BR8407050A - Processo e aparelho para revestimento de um substrato - Google Patents

Processo e aparelho para revestimento de um substrato

Info

Publication number
BR8407050A
BR8407050A BR8407050A BR8407050A BR8407050A BR 8407050 A BR8407050 A BR 8407050A BR 8407050 A BR8407050 A BR 8407050A BR 8407050 A BR8407050 A BR 8407050A BR 8407050 A BR8407050 A BR 8407050A
Authority
BR
Brazil
Prior art keywords
appliance
coating
substrate
Prior art date
Application number
BR8407050A
Other languages
English (en)
Inventor
Peter Hans Hofer
Eberhard Robert Albach
Original Assignee
Libbey Owens Ford Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Libbey Owens Ford Co filed Critical Libbey Owens Ford Co
Publication of BR8407050A publication Critical patent/BR8407050A/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45502—Flow conditions in reaction chamber
    • C23C16/45504—Laminar flow
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45582—Expansion of gas before it reaches the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45585—Compression of gas before it reaches the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45587—Mechanical means for changing the gas flow
    • C23C16/45591—Fixed means, e.g. wings, baffles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45595—Atmospheric CVD gas inlets with no enclosed reaction chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Chemical Vapour Deposition (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Surface Treatment Of Glass (AREA)
  • Chemically Coating (AREA)
BR8407050A 1983-09-26 1984-09-17 Processo e aparelho para revestimento de um substrato BR8407050A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/535,798 US4504526A (en) 1983-09-26 1983-09-26 Apparatus and method for producing a laminar flow of constant velocity fluid along a substrate
PCT/US1984/001460 WO1985001522A1 (en) 1983-09-26 1984-09-17 Method and apparatus for coating a substrate

Publications (1)

Publication Number Publication Date
BR8407050A true BR8407050A (pt) 1985-08-13

Family

ID=24135810

Family Applications (1)

Application Number Title Priority Date Filing Date
BR8407050A BR8407050A (pt) 1983-09-26 1984-09-17 Processo e aparelho para revestimento de um substrato

Country Status (11)

Country Link
US (1) US4504526A (pt)
EP (1) EP0156857B1 (pt)
JP (1) JPS60502259A (pt)
AU (1) AU575349B2 (pt)
BR (1) BR8407050A (pt)
CA (1) CA1252369A (pt)
DE (1) DE3484059D1 (pt)
ES (1) ES8606910A1 (pt)
IT (1) IT1178436B (pt)
MX (1) MX163477B (pt)
WO (1) WO1985001522A1 (pt)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0252667B1 (en) * 1986-06-30 1996-03-27 Nihon Sinku Gijutsu Kabushiki Kaisha Chemical vapour deposition methods
US4994301A (en) * 1986-06-30 1991-02-19 Nihon Sinku Gijutsu Kabusiki Kaisha ACVD (chemical vapor deposition) method for selectively depositing metal on a substrate
US4793282A (en) * 1987-05-18 1988-12-27 Libbey-Owens-Ford Co. Distributor beam for chemical vapor deposition on glass
GB9511841D0 (en) * 1995-06-10 1995-08-09 Pilkington Glass Ltd Mirrors and their production
US6103015A (en) * 1998-01-19 2000-08-15 Libbey-Owens-Ford Co. Symmetrical CVD coater with lower upstream exhaust toe
JP3806537B2 (ja) * 1999-03-10 2006-08-09 株式会社カイジョー 超音波洗浄機及びそれを具備するウエット処理ノズル
US6521295B1 (en) 2001-04-17 2003-02-18 Pilkington North America, Inc. Chemical vapor deposition of antimony-doped metal oxide and the coated article made thereby
JP5026971B2 (ja) * 2004-08-18 2012-09-19 カリクソ ゲゼルシャフト ミット ベシュレンクテル ハフツング 大気圧での化学気相堆積
JP5270345B2 (ja) * 2005-08-30 2013-08-21 ピルキントン グループ リミテッド 太陽電池に用いられる光線透過率を最適化する被覆されたガラス物品及びその製造方法
US8076224B2 (en) * 2008-12-08 2011-12-13 Calyxo Gmbh Thin-film deposition and recirculation of a semi-conductor material
EP2391743B1 (en) 2009-02-02 2014-04-09 Pilkington Group Limited Method of depositing an electrically conductive titanium oxide coating on a substrate
FI9160U1 (fi) * 2010-01-04 2011-04-14 Beneq Oy Pinnoituslaite
US20110207301A1 (en) * 2010-02-19 2011-08-25 Kormanyos Kenneth R Atmospheric pressure chemical vapor deposition with saturation control
DE102010028277B4 (de) 2010-04-27 2013-04-18 Calyxo Gmbh Verfahren und Vorrichtung zur Herstellung einer mit einem Halbleitermaterial beschichteten Glasscheibe und nach dem Verfahren erhältliche Solarzelle oder Solarmodul
WO2012158443A2 (en) 2011-05-13 2012-11-22 Sheperak Thomas J Plasma directed electron beam wound care system apparatus and method
US20150122319A1 (en) 2011-07-28 2015-05-07 David A. Strickler Apcvd of doped titanium oxide and the coated article made thereby
EP3105193B1 (en) 2014-02-11 2020-08-12 Pilkington Group Limited Coated glass article and display assembly made therewith
CN104451601B (zh) * 2014-12-02 2017-02-22 浙江大学 一种常压化学气相沉积镀膜反应器
CN104561938B (zh) * 2015-01-09 2017-04-19 浙江大学 一种浮法在线常压化学气相沉积镀膜反应器

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3805736A (en) * 1971-12-27 1974-04-23 Ibm Apparatus for diffusion limited mass transport
US3790404A (en) * 1972-06-19 1974-02-05 Ibm Continuous vapor processing apparatus and method
GB1524326A (en) * 1976-04-13 1978-09-13 Bfg Glassgroup Coating of glass
JPS5843508A (ja) * 1981-09-09 1983-03-14 Fuji Electric Corp Res & Dev Ltd 量産型成膜装置
US4462333A (en) * 1982-10-27 1984-07-31 Energy Conversion Devices, Inc. Process gas introduction, confinement and evacuation system for glow discharge deposition apparatus

Also Published As

Publication number Publication date
ES536212A0 (es) 1986-05-16
IT1178436B (it) 1987-09-09
MX163477B (es) 1992-05-19
ES8606910A1 (es) 1986-05-16
WO1985001522A1 (en) 1985-04-11
EP0156857A1 (en) 1985-10-09
CA1252369A (en) 1989-04-11
AU3434884A (en) 1985-04-23
US4504526A (en) 1985-03-12
IT8448896A0 (it) 1984-09-25
EP0156857B1 (en) 1991-01-30
DE3484059D1 (de) 1991-03-07
EP0156857A4 (en) 1986-07-30
JPS60502259A (ja) 1985-12-26
JPH0582475B2 (pt) 1993-11-19
AU575349B2 (en) 1988-07-28

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Legal Events

Date Code Title Description
B21A Patent or certificate of addition expired [chapter 21.1 patent gazette]

Free format text: PATENTE EXTINTA EM 17/09/99