BR8004034A - Material de copia foto-sensivel - Google Patents
Material de copia foto-sensivelInfo
- Publication number
- BR8004034A BR8004034A BR8004034A BR8004034A BR8004034A BR 8004034 A BR8004034 A BR 8004034A BR 8004034 A BR8004034 A BR 8004034A BR 8004034 A BR8004034 A BR 8004034A BR 8004034 A BR8004034 A BR 8004034A
- Authority
- BR
- Brazil
- Prior art keywords
- photo
- copy material
- sensitive copy
- layer
- sensitive
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/151—Matting or other surface reflectivity altering material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/162—Protective or antiabrasion layer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photoreceptors In Electrophotography (AREA)
- Printing Plates And Materials Therefor (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Glass Compositions (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Heat Sensitive Colour Forming Recording (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19792926236 DE2926236A1 (de) | 1979-06-29 | 1979-06-29 | Lichtempfindliches, positiv arbeitendes kopiermaterial mit rauher oberflaeche |
Publications (1)
Publication Number | Publication Date |
---|---|
BR8004034A true BR8004034A (pt) | 1981-01-21 |
Family
ID=6074452
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR8004034A BR8004034A (pt) | 1979-06-29 | 1980-06-27 | Material de copia foto-sensivel |
Country Status (11)
Country | Link |
---|---|
US (1) | US4560636A (pt) |
EP (1) | EP0021428B1 (pt) |
JP (1) | JPS569739A (pt) |
AT (1) | ATE5216T1 (pt) |
AU (1) | AU537479B2 (pt) |
BR (1) | BR8004034A (pt) |
CA (1) | CA1148014A (pt) |
DE (2) | DE2926236A1 (pt) |
ES (1) | ES8200487A1 (pt) |
FI (1) | FI802042A (pt) |
ZA (1) | ZA803523B (pt) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56156831A (en) * | 1980-05-09 | 1981-12-03 | Fuji Photo Film Co Ltd | Photosensitive printing plate |
US4506953A (en) * | 1981-05-18 | 1985-03-26 | Asahi Kasei Kogyo Kabushiki Kaisha | Reflection preventive light-shielding screen and a process for producing the same |
DE3128949A1 (de) * | 1981-07-22 | 1983-02-10 | Basf Ag, 6700 Ludwigshafen | Lichtempfindliche aufzeichnungsmaterialien zur herstellung von abriebs- und kratzfesten tiefdruckformen sowie verfahren zur herstellung von tiefdruckformen mittels dieser aufzeichnungsmaterialien |
ATE14803T1 (de) * | 1981-09-17 | 1985-08-15 | Ciba Geigy Ag | Lichtempfindliches beschichtungsmittel und seine verwendung fuer schutzzwecke. |
US4550072A (en) * | 1983-07-14 | 1985-10-29 | Basf Aktiengesellschaft | Photosensitive recording materials containing particles for the production of abrasion-resistant gravure printing plates, and the production of gravure printing plates using these recording materials |
DE3417645A1 (de) * | 1984-05-12 | 1985-11-14 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches aufzeichnungsmaterial fuer die herstellung von flachdruckplatten |
DE3430712A1 (de) * | 1984-08-21 | 1986-03-06 | Hoechst Ag, 6230 Frankfurt | Verfahren zur reduzierung von unterstrahlungen bei der bestrahlung von reproduktionsschichten |
DE3433247A1 (de) * | 1984-09-11 | 1986-03-20 | Hoechst Ag, 6230 Frankfurt | Strahlungsempfindliches aufzeichnungsmaterial und verfahren zu seiner herstellung |
AU589722B2 (en) * | 1986-01-28 | 1989-10-19 | Minnesota Mining And Manufacturing Company | Imageable material and process |
DE3806270A1 (de) * | 1988-02-27 | 1989-09-07 | Basf Ag | Lichtempfindliche aufzeichnungsmaterialien zur herstellung kratzfester tiefdruckformen |
US4885225A (en) * | 1988-04-29 | 1989-12-05 | Minnesota Mining And Manufacturing Company | Color proof with non-blocking thermal adhesive layer with particulate polymer beads |
DE4126836A1 (de) * | 1991-08-14 | 1993-02-18 | Hoechst Ag | Strahlungsempfindliches aufzeichnungsmaterial aus schichttraeger und positiv arbeitender, strahlungsempfindlicher schicht mit rauher oberflaeche |
WO1995007496A1 (en) * | 1993-09-09 | 1995-03-16 | Horsell Graphic Industries Ltd. | A light sensitive printing plate |
DE4335425A1 (de) * | 1993-10-18 | 1995-04-20 | Hoechst Ag | Mattiertes, strahlungsempfindliches Aufzeichnungsmaterial |
GB9326150D0 (en) * | 1993-12-22 | 1994-02-23 | Alcan Int Ltd | Electrochemical roughening method |
DE4439184A1 (de) * | 1994-11-03 | 1996-05-09 | Hoechst Ag | Lichtempfindliches Aufzeichnungsmaterial |
US5633117A (en) * | 1995-04-27 | 1997-05-27 | Imation Corp. | Providing imagewise variation in glossiness to a receptor |
CA2477779A1 (en) * | 2002-03-14 | 2003-09-25 | E.I. Du Pont De Nemours And Company | Photosensitive element for use as flexographic printing plate |
EP1462247B1 (en) * | 2003-03-28 | 2008-05-07 | Agfa Graphics N.V. | Positive working heat-sensitive lithographic printing plate precursor |
US20070020554A1 (en) * | 2005-07-25 | 2007-01-25 | Xerox Corporation | Toner process |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE447178C (de) * | 1926-05-16 | 1927-07-20 | Hans Dettmann | Verfahren zur Herstellung moeglichst klarer, scharf begrenzter Rasterpunkte auf Offsetmaschinenplatten |
FR873675A (fr) * | 1940-07-09 | 1942-07-16 | Zeiss Ikon Ag | Procédé destiné à empêcher la formation des anneaux de newton sur les couches photosensibles |
FR927470A (fr) * | 1945-05-30 | 1947-10-30 | Cliché pour la production sans trame d'impressions en creux à valeurs de tons, procédé de fabrication de tels clichés et procédé d'impression à l'aide de ces derniers | |
CH330158A (de) * | 1954-07-31 | 1958-05-31 | Typon Ag | Verfahren zur Herstellung von photographischem Material mit aufgerauhter, praktisch nichtmattierter Oberfläche |
US3829315A (en) * | 1968-05-27 | 1974-08-13 | Kalle Ag | Methods for making half-tone prints |
DE1572315B2 (de) * | 1967-05-26 | 1976-05-26 | Hoechst Ag, 6000 Frankfurt | Verfahren und druckplatte zum herstellen von halbton-druckformen |
US3615468A (en) * | 1968-11-06 | 1971-10-26 | Sylvania Electric Prod | Photoprinting process and article |
DE1813447A1 (de) * | 1968-12-09 | 1970-06-25 | Kalle Ag | Lichtempfindliches Material fuer die Herstellung von Halbtoene druckenden DruckformenVerfahren zu seiner Herstellung und zur Herstellung der Druckform |
AT289152B (de) * | 1968-12-09 | 1971-04-13 | Kalle Ag | Lichtempfindliches Kopiermaterial zum Herstellen einer Flachdruckform |
US3891443A (en) * | 1973-02-01 | 1975-06-24 | Polychrome Corp | Mat finish photosensitive relief plates |
JPS50125805A (pt) * | 1974-03-19 | 1975-10-03 | ||
US4168979A (en) * | 1974-03-19 | 1979-09-25 | Fuji Photo Film Co., Ltd. | Light-sensitive printing plate with matt overlayer |
FR2308128A1 (fr) * | 1975-04-15 | 1976-11-12 | Agfa Gevaert | Perfectionnements relatifs a des ecrans renforcateurs de radiographie |
JPS538128A (en) * | 1976-07-09 | 1978-01-25 | Fuji Photo Film Co Ltd | Photosolubilizable composition |
JPS5512974A (en) * | 1978-07-15 | 1980-01-29 | Konishiroku Photo Ind Co Ltd | Photosensitive printing plate |
JPS5532086A (en) * | 1978-08-30 | 1980-03-06 | Fuji Photo Film Co Ltd | Photosensitive printing plate |
JPS5548745A (en) * | 1978-10-02 | 1980-04-08 | Mitsubishi Chem Ind Ltd | Photosensitive printing plate |
-
1979
- 1979-06-29 DE DE19792926236 patent/DE2926236A1/de not_active Withdrawn
-
1980
- 1980-06-12 ZA ZA00803523A patent/ZA803523B/xx unknown
- 1980-06-19 CA CA000354355A patent/CA1148014A/en not_active Expired
- 1980-06-19 AU AU59417/80A patent/AU537479B2/en not_active Ceased
- 1980-06-26 FI FI802042A patent/FI802042A/fi not_active Application Discontinuation
- 1980-06-26 EP EP80103610A patent/EP0021428B1/de not_active Expired
- 1980-06-26 DE DE8080103610T patent/DE3065455D1/de not_active Expired
- 1980-06-26 AT AT80103610T patent/ATE5216T1/de not_active IP Right Cessation
- 1980-06-27 ES ES492910A patent/ES8200487A1/es not_active Expired
- 1980-06-27 JP JP8668380A patent/JPS569739A/ja active Pending
- 1980-06-27 BR BR8004034A patent/BR8004034A/pt unknown
-
1984
- 1984-04-13 US US06/599,816 patent/US4560636A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
ATE5216T1 (de) | 1983-11-15 |
EP0021428A1 (de) | 1981-01-07 |
ZA803523B (en) | 1981-06-24 |
JPS569739A (en) | 1981-01-31 |
EP0021428B1 (de) | 1983-11-02 |
FI802042A (fi) | 1980-12-30 |
DE3065455D1 (en) | 1983-12-08 |
AU5941780A (en) | 1981-01-08 |
ES492910A0 (es) | 1981-11-01 |
ES8200487A1 (es) | 1981-11-01 |
DE2926236A1 (de) | 1981-01-15 |
CA1148014A (en) | 1983-06-14 |
AU537479B2 (en) | 1984-06-28 |
US4560636A (en) | 1985-12-24 |
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