BE756040A - Procede pour former, par implantation d'ions, une zone localisee dans un corps de semi-conducteur - Google Patents

Procede pour former, par implantation d'ions, une zone localisee dans un corps de semi-conducteur

Info

Publication number
BE756040A
BE756040A BE756040DA BE756040A BE 756040 A BE756040 A BE 756040A BE 756040D A BE756040D A BE 756040DA BE 756040 A BE756040 A BE 756040A
Authority
BE
Belgium
Prior art keywords
implantation
ions
forming
semiconductor body
localized zone
Prior art date
Application number
Other languages
English (en)
Inventor
M P Lepselter
H A Waggener
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication date
Publication of BE756040A publication Critical patent/BE756040A/fr

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/043—Dual dielectric
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/051—Etching
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/106—Masks, special
BE756040D 1969-09-15 Procede pour former, par implantation d'ions, une zone localisee dans un corps de semi-conducteur BE756040A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US85793669A 1969-09-15 1969-09-15

Publications (1)

Publication Number Publication Date
BE756040A true BE756040A (fr) 1971-02-15

Family

ID=25327063

Family Applications (1)

Application Number Title Priority Date Filing Date
BE756040D BE756040A (fr) 1969-09-15 Procede pour former, par implantation d'ions, une zone localisee dans un corps de semi-conducteur

Country Status (8)

Country Link
US (1) US3615874A (fr)
JP (1) JPS4838092B1 (fr)
BE (1) BE756040A (fr)
DE (1) DE2045304A1 (fr)
FR (1) FR2061710B1 (fr)
GB (1) GB1294516A (fr)
NL (1) NL7013399A (fr)
SE (1) SE352778B (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3717790A (en) * 1971-06-24 1973-02-20 Bell Telephone Labor Inc Ion implanted silicon diode array targets for electron beam camera tubes
US3947298A (en) * 1974-01-25 1976-03-30 Raytheon Company Method of forming junction regions utilizing R.F. sputtering
US4060427A (en) * 1976-04-05 1977-11-29 Ibm Corporation Method of forming an integrated circuit region through the combination of ion implantation and diffusion steps
JPS5935425A (ja) * 1982-08-23 1984-02-27 Toshiba Corp 半導体装置の製造方法
GB2137806B (en) * 1983-04-05 1986-10-08 Standard Telephones Cables Ltd Ion implantation in semiconductor bodies
JP2000041320A (ja) * 1998-05-20 2000-02-08 Yazaki Corp グロメット

Also Published As

Publication number Publication date
FR2061710B1 (fr) 1976-10-29
FR2061710A1 (fr) 1971-06-25
JPS4838092B1 (fr) 1973-11-15
GB1294516A (en) 1972-11-01
SE352778B (fr) 1973-01-08
NL7013399A (fr) 1971-03-17
US3615874A (en) 1971-10-26
DE2045304A1 (de) 1971-03-18

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