CA1146397A - Epreuve d'impression couleurs, renfermant un surfactif anionique, forme par reaction de p.sub.2o.sub.5 avec un produit de condensation d'oxyde d'alkylene - Google Patents
Epreuve d'impression couleurs, renfermant un surfactif anionique, forme par reaction de p.sub.2o.sub.5 avec un produit de condensation d'oxyde d'alkyleneInfo
- Publication number
- CA1146397A CA1146397A CA000353135A CA353135A CA1146397A CA 1146397 A CA1146397 A CA 1146397A CA 000353135 A CA000353135 A CA 000353135A CA 353135 A CA353135 A CA 353135A CA 1146397 A CA1146397 A CA 1146397A
- Authority
- CA
- Canada
- Prior art keywords
- light sensitive
- range
- proof sheet
- surfactant
- sheet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F3/00—Colour separation; Correction of tonal value
- G03F3/10—Checking the colour or tonal value of separation negatives or positives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Paints Or Removers (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US4546879A | 1979-06-01 | 1979-06-01 | |
US045,468 | 1979-06-01 |
Publications (1)
Publication Number | Publication Date |
---|---|
CA1146397A true CA1146397A (fr) | 1983-05-17 |
Family
ID=21938062
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA000353135A Expired CA1146397A (fr) | 1979-06-01 | 1980-05-30 | Epreuve d'impression couleurs, renfermant un surfactif anionique, forme par reaction de p.sub.2o.sub.5 avec un produit de condensation d'oxyde d'alkylene |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0019896B1 (fr) |
JP (1) | JPS5619055A (fr) |
CA (1) | CA1146397A (fr) |
DE (1) | DE3071134D1 (fr) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU8021782A (en) * | 1981-02-20 | 1982-08-26 | Polychrome Corp. | Non-silver positive working radiation sensitive compositions |
US4650738A (en) * | 1984-10-22 | 1987-03-17 | American Hoechst Corporation | Negative working diazo color proofing method |
US4914039A (en) * | 1988-04-20 | 1990-04-03 | Hoechst Celanese Corporation | Water developable, negative working overlay or transfer type diazo color proofing system |
US4968582A (en) * | 1988-06-28 | 1990-11-06 | Mcnc And University Of Nc At Charlotte | Photoresists resistant to oxygen plasmas |
JPH08262718A (ja) * | 1995-03-13 | 1996-10-11 | Minnesota Mining & Mfg Co <3M> | ポジとして働く感光性成分 |
CN108027555B (zh) * | 2015-10-21 | 2020-12-18 | 昭和电工株式会社 | 正型感光性树脂组合物 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE596967A (fr) * | 1959-11-12 | |||
NL272967A (fr) * | 1960-12-29 | |||
US3264108A (en) * | 1963-03-19 | 1966-08-02 | Gen Aniline & Film Corp | Antistatic photographic film |
GB1052699A (fr) * | 1963-12-03 | |||
DE2123455A1 (de) * | 1971-05-12 | 1972-11-23 | Agfa-Gevaert Ag, 5090 Leverkusen | Photographische Materialien mit verbesserten antistatischen Eigenschaften |
GB1440281A (en) * | 1974-01-23 | 1976-06-23 | Hoechst Ag | Light-sensitive layer transfer material |
JPS50150501A (fr) * | 1974-05-23 | 1975-12-03 | ||
US4157918A (en) * | 1977-09-26 | 1979-06-12 | American Hoechst Corporation | Light sensitive film composition |
-
1980
- 1980-05-27 EP EP80102931A patent/EP0019896B1/fr not_active Expired
- 1980-05-27 DE DE8080102931T patent/DE3071134D1/de not_active Expired
- 1980-05-30 CA CA000353135A patent/CA1146397A/fr not_active Expired
- 1980-06-02 JP JP7285580A patent/JPS5619055A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
DE3071134D1 (en) | 1985-11-07 |
JPS5619055A (en) | 1981-02-23 |
EP0019896A2 (fr) | 1980-12-10 |
EP0019896B1 (fr) | 1985-10-02 |
EP0019896A3 (en) | 1981-06-10 |
JPH0146860B2 (fr) | 1989-10-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MKEX | Expiry |