel process for coating the org~nic 2 ~
fllm wl~hout uslng any solvent and any washlng process.
SUMMARY OF THE INVENTION
The present invention relatea to a process for vacuum vapor deposltion, particularly to A process for ~pplying an organic protective layer to ~n inorg~nic material deposited on optical articles by means of ceramic porous materi~l in an ~pparatus having both i.nor~anic m~teri~l v~porizing ~eans an~ organic material vaporizing ~eans, wherein an or~anic protective film can be e~sily obtained ~y heating the porous ceramic material impregnate(l with the organic protective film forming materinl.
Accordlng to the process of the present lnventlon, coatlng of deposlted lnorganic materlal by organlc pro~ec~ive fllm can be ea811y attalned ln a vacuum vapor deposltion appara~us requ.~rlng no solvent and no washlng process.
Thus, ~he washing step ln the prlor art beiore coatlng organlc pro~ective film can be ellmina~ed, Also, the solvent for preparing the solution is not required.
By employlng the porous ceramlc materlal, the amoun~
of organic protec~lve fllm formlng materlal can be ea~lly controlled and controlled amount o~ the organlc ma~erlal can ~e applled to the artlcles to be coated by ad~usting par~icle ~lze of the porou~ ceramlc materlal, viscoslty of the solutlon to be absorbed, e~c. Particularly, very ~32~1 small amount of the organlc materlal can be supplled easlly by uslng con~rolled amoun~ of the organlc ma~erlal and controLled quantl~a~ive coatlng wlth the organic ma~erlal can be easlly attalned wlthout requlrlng any preclse determlnatlon apparatus.
Further, accordlng to the present lnvention, chemlcal vapor deposi~ion can be algo attalned easily by polymerlzing materlals deposlted on the ar~lcles to be coated, as well as physical vapor deposltlon.
DESCRIPTION OF THE PR~FERRED EMBODIMENTS
.. ... ......... .. .............. . .. _ .. . _ .. .. . .. ... .. . . . .
The followlng examples are presented ~or bet~er understandlng of the presen~ lnvention to those skilled in ~he art, It is also to be unders~ood ~h~ these examples are lntended ~o be illustratlve only and are no~ ln~ended to llmlt the lnventlon ln any way.
~ ully drled 15x15xl mm of porous ceramic plates were lmpregnated wi~h polyethylene wax molten. l'he welght of the ceramlc plate were lncreased by 0.20gr for respec~ive pla~e.
One of the ceramlc pla~e thus obtalned was pu~ ln a vacuum vapor deposltlon appara~us having the radlus of 600 mm and evaporated by heating to 85C, after vapor deposltlon of lnorganlc materlal. ~etermlnatlon of the film ~hus prepared by in~erferometer gave 0,03~m of film thicknes~, satisfled thlckness for use in a protective _ 4 2~32`~
fllm.
A solution of slllcon regln compound was u~ed for the organlc fllm formlng material, havlng 3~ of residues by evapora~lon. Fully drled porous ceramlc balls were impregnated with the slllcon resin solutoln and then dried under ~va~ua~i~n to 10 6 torr, in ~ ~ricr hl~ving ~olvent recovery means ~o remove vaporized materlals. Thus, ~he welgh~ of the ceramlc ball were lncreased by O.SOgr.
Two of the ceramlc balls thug prep~ret~ were put lnto a vacuum vapor deposltlng apparatus havlng the radius o~
600mm and heated to 150 ~ after vacuum vapor depositlon of lnorganlc material. Determlnation of the organlc film thus obtalned gave 0.08 ~ m of fllm thlckness clearly sa~lsfled thlckness for use ln a protecting film.
Urethane monomer solutlon wa~ used ~or the organlc f ilm forming materlal, having 25~ residuals by evaporation.
Crushe~ porous ceramic particlea were fully drled and lmpregnated wlth ~he monomer solutlon and ~hen drled ln a drier as ln Example 2. The weight of the ceramic partlcles were increased from l.Ogr to 1.2gr, namely the lncrea~e by 20~. 2gr of the ceramic par~lcles thus ob~alned were pu~ ln a vacuum vapor depositlng apparatus having the radius of 6~ mm and he~ted to ~C after vacuum vapor deposltion of inorganlc matelal, ~Inder _ 5 _ 2~32~
hea~lng the ar~lcles to be coated at 150~ by means of another heater. De~erminatlon of the organlc fllm thu~
obtalned gave 0.05am of ~ilm thlckness, clearly satlsfied thlckness for use ln a protecting fllm.
Claims (3)
1. A process for vacuum vapor deposition which comprises further depositing an organic protective material on an inorganic layer deposited on the articles in a vacuum vapor deposition apparatus equipped with both organic material vaporizing means and inorganic material vaporizing means.
2. A process according to Claim 1, wherein deposition of the organic protective layer is conducted by heating porous ceramic material impregnated with an organic film forming material in vacuum.
3. Porous ceramic materials impregnated with an organic film forming material for vaporizing in vacuum.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP92104574A EP0561016A1 (en) | 1992-03-17 | 1992-03-17 | Multilayer coating by vacuum vapor deposition |
| CA002063241A CA2063241A1 (en) | 1992-03-17 | 1992-03-17 | Vacuum vapor deposition |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP92104574A EP0561016A1 (en) | 1992-03-17 | 1992-03-17 | Multilayer coating by vacuum vapor deposition |
| CA002063241A CA2063241A1 (en) | 1992-03-17 | 1992-03-17 | Vacuum vapor deposition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2063241A1 true CA2063241A1 (en) | 1993-09-18 |
Family
ID=25675029
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002063241A Abandoned CA2063241A1 (en) | 1992-03-17 | 1992-03-17 | Vacuum vapor deposition |
Country Status (2)
| Country | Link |
|---|---|
| EP (1) | EP0561016A1 (en) |
| CA (1) | CA2063241A1 (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19539789A1 (en) * | 1995-10-26 | 1997-04-30 | Merck Patent Gmbh | Means and methods for producing water-repellent coatings on optical substrates |
| DE19825100A1 (en) * | 1998-06-05 | 1999-12-16 | Merck Patent Gmbh | Means for the production of water-repellent coatings on optical substrates |
| US6833159B1 (en) * | 2000-05-02 | 2004-12-21 | Vision-Ease Lens, Inc. | Method for applying hydrophobic anti-reflection coatings to lenses and lens blanks |
| DE102005013875A1 (en) | 2005-03-24 | 2006-11-02 | Creaphys Gmbh | Heating device, coating system and method for the evaporation or sublimation of coating materials |
| EP1783846B1 (en) * | 2005-10-28 | 2008-07-09 | Novaled AG | Deposition of a doped organic material on a substrate |
| US10613255B2 (en) | 2014-02-12 | 2020-04-07 | Vision Ease, Lp | Easy-clean coating |
| CN112358196A (en) * | 2020-11-06 | 2021-02-12 | 湖南宏泰新材料有限公司 | Optical glass surface evaporation process |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH430073A (en) * | 1961-09-29 | 1967-02-15 | Philips Nv | Process for the production of light-absorbing, colored, transparent layers on objects |
| US3690932A (en) * | 1968-11-20 | 1972-09-12 | Jenaer Glaswerk Schott & Gen | Method for producing mixed layers from inorganic and organic substances on a substrate |
| US4560577A (en) * | 1984-09-14 | 1985-12-24 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Oxidation protection coatings for polymers |
| FR2576147B1 (en) * | 1985-01-17 | 1987-11-27 | Flicstein Jean | METHOD FOR DEPOSITING AND CRYSTALLIZING A THIN FILM OF ORGANIC MATERIAL USING AN ENERGY BEAM |
| BR8900933A (en) * | 1988-05-02 | 1990-10-09 | Orient Watch Co Ltd | MULTIPLE COMPOUND FILM, MULTIPLE LAYER COMPOSITE FILM AND MULTIPLE LAYER COMPOSITE FILM |
-
1992
- 1992-03-17 EP EP92104574A patent/EP0561016A1/en not_active Withdrawn
- 1992-03-17 CA CA002063241A patent/CA2063241A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| EP0561016A1 (en) | 1993-09-22 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FZDE | Discontinued |