CA1181623A - Systeme d'alignement et d'eposition avec positionnement pas a pas - Google Patents

Systeme d'alignement et d'eposition avec positionnement pas a pas

Info

Publication number
CA1181623A
CA1181623A CA000442689A CA442689A CA1181623A CA 1181623 A CA1181623 A CA 1181623A CA 000442689 A CA000442689 A CA 000442689A CA 442689 A CA442689 A CA 442689A CA 1181623 A CA1181623 A CA 1181623A
Authority
CA
Canada
Prior art keywords
alignment
wafer
stage
reticle
prealignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA000442689A
Other languages
English (en)
Inventor
Edward H. Phillips
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Optimetrix Corp
Original Assignee
Optimetrix Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CA000349215A external-priority patent/CA1162776A/fr
Application filed by Optimetrix Corp filed Critical Optimetrix Corp
Priority to CA000442689A priority Critical patent/CA1181623A/fr
Application granted granted Critical
Publication of CA1181623A publication Critical patent/CA1181623A/fr
Expired legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CA000442689A 1979-04-03 1983-12-06 Systeme d'alignement et d'eposition avec positionnement pas a pas Expired CA1181623A (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CA000442689A CA1181623A (fr) 1979-04-03 1983-12-06 Systeme d'alignement et d'eposition avec positionnement pas a pas

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US2672279A 1979-04-03 1979-04-03
US026,722 1979-04-03
US5399579A 1979-07-02 1979-07-02
US053,995 1979-07-02
CA000349215A CA1162776A (fr) 1979-04-03 1980-04-03 Systeme de positionnement a repetition a lentille de projection
CA000442689A CA1181623A (fr) 1979-04-03 1983-12-06 Systeme d'alignement et d'eposition avec positionnement pas a pas

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CA000349215A Division CA1162776A (fr) 1979-04-03 1980-04-03 Systeme de positionnement a repetition a lentille de projection

Publications (1)

Publication Number Publication Date
CA1181623A true CA1181623A (fr) 1985-01-29

Family

ID=27426233

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000442689A Expired CA1181623A (fr) 1979-04-03 1983-12-06 Systeme d'alignement et d'eposition avec positionnement pas a pas

Country Status (1)

Country Link
CA (1) CA1181623A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113132621A (zh) * 2020-01-10 2021-07-16 长鑫存储技术有限公司 拍摄装置位置校正***及方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113132621A (zh) * 2020-01-10 2021-07-16 长鑫存储技术有限公司 拍摄装置位置校正***及方法
CN113132621B (zh) * 2020-01-10 2022-04-26 长鑫存储技术有限公司 拍摄装置位置校正***及方法

Similar Documents

Publication Publication Date Title
US4414749A (en) Alignment and exposure system with an indicium of an axis of motion of the system
US4473293A (en) Step-and-repeat projection alignment and exposure system
US4573791A (en) Step-and-repeat projection alignment and exposure system
US4452526A (en) Step-and-repeat projection alignment and exposure system with auxiliary optical unit
EP0017759B1 (fr) Système amélioré d'alignement et d'exposition par projection pas à pas
US6654097B1 (en) Projection exposure apparatus
US4629313A (en) Exposure apparatus
KR100240371B1 (ko) 면위치검출방법 및 이것을 이용한 주사노광방법
US5621813A (en) Pattern recognition alignment system
TWI397778B (zh) 曝光設備和製造裝置的方法
US5140366A (en) Exposure apparatus with a function for controlling alignment by use of latent images
US6287734B2 (en) Exposure method
US5914774A (en) Projection exposure apparatus with function to measure imaging characteristics of projection optical system
EP1755152A1 (fr) Procede de mesure, equipement de mesure, procede d'exposition et equipement d'exposition
JPH0545889A (ja) 投影露光装置
KR20090091116A (ko) 선폭 계측 방법, 이미지 형성 상태 검출 방법, 조정 방법, 노광 방법 및 디바이스 제조 방법
EP3534213B1 (fr) Appareil de formation de motifs, procédé de détection de marque d'alignement et procédé de formation de motifs
JP3880155B2 (ja) 位置決め方法及び位置決め装置
JPH10153866A (ja) 照明装置および該照明装置を備えた露光装置
US4422755A (en) Frontal illumination system for semiconductive wafers
WO1994024611A1 (fr) Systeme d'alignement de masque et de tranche dans l'axe
KR100606493B1 (ko) 리소그래피 장치용 아베 아암 캘리브레이션 시스템
EP0035113B1 (fr) Dispositif d'alignement
US4597664A (en) Step-and-repeat projection alignment and exposure system with auxiliary optical unit
US4577958A (en) Bore-sighted step-and-repeat projection alignment and exposure system

Legal Events

Date Code Title Description
MKEX Expiry