CA1074219A - Phenol-free photoresist stripper - Google Patents

Phenol-free photoresist stripper

Info

Publication number
CA1074219A
CA1074219A CA254,652A CA254652A CA1074219A CA 1074219 A CA1074219 A CA 1074219A CA 254652 A CA254652 A CA 254652A CA 1074219 A CA1074219 A CA 1074219A
Authority
CA
Canada
Prior art keywords
sulfonic acid
aryl sulfonic
photoresist
phenol
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA254,652A
Other languages
English (en)
French (fr)
Inventor
John E. Vander Mey
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Allied Corp
Original Assignee
Allied Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Allied Chemical Corp filed Critical Allied Chemical Corp
Application granted granted Critical
Publication of CA1074219A publication Critical patent/CA1074219A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
CA254,652A 1975-08-01 1976-06-11 Phenol-free photoresist stripper Expired CA1074219A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US60157475A 1975-08-01 1975-08-01

Publications (1)

Publication Number Publication Date
CA1074219A true CA1074219A (en) 1980-03-25

Family

ID=24408019

Family Applications (1)

Application Number Title Priority Date Filing Date
CA254,652A Expired CA1074219A (en) 1975-08-01 1976-06-11 Phenol-free photoresist stripper

Country Status (6)

Country Link
JP (1) JPS5220101A (it)
CA (1) CA1074219A (it)
DE (1) DE2632949A1 (it)
FR (1) FR2319396A1 (it)
GB (1) GB1551143A (it)
IT (1) IT1125196B (it)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4165295A (en) * 1976-10-04 1979-08-21 Allied Chemical Corporation Organic stripping compositions and method for using same
US4165294A (en) 1976-11-08 1979-08-21 Allied Chemical Corporation Phenol-free and chlorinated hydrocarbon-free photoresist stripper comprising surfactant and hydrotropic aromatic sulfonic acids
US4242218A (en) * 1976-11-08 1980-12-30 Allied Chemical Corporation Phenol-free photoresist stripper
CA1116059A (en) * 1978-05-22 1982-01-12 Allied Corporation Phenol-free and chlorinated hydrocarbon-free photoresist stripper
US4187191A (en) * 1978-07-26 1980-02-05 General Motors Corporation Photoresist stripper with dodecylsulfonic acid and chlorinated solvents
EP0337342A1 (de) * 1988-04-13 1989-10-18 Siemens Aktiengesellschaft Verfahren zum Entschichten von Photolack
US4971715A (en) * 1988-11-18 1990-11-20 International Business Machines Corporation Phenolic-free stripping composition and use thereof
US8614053B2 (en) 2009-03-27 2013-12-24 Eastman Chemical Company Processess and compositions for removing substances from substrates

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1419726A (fr) * 1963-10-04 1965-12-03 Kalle Ag Solutions détersives pour formes d'imprimerie planes
US3582401A (en) * 1967-11-15 1971-06-01 Mallinckrodt Chemical Works Photosensitive resist remover compositions and methods

Also Published As

Publication number Publication date
IT1125196B (it) 1986-05-14
DE2632949C2 (it) 1987-11-19
FR2319396B1 (it) 1980-03-14
FR2319396A1 (fr) 1977-02-25
DE2632949A1 (de) 1977-02-17
GB1551143A (en) 1979-08-22
JPS5220101A (en) 1977-02-15

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Legal Events

Date Code Title Description
MKEX Expiry