BR112013021029A2 - laminado de resina fotossensível e processamento térmico do mesmo - Google Patents

laminado de resina fotossensível e processamento térmico do mesmo

Info

Publication number
BR112013021029A2
BR112013021029A2 BR112013021029A BR112013021029A BR112013021029A2 BR 112013021029 A2 BR112013021029 A2 BR 112013021029A2 BR 112013021029 A BR112013021029 A BR 112013021029A BR 112013021029 A BR112013021029 A BR 112013021029A BR 112013021029 A2 BR112013021029 A2 BR 112013021029A2
Authority
BR
Brazil
Prior art keywords
layer
photocurable
masking layer
ablation
relief pattern
Prior art date
Application number
BR112013021029A
Other languages
English (en)
Other versions
BR112013021029B1 (pt
Inventor
David A Recchia
Joseph H Blair
Ryan W Vest
Original Assignee
Macdermid Printings Solutions Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Macdermid Printings Solutions Llc filed Critical Macdermid Printings Solutions Llc
Publication of BR112013021029A2 publication Critical patent/BR112013021029A2/pt
Publication of BR112013021029B1 publication Critical patent/BR112013021029B1/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Optics & Photonics (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
  • Printing Methods (AREA)

Abstract

laminado de resina fotossensível e processamento térmico do mesmo a invenção se refere à revelação térmica de uma impressão em branco fotocurável para produzir uma padrão de alívio compreendendo uma pluralidade de pontos de alívio. a impressão em branco fotocurável compreende uma camada de reforço tendo pelo menos uma camada fotocurável disposta sobre a mesma e uma camada de mascaragem submetida à ablação por laser disposta sobre o topo de pelo menos uma camada fotocurável. o método inclui: (1) representar visualmente uma camada fotocurável através da ablação da camada de mascaragem para criar o padrão de alívio; (2) laminar uma membrana de barreira de oxigênio em cima da camada de mascaregem submetida à ablação, (3) expor a impressão em branco à radiação actínica através da membrana de barreira de oxigênio e camada de mascaragem submetida à ablação para reticular e curar seletivamente partes da camada fotocurável, desse modo, criando o padrão de alívio; (4) remover a membrana de barreira de oxigênio sobre a camada de mascaragem submetida à ablação; e (5) revelar termicamente a impressão em branco para remover a camada de mascaragem submetida à ablação e partes não curadas da camada fotocurável e revelar o padrão de alívio.
BR112013021029-0A 2011-02-18 2012-01-11 Método para revelar termicamente um branco para impressão fotocurável para produzir um padrão de relevo BR112013021029B1 (pt)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/030,810 US8652761B2 (en) 2011-02-18 2011-02-18 Photosensitive resin laminate and thermal processing of the same
US13/030,810 2011-02-18
PCT/US2012/020901 WO2012112238A1 (en) 2011-02-18 2012-01-11 Photosensitive resin laminate and thermal processing of the same

Publications (2)

Publication Number Publication Date
BR112013021029A2 true BR112013021029A2 (pt) 2016-10-11
BR112013021029B1 BR112013021029B1 (pt) 2021-03-23

Family

ID=46653020

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112013021029-0A BR112013021029B1 (pt) 2011-02-18 2012-01-11 Método para revelar termicamente um branco para impressão fotocurável para produzir um padrão de relevo

Country Status (10)

Country Link
US (2) US8652761B2 (pt)
EP (1) EP2676169B1 (pt)
JP (2) JP5796088B2 (pt)
CN (1) CN103403622B (pt)
BR (1) BR112013021029B1 (pt)
CA (2) CA2881616C (pt)
ES (1) ES2718094T3 (pt)
RU (1) RU2545372C1 (pt)
TW (1) TWI526333B (pt)
WO (1) WO2012112238A1 (pt)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8158331B2 (en) * 2009-10-01 2012-04-17 Recchia David A Method of improving print performance in flexographic printing plates
US8551688B2 (en) * 2011-04-21 2013-10-08 Ryan W. Vest Photosensitive resin laminate and thermal processing of the same
US8871431B2 (en) * 2011-08-08 2014-10-28 Timothy Gotsick Laminated flexographic printing sleeves and methods of making the same
US8524442B1 (en) 2012-02-13 2013-09-03 David A. Recchia Integrated membrane lamination and UV exposure system and method of the same
US8790864B2 (en) * 2012-08-27 2014-07-29 Kyle P. Baldwin Method of improving print performance in flexographic printing plates
US9040226B2 (en) 2013-05-13 2015-05-26 Macdermid Printing Solutions, Llc Method of improving print performance in flexographic printing plates
WO2015040094A2 (de) * 2013-09-18 2015-03-26 Flint Group Germany Gmbh Digital bebilderbares flexodruckelement und verfahren zur herstellung von flexodruckplatten
US9740099B2 (en) * 2014-11-12 2017-08-22 Macdermid Printing Solutions, Llc Flexographic printing plate with improved cure efficiency
JP7315731B2 (ja) * 2017-03-27 2023-07-26 エクシス ジャーマニー ゲーエムベーハー 画像レリーフ構造の製造方法
CN110678332B (zh) * 2017-03-27 2021-11-26 富林特集团德国有限公司 制造图形凸纹结构的方法
US10457082B2 (en) 2017-05-09 2019-10-29 Macdermid Graphics Solutions, Llc Flexographic printing plate with improved storage stability
CN112247361B (zh) * 2020-11-20 2021-11-19 华中科技大学 一种基于激光表面处理的选择性粘附转印方法

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SU1254416A1 (ru) * 1984-11-10 1986-08-30 Украинский Научно-Исследовательский Институт Полиграфической Промышленности Способ изготовлени фотополимерных печатных форм
US5262275A (en) * 1992-08-07 1993-11-16 E. I. Du Pont De Nemours And Company Flexographic printing element having an IR ablatable layer and process for making a flexographic printing plate
US5719009A (en) * 1992-08-07 1998-02-17 E. I. Du Pont De Nemours And Company Laser ablatable photosensitive elements utilized to make flexographic printing plates
US5468591A (en) * 1994-06-14 1995-11-21 Eastman Kodak Company Barrier layer for laser ablative imaging
US5506086A (en) * 1995-05-01 1996-04-09 E. I. Du Pont De Nemours And Company Process for making a flexographic printing plate
WO2001088615A1 (en) * 2000-05-17 2001-11-22 E.I. Dupont De Nemours And Company Process for preparing a flexographic printing plate
JP3769171B2 (ja) * 2000-05-17 2006-04-19 東京応化工業株式会社 フレキソ印刷版製造用多層感光材料
US6773859B2 (en) * 2001-03-06 2004-08-10 E. I. Du Pont De Nemours And Company Process for making a flexographic printing plate and a photosensitive element for use in the process
US6794107B2 (en) * 2002-10-28 2004-09-21 Kodak Polychrome Graphics Llc Thermal generation of a mask for flexography
US7126724B2 (en) 2003-03-11 2006-10-24 Kodak Graphic Communications Canada Company Flexographic printing
DE112004001662B4 (de) * 2003-09-12 2013-08-08 Eastman Kodak Co. (N.D.Ges.D. Staates New Jersey) Verfahren zur Erzeugung einer Reliefdruckplatte
US7682775B2 (en) * 2004-03-05 2010-03-23 E. I. Du Pont De Nemours And Company Process for preparing a flexographic printing plate
US7736836B2 (en) * 2004-09-22 2010-06-15 Jonghan Choi Slip film compositions containing layered silicates
US20060134557A1 (en) 2004-12-02 2006-06-22 Hackler Mark A Method and apparatus for thermal development having a textured support
US20070084368A1 (en) * 2005-10-13 2007-04-19 Ryan Vest Dynamic UV-exposure and thermal development of relief image printing elements
US7531285B2 (en) * 2006-01-17 2009-05-12 David Recchia Method of creating a digital mask for flexographic printing elements in situ
JP5021449B2 (ja) * 2007-02-13 2012-09-05 イーストマン コダック カンパニー 凸版印刷用原版およびその製造方法、凸版印刷版の製造方法、ならびにインク受容層形成用組成物
JP2009020449A (ja) * 2007-07-13 2009-01-29 Tokyo Ohka Kogyo Co Ltd 印刷版用原版および印刷版の製造方法
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JP5500853B2 (ja) * 2009-03-31 2014-05-21 富士フイルム株式会社 凸版印刷版並びに凸版印刷版の製版方法及び装置
US8899148B2 (en) * 2009-07-02 2014-12-02 E I Du Pont De Nemours And Company Method for printing a material onto a substrate
US8158331B2 (en) 2009-10-01 2012-04-17 Recchia David A Method of improving print performance in flexographic printing plates
US9720326B2 (en) * 2009-10-01 2017-08-01 David A. Recchia Method of improving print performance in flexographic printing plates

Also Published As

Publication number Publication date
CA2881616A1 (en) 2012-08-23
CA2825465A1 (en) 2012-08-23
CN103403622B (zh) 2016-08-10
US8652761B2 (en) 2014-02-18
ES2718094T3 (es) 2019-06-27
EP2676169A1 (en) 2013-12-25
JP5796088B2 (ja) 2015-10-21
US9086630B2 (en) 2015-07-21
US20140141378A1 (en) 2014-05-22
EP2676169B1 (en) 2019-03-13
BR112013021029B1 (pt) 2021-03-23
JP6028057B2 (ja) 2016-11-16
JP2014510940A (ja) 2014-05-01
TWI526333B (zh) 2016-03-21
CN103403622A (zh) 2013-11-20
US20120214102A1 (en) 2012-08-23
RU2545372C1 (ru) 2015-03-27
CA2881616C (en) 2017-05-23
CA2825465C (en) 2017-05-23
RU2013140794A (ru) 2015-03-27
WO2012112238A1 (en) 2012-08-23
JP2015158676A (ja) 2015-09-03
TW201236886A (en) 2012-09-16
EP2676169A4 (en) 2014-11-05

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Legal Events

Date Code Title Description
B25D Requested change of name of applicant approved

Owner name: MACDERMID GRAPHICS SOLUTIONS, LLC (US)

B06F Objections, documents and/or translations needed after an examination request according art. 34 industrial property law
B06U Preliminary requirement: requests with searches performed by other patent offices: suspension of the patent application procedure
B09A Decision: intention to grant
B16A Patent or certificate of addition of invention granted

Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 11/01/2012, OBSERVADAS AS CONDICOES LEGAIS.