BE793490A - LIGHT-SENSITIVE ITEM CONTAINING DIAZOQUINONE PHENOLATE, POLYMERIC BINDER, AND DIAZOQUINONE-SILOXANE - Google Patents

LIGHT-SENSITIVE ITEM CONTAINING DIAZOQUINONE PHENOLATE, POLYMERIC BINDER, AND DIAZOQUINONE-SILOXANE

Info

Publication number
BE793490A
BE793490A BE793490DA BE793490A BE 793490 A BE793490 A BE 793490A BE 793490D A BE793490D A BE 793490DA BE 793490 A BE793490 A BE 793490A
Authority
BE
Belgium
Prior art keywords
diazoquinone
phenolate
siloxane
light
polymeric binder
Prior art date
Application number
Other languages
French (fr)
Inventor
S Lazarus
E J Turner
Original Assignee
Hunt Chem Corp Philip A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication date
Publication of BE793490A publication Critical patent/BE793490A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0025—Crosslinking or vulcanising agents; including accelerators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
BE793490D 1972-05-23 LIGHT-SENSITIVE ITEM CONTAINING DIAZOQUINONE PHENOLATE, POLYMERIC BINDER, AND DIAZOQUINONE-SILOXANE BE793490A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US25609772A 1972-05-23 1972-05-23

Publications (1)

Publication Number Publication Date
BE793490A true BE793490A (en) 1973-06-29

Family

ID=22971094

Family Applications (1)

Application Number Title Priority Date Filing Date
BE793490D BE793490A (en) 1972-05-23 LIGHT-SENSITIVE ITEM CONTAINING DIAZOQUINONE PHENOLATE, POLYMERIC BINDER, AND DIAZOQUINONE-SILOXANE

Country Status (4)

Country Link
BE (1) BE793490A (en)
DE (1) DE2312499A1 (en)
FR (1) FR2185631A1 (en)
GB (1) GB1367830A (en)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4141733A (en) * 1977-10-25 1979-02-27 Eastman Kodak Company Development of light-sensitive quinone diazide compositions
JPS55127553A (en) * 1979-03-27 1980-10-02 Daicel Chem Ind Ltd Photosensitive composition
JPS55123614A (en) * 1979-03-16 1980-09-24 Daicel Chem Ind Ltd Photosensitive resin and positive type-photosensitive resin composition
JPS62149717A (en) * 1979-03-16 1987-07-03 Daicel Chem Ind Ltd Production of photopolymer
US4294911A (en) 1979-06-18 1981-10-13 Eastman Kodak Company Development of light-sensitive quinone diazide compositions using sulfite stabilizer
FR2478641A1 (en) * 1980-03-24 1981-09-25 Rhone Poulenc Ind Sulphonyl oxy-di:oxa-1,4-oxo-aza-tri:alkoxy-silyl hydrocarbyl benzene - useful photosensitisers in photoresist compsns.
US4628023A (en) * 1981-04-10 1986-12-09 Shipley Company Inc. Metal ion free photoresist developer composition with lower alkyl quaternary ammonium hydrozide as alkalai agent and a quaternary ammonium compound as surfactant
US4423138A (en) 1982-01-21 1983-12-27 Eastman Kodak Company Resist developer with ammonium or phosphonium compound and method of use to develop o-quinone diazide and novolac resist
DE3230171A1 (en) * 1982-08-13 1984-02-16 Hoechst Ag, 6230 Frankfurt AQUEOUS ALKALINE SOLUTION AND METHOD FOR DEVELOPING POSITIVE WORKING REPRODUCTION LAYERS
US4517276A (en) * 1982-11-29 1985-05-14 Varian Associates, Inc. Metal-containing organic photoresists
JPS59219743A (en) * 1983-05-28 1984-12-11 Tokyo Ohka Kogyo Co Ltd Positive type resist developing solution
DE3473359D1 (en) * 1983-06-29 1988-09-15 Fuji Photo Film Co Ltd PHOTOSOLUBILIZABLE COMPOSITION
US4606999A (en) * 1983-12-21 1986-08-19 Thiokol Corporation Development of positive photoresists using cyclic quaternary ammonium hydroxides
US4603195A (en) * 1983-12-30 1986-07-29 International Business Machines Corporation Organosilicon compound and use thereof in photolithography
GB8403698D0 (en) * 1984-02-13 1984-03-14 British Telecomm Semiconductor device fabrication
US4791046A (en) * 1984-04-26 1988-12-13 Oki Electric Industry Co., Ltd. Process for forming mask patterns of positive type resist material with trimethylsilynitrile
JPS60237439A (en) * 1984-04-26 1985-11-26 Oki Electric Ind Co Ltd Resist material and formation of fine pattern using it
JPH063549B2 (en) * 1984-12-25 1994-01-12 株式会社東芝 Positive photoresist developer composition
US4782008A (en) * 1985-03-19 1988-11-01 International Business Machines Corporation Plasma-resistant polymeric material, preparation thereof, and use thereof
JPS6232453A (en) * 1985-08-06 1987-02-12 Tokyo Ohka Kogyo Co Ltd Developing solution for positive type photoresist
US4784937A (en) * 1985-08-06 1988-11-15 Tokyo Ohka Kogyo Co., Ltd. Developing solution for positive-working photoresist comprising a metal ion free organic base and an anionic surfactant
US4737425A (en) * 1986-06-10 1988-04-12 International Business Machines Corporation Patterned resist and process
JPH0772799B2 (en) * 1986-08-13 1995-08-02 ソニー株式会社 Resist material
US5543268A (en) * 1992-05-14 1996-08-06 Tokyo Ohka Kogyo Co., Ltd. Developer solution for actinic ray-sensitive resist
US5378502A (en) * 1992-09-09 1995-01-03 U.S. Philips Corporation Method of chemically modifying a surface in accordance with a pattern
JP2007246417A (en) 2006-03-14 2007-09-27 Canon Inc Photosensitive silane coupling agent, method for modifying surface, method for forming pattern and method for producing device

Also Published As

Publication number Publication date
FR2185631A1 (en) 1974-01-04
GB1367830A (en) 1974-09-25
DE2312499A1 (en) 1973-12-06

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