BR9200710A - Copolimeros reticulaveis cataliticamente por acidos,composicao sensivel a radiacao e emprego - Google Patents
Copolimeros reticulaveis cataliticamente por acidos,composicao sensivel a radiacao e empregoInfo
- Publication number
- BR9200710A BR9200710A BR929200710A BR9200710A BR9200710A BR 9200710 A BR9200710 A BR 9200710A BR 929200710 A BR929200710 A BR 929200710A BR 9200710 A BR9200710 A BR 9200710A BR 9200710 A BR9200710 A BR 9200710A
- Authority
- BR
- Brazil
- Prior art keywords
- copolimers
- accidentally
- job
- radiation
- linked
- Prior art date
Links
- 230000005855 radiation Effects 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by heteroatoms or groups containing heteroatoms
- C08F212/22—Oxygen
- C08F212/24—Phenols or alcohols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/36—Amides or imides
- C08F222/40—Imides, e.g. cyclic imides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
- C08K5/41—Compounds containing sulfur bound to oxygen
- C08K5/42—Sulfonic acids; Derivatives thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Emergency Medicine (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH62491 | 1991-03-01 |
Publications (1)
Publication Number | Publication Date |
---|---|
BR9200710A true BR9200710A (pt) | 1992-11-10 |
Family
ID=4191344
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR929200710A BR9200710A (pt) | 1991-03-01 | 1992-02-28 | Copolimeros reticulaveis cataliticamente por acidos,composicao sensivel a radiacao e emprego |
Country Status (6)
Country | Link |
---|---|
US (1) | US5274060A (pt) |
EP (1) | EP0502819A1 (pt) |
JP (1) | JPH07179522A (pt) |
KR (1) | KR920018101A (pt) |
BR (1) | BR9200710A (pt) |
CA (1) | CA2062096A1 (pt) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5807947A (en) * | 1988-10-21 | 1998-09-15 | Clariant Finance (Bvi) Limited | Copolymers 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene |
WO1997049738A1 (en) * | 1996-06-24 | 1997-12-31 | The Dow Chemical Company | Incorporation of functionalized comonomers in polyolefins |
US7586013B2 (en) * | 2004-03-26 | 2009-09-08 | E.I. Du Pont De Nemours And Company | Method for preparing hydroxystyrenes and acetylated derivatives thereof |
JP2008507276A (ja) * | 2004-07-23 | 2008-03-13 | ポルノクス コーポレーション | 抗酸化マクロモノマーおよび抗酸化ポリマー、ならびにその製造方法および使用方法 |
US7902317B2 (en) * | 2004-12-03 | 2011-03-08 | Polnox Corporation | Synthesis of aniline and phenol-based antioxidant macromonomers and corresponding polymers |
EP1861484A2 (en) | 2005-02-22 | 2007-12-05 | Polnox Corporation | Nitrogen and hindered phenol containing dual functional macromolecular antioxidants: synthesis , performances and applications |
WO2006104957A2 (en) | 2005-03-25 | 2006-10-05 | Polnox Corporation | Alkylated and polymeric macromolecular antioxidants and methods of making and using the same |
US8004421B2 (en) * | 2006-05-10 | 2011-08-23 | Schlumberger Technology Corporation | Wellbore telemetry and noise cancellation systems and method for the same |
US8629782B2 (en) | 2006-05-10 | 2014-01-14 | Schlumberger Technology Corporation | System and method for using dual telemetry |
WO2007050985A2 (en) | 2005-10-27 | 2007-05-03 | Polnox Corporation | Macromolecular antioxidants based on stξrically hindered phenolic phosphites |
US20070149660A1 (en) | 2005-10-27 | 2007-06-28 | Vijayendra Kumar | Stabilized polyolefin compositions |
WO2007064843A1 (en) | 2005-12-02 | 2007-06-07 | Polnox Corporation | Lubricant oil compositions |
US7402713B2 (en) * | 2006-03-07 | 2008-07-22 | E.I. Du Pont De Nemours And Company | Processes for conversion of tyrosine to p-hydroxystyrene and p-acetoxystyrene |
WO2008005358A2 (en) | 2006-07-06 | 2008-01-10 | Polnox Corporation | Novel macromolecular antioxidants comprising differing antioxidant moieties: structures, methods of making and using the same |
US7767853B2 (en) | 2006-10-20 | 2010-08-03 | Polnox Corporation | Antioxidants and methods of making and using the same |
US7468415B2 (en) * | 2007-01-04 | 2008-12-23 | E. I. Du Pont De Nemours And Company | Method for preparing glycidyloxystyrene monomers and polymers thereof |
US10294423B2 (en) | 2013-11-22 | 2019-05-21 | Polnox Corporation | Macromolecular antioxidants based on dual type moiety per molecule: structures, methods of making and using the same |
WO2018160879A2 (en) | 2017-03-01 | 2018-09-07 | Polnox Corporation | Macromolecular corrosion (mcin) inhibitors: structures, methods of making and using the same |
KR20220044564A (ko) | 2019-08-09 | 2022-04-08 | 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 | 화합물, 중합체, 조성물, 막형성용 조성물, 패턴형성방법, 절연막의 형성방법 및 화합물의 제조방법, 그리고 요오드함유 비닐폴리머 및 그의 아세틸화유도체의 제조방법 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3063975A (en) * | 1960-03-25 | 1962-11-13 | Monsanto Chemicals | Copolymers of vinylbenzyl alcohol and vinylbenzyl alkyl ethers |
US3779778A (en) * | 1972-02-09 | 1973-12-18 | Minnesota Mining & Mfg | Photosolubilizable compositions and elements |
GB1539192A (en) * | 1975-01-27 | 1979-01-31 | Ici Ltd | Photopolymerisable compositions |
US4205151A (en) * | 1975-04-04 | 1980-05-27 | Dynapol | Polymeric N-substituted maleimide antioxidants |
DE2718254C3 (de) * | 1977-04-25 | 1980-04-10 | Hoechst Ag, 6000 Frankfurt | Strahlungsempfindliche Kopiermasse |
US4225689A (en) * | 1978-07-26 | 1980-09-30 | Eastman Kodak Company | Aldehyde-containing vinylaryl ethers |
US4439517A (en) * | 1982-01-21 | 1984-03-27 | Ciba-Geigy Corporation | Process for the formation of images with epoxide resin |
GB8413395D0 (en) * | 1984-05-25 | 1984-07-04 | Ciba Geigy Ag | Production of images |
US4737426A (en) * | 1985-05-15 | 1988-04-12 | Ciba-Geigy Corporation | Cyclic acetals or ketals of beta-keto esters or amides |
US4800224A (en) * | 1986-05-16 | 1989-01-24 | Ciba-Geigy Corporation | Optically active styrene derivatives, polymers obtained from these, complexes with iridium(I) and their use |
US4800152A (en) * | 1987-03-16 | 1989-01-24 | International Business Machines Corporation | Negative resist compositions |
DE3821585A1 (de) * | 1987-09-13 | 1989-03-23 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial fuer hochenergetische strahlung |
-
1992
- 1992-02-20 EP EP92810125A patent/EP0502819A1/de not_active Withdrawn
- 1992-02-22 KR KR1019920002710A patent/KR920018101A/ko not_active Application Discontinuation
- 1992-02-27 US US07/843,798 patent/US5274060A/en not_active Expired - Lifetime
- 1992-02-28 BR BR929200710A patent/BR9200710A/pt not_active Application Discontinuation
- 1992-02-28 CA CA002062096A patent/CA2062096A1/en not_active Abandoned
- 1992-03-02 JP JP4080461A patent/JPH07179522A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
EP0502819A1 (de) | 1992-09-09 |
CA2062096A1 (en) | 1992-09-02 |
US5274060A (en) | 1993-12-28 |
KR920018101A (ko) | 1992-10-21 |
JPH07179522A (ja) | 1995-07-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FA1 | Application withdrawn (art. 18(2)) |