CA1019441A - Non-volatile semiconductor storage device utilizing avalanche injection and extraction of stored information - Google Patents

Non-volatile semiconductor storage device utilizing avalanche injection and extraction of stored information

Info

Publication number
CA1019441A
CA1019441A CA186,057A CA186057A CA1019441A CA 1019441 A CA1019441 A CA 1019441A CA 186057 A CA186057 A CA 186057A CA 1019441 A CA1019441 A CA 1019441A
Authority
CA
Canada
Prior art keywords
extraction
storage device
stored information
semiconductor storage
volatile semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA186,057A
Other languages
English (en)
Inventor
Joseph J. Chang
Benjamin Agusta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of CA1019441A publication Critical patent/CA1019441A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/788Field effect transistors with field effect produced by an insulated gate with floating gate
    • H01L29/7881Programmable transistors with only two possible levels of programmation
    • H01L29/7884Programmable transistors with only two possible levels of programmation charging by hot carrier injection
    • H01L29/7886Hot carrier produced by avalanche breakdown of a PN junction, e.g. FAMOS
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0408Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors
    • G11C16/0416Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors comprising cells containing a single floating gate transistor and no select transistor, e.g. UV EPROM

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Non-Volatile Memory (AREA)
  • Read Only Memory (AREA)
  • Semiconductor Memories (AREA)
CA186,057A 1972-12-29 1973-11-16 Non-volatile semiconductor storage device utilizing avalanche injection and extraction of stored information Expired CA1019441A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US31942572A 1972-12-29 1972-12-29

Publications (1)

Publication Number Publication Date
CA1019441A true CA1019441A (en) 1977-10-18

Family

ID=23242185

Family Applications (1)

Application Number Title Priority Date Filing Date
CA186,057A Expired CA1019441A (en) 1972-12-29 1973-11-16 Non-volatile semiconductor storage device utilizing avalanche injection and extraction of stored information

Country Status (7)

Country Link
US (1) US3797000A (xx)
JP (1) JPS525234B2 (xx)
CA (1) CA1019441A (xx)
DE (1) DE2356275C2 (xx)
FR (1) FR2212647B1 (xx)
GB (1) GB1445450A (xx)
IT (1) IT1001098B (xx)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4004159A (en) * 1973-05-18 1977-01-18 Sanyo Electric Co., Ltd. Electrically reprogrammable nonvolatile floating gate semi-conductor memory device and method of operation
US4123771A (en) * 1973-09-21 1978-10-31 Tokyo Shibaura Electric Co., Ltd. Nonvolatile semiconductor memory
US3838405A (en) * 1973-10-03 1974-09-24 Ibm Non-volatile diode cross point memory array
DE2812049C2 (de) * 1974-09-20 1982-05-27 Siemens AG, 1000 Berlin und 8000 München n-Kanal-Speicher-FET
DE2513207C2 (de) * 1974-09-20 1982-07-01 Siemens AG, 1000 Berlin und 8000 München n-Kanal-Speicher-FET
DE2643987C2 (de) * 1974-09-20 1984-03-29 Siemens AG, 1000 Berlin und 8000 München n-Kanal-Speicher-FET
DE2505824C3 (de) * 1975-02-12 1982-04-15 Siemens AG, 1000 Berlin und 8000 München n-Kanal-Speicher-FET
DE2643932C2 (de) * 1974-09-20 1984-02-16 Siemens AG, 1000 Berlin und 8000 München n-Kanal-Speicher-FET
DE2525062C2 (de) 1975-06-05 1983-02-17 Siemens AG, 1000 Berlin und 8000 München Matrixanordnung aus n-Kanal-Speicher-FET
DE2638730C2 (de) * 1974-09-20 1982-10-28 Siemens AG, 1000 Berlin und 8000 München n-Kanal-Speicher-FET, Verfahren zum Entladen des Speichergate des n-Kanal-Speicher-FET und Verwendung des n-Kanal-Speicher-FET
DE2505816C3 (de) * 1974-09-20 1982-04-22 Siemens AG, 1000 Berlin und 8000 München Verfahren zum Betrieb eines n-Kanal-Speicher-FET, n-Kanal-Speicher-FET zur Ausübung des Verfahrens und Anwendung des Verfahrens auf die n-Kanal-Speicher-FETs einer Speichermatrix
DE2445137C3 (de) * 1974-09-20 1981-02-26 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zum Betrieb eines n-Kanal-Speicher-FET, n-Kanal-Speicher-FET zur Ausübung des Verfahrens und Anwendung des Verfahrens auf die n-Kanal-Speicher-FETs einer Speichermatrix
DE2560220C2 (de) * 1975-03-25 1982-11-25 Siemens AG, 1000 Berlin und 8000 München n-Kanal-Speicher-FET
FR2307357A1 (fr) * 1975-04-11 1976-11-05 Thomson Csf Structure monolithique de stockage de charges electriques, procede de mise en charge de cette structure et composants electroniques d'application
US4115914A (en) * 1976-03-26 1978-09-26 Hughes Aircraft Company Electrically erasable non-volatile semiconductor memory
US4127900A (en) * 1976-10-29 1978-11-28 Massachusetts Institute Of Technology Reading capacitor memories with a variable voltage ramp
US4161039A (en) * 1976-12-15 1979-07-10 Siemens Aktiengesellschaft N-Channel storage FET
US4099196A (en) * 1977-06-29 1978-07-04 Intel Corporation Triple layer polysilicon cell
US4145702A (en) * 1977-07-05 1979-03-20 Burroughs Corporation Electrically programmable read-only-memory device
US4250206A (en) * 1978-12-11 1981-02-10 Texas Instruments Incorporated Method of making non-volatile semiconductor memory elements
US5106772A (en) * 1990-01-09 1992-04-21 Intel Corporation Method for improving the electrical erase characteristics of floating gate memory cells by immediately depositing a protective polysilicon layer following growth of the tunnel or gate oxide
JP3878681B2 (ja) 1995-06-15 2007-02-07 株式会社ルネサステクノロジ 不揮発性半導体記憶装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3500142A (en) * 1967-06-05 1970-03-10 Bell Telephone Labor Inc Field effect semiconductor apparatus with memory involving entrapment of charge carriers
DE2201028C3 (de) * 1971-01-15 1981-07-09 Intel Corp., Mountain View, Calif. Verfahren zum Betrieb eines Feldeffekttransistors und Feldeffekttransistor zur Ausübung dieses Verfahrens

Also Published As

Publication number Publication date
DE2356275C2 (de) 1984-10-04
JPS4998974A (xx) 1974-09-19
GB1445450A (en) 1976-08-11
FR2212647A1 (xx) 1974-07-26
IT1001098B (it) 1976-04-20
FR2212647B1 (xx) 1977-09-30
JPS525234B2 (xx) 1977-02-10
US3797000A (en) 1974-03-12
DE2356275A1 (de) 1974-07-04

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