BR112015016653A2 - método de fabricação de uma chapa de impressão litográfica - Google Patents

método de fabricação de uma chapa de impressão litográfica

Info

Publication number
BR112015016653A2
BR112015016653A2 BR112015016653A BR112015016653A BR112015016653A2 BR 112015016653 A2 BR112015016653 A2 BR 112015016653A2 BR 112015016653 A BR112015016653 A BR 112015016653A BR 112015016653 A BR112015016653 A BR 112015016653A BR 112015016653 A2 BR112015016653 A2 BR 112015016653A2
Authority
BR
Brazil
Prior art keywords
manufacturing
printing plate
lithographic printing
lithographic
plate
Prior art date
Application number
BR112015016653A
Other languages
English (en)
Inventor
Sinnesael Jan
Hendrikx Peter
Carbonini Roberto
Verbrugghe Sam
Original Assignee
Agfa Graphics Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Graphics Nv filed Critical Agfa Graphics Nv
Publication of BR112015016653A2 publication Critical patent/BR112015016653A2/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3064—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations characterised by the transport means or means for confining the different units, e.g. to avoid the overflow
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3071—Process control means, e.g. for replenishing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
BR112015016653A 2013-01-11 2014-01-07 método de fabricação de uma chapa de impressão litográfica BR112015016653A2 (pt)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP13150972.1A EP2755088B1 (en) 2013-01-11 2013-01-11 Method of making a lithographic printing plate
US201361752462P 2013-01-15 2013-01-15
PCT/EP2014/050122 WO2014108385A1 (en) 2013-01-11 2014-01-07 Method of making a lithographic printing plate

Publications (1)

Publication Number Publication Date
BR112015016653A2 true BR112015016653A2 (pt) 2017-07-11

Family

ID=47552892

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112015016653A BR112015016653A2 (pt) 2013-01-11 2014-01-07 método de fabricação de uma chapa de impressão litográfica

Country Status (7)

Country Link
US (1) US9354520B2 (pt)
EP (1) EP2755088B1 (pt)
CN (1) CN104981738B (pt)
BR (1) BR112015016653A2 (pt)
ES (1) ES2588075T3 (pt)
PL (1) PL2755088T3 (pt)
WO (1) WO2014108385A1 (pt)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2755088B1 (en) * 2013-01-11 2016-07-27 Agfa Graphics NV Method of making a lithographic printing plate
JP2019513240A (ja) * 2016-03-16 2019-05-23 アグファ・ナームローゼ・フェンノートシャップＡｇｆａ Ｎｖ 平版印刷版の処理方法
JP7326660B2 (ja) * 2018-04-26 2023-08-16 エクシス プリプレス エヌ．ブイ． レリーフプレート前駆体を処理する装置および方法
EP3587113B1 (en) * 2018-06-21 2023-01-04 Agfa Offset Bv A lithographic printing plate precursor
US11633948B2 (en) 2020-01-22 2023-04-25 Eastman Kodak Company Method for making lithographic printing plates

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH613059A5 (en) 1975-06-30 1979-08-31 Hoechst Ag Method for producing a flat-bed printing forme
DE3410522A1 (de) 1984-03-22 1985-10-03 Hoechst Ag, 6230 Frankfurt Einbrenngummierung fuer offsetdruckplatten und verfahren zur herstellung einer offsetdruckform
DE3539992A1 (de) 1985-11-12 1987-05-14 Hoechst Ag Einbrenngummierung fuer offsetdruckplatten
DE3832032A1 (de) 1988-09-21 1990-03-22 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
US6514668B1 (en) 1996-12-26 2003-02-04 Mitsubishi Chemical Corporation Photosensitive lithographic printing plate
EP1025992B1 (en) 1999-02-02 2003-07-23 Agfa-Gevaert A method for making positive printing plates
DE19940921A1 (de) 1999-08-27 2001-03-01 Agfa Gevaert Ag Photopolymerisierbares Gemisch und damit hergestelltes Aufzeichnungsmaterial
DE19944073A1 (de) 1999-09-14 2001-03-15 Agfa Gevaert Ag Strahlungsempfindliches Aufzeichnungsmaterial mit Deckschicht
US6558873B1 (en) 1999-10-05 2003-05-06 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor
JP4098483B2 (ja) 2001-03-12 2008-06-11 富士フイルム株式会社 平版印刷版原版
US6893797B2 (en) 2001-11-09 2005-05-17 Kodak Polychrome Graphics Llc High speed negative-working thermal printing plates
EP1288720B1 (en) 2001-08-29 2012-02-01 FUJIFILM Corporation Plate-making method of printing plate
JP2003252939A (ja) 2002-03-01 2003-09-10 Fuji Photo Film Co Ltd 光重合性組成物
JP2004012706A (ja) 2002-06-05 2004-01-15 Fuji Photo Film Co Ltd 平版印刷版原版
US20040009426A1 (en) 2002-06-05 2004-01-15 Fuji Photo Film Co., Ltd. Infrared photosensitive composition and image recording material for infrared exposure
JP4418714B2 (ja) 2003-07-10 2010-02-24 富士フイルム株式会社 平版印刷版原版及び平版印刷方法
EP1588220B1 (en) 2003-07-17 2008-10-08 Kodak Graphic Communications GmbH Method for treating imaging materials
ATE491968T1 (de) 2003-07-22 2011-01-15 Fujifilm Corp Flachdruckplattenvorläufer und lithographisches druckverfahren
DE60320549T2 (de) 2003-08-13 2009-05-14 Agfa Graphics N.V. Verfahren zum Nacheinbrennen von lithographischen Druckplatten
JP4644458B2 (ja) 2003-09-30 2011-03-02 富士フイルム株式会社 平版印刷版原版および平版印刷方法
US20050153239A1 (en) * 2004-01-09 2005-07-14 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor and lithographic printing method using the same
US7153045B2 (en) * 2005-01-07 2006-12-26 Eastman Kodak Company Electro-mechanical system and method for mixing replenishment for plate precursor developers
EP1696274A3 (en) * 2005-02-23 2010-12-29 FUJIFILM Corporation Method for controlling development in automatic developing machine for photosensitive lithographic printing plate precursor and automatic developing machine therefor
JP4815270B2 (ja) * 2005-08-18 2011-11-16 富士フイルム株式会社 平版印刷版の作製方法及び作製装置
EP1788444B1 (en) * 2005-11-18 2011-01-26 Agfa Graphics N.V. Method of making a lithographic printing plate
EP2095948B1 (en) * 2008-02-28 2010-09-15 Agfa Graphics N.V. A method for making a lithographic printing plate
ES2378413T3 (es) * 2008-03-26 2012-04-12 Agfa Graphics N.V. Método de fabricación de planchas de impresión litográficas
JP2010197620A (ja) 2009-02-24 2010-09-09 Fujifilm Corp 平版印刷版原版の自動現像装置及び処理方法
WO2013034474A1 (en) * 2011-09-08 2013-03-14 Agfa Graphics Nv Method of making a lithographic printing plate
EP2755088B1 (en) * 2013-01-11 2016-07-27 Agfa Graphics NV Method of making a lithographic printing plate

Also Published As

Publication number Publication date
WO2014108385A1 (en) 2014-07-17
EP2755088B1 (en) 2016-07-27
ES2588075T3 (es) 2016-10-28
US9354520B2 (en) 2016-05-31
US20150355548A1 (en) 2015-12-10
CN104981738A (zh) 2015-10-14
EP2755088A1 (en) 2014-07-16
CN104981738B (zh) 2019-11-15
PL2755088T3 (pl) 2016-12-30

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Legal Events

Date Code Title Description
B25D Requested change of name of applicant approved

Owner name: AGFA NV (BE)

B06F Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette]
B06U Preliminary requirement: requests with searches performed by other patent offices: procedure suspended [chapter 6.21 patent gazette]
B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

Free format text: REFERENTE A 8A ANUIDADE.

B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2652 DE 03-11-2021 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.