BE620882A - - Google Patents
Info
- Publication number
- BE620882A BE620882A BE620882DA BE620882A BE 620882 A BE620882 A BE 620882A BE 620882D A BE620882D A BE 620882DA BE 620882 A BE620882 A BE 620882A
- Authority
- BE
- Belgium
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/221—Ion beam deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/02—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances
- H01B3/10—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances metallic oxides
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
- H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques
- H01C17/12—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques by sputtering
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3178—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for applying thin layers on objects
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US108439A US3245895A (en) | 1961-05-08 | 1961-05-08 | Ion beam deposition as a means of making electric circuits and circuit elements |
Publications (1)
Publication Number | Publication Date |
---|---|
BE620882A true BE620882A (ko) |
Family
ID=22322213
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE620882D BE620882A (ko) | 1961-05-08 |
Country Status (6)
Country | Link |
---|---|
US (1) | US3245895A (ko) |
BE (1) | BE620882A (ko) |
DE (1) | DE1464258A1 (ko) |
GB (1) | GB1010209A (ko) |
LU (1) | LU42151A1 (ko) |
NL (1) | NL281145A (ko) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3341352A (en) * | 1962-12-10 | 1967-09-12 | Kenneth W Ehlers | Process for treating metallic surfaces with an ionic beam |
US3321390A (en) * | 1963-10-17 | 1967-05-23 | Sperry Rand Corp | Microcircuits formed by radio-fre-quency brush discharges |
US3386909A (en) * | 1964-12-08 | 1968-06-04 | Air Force Usa | Apparatus for depositing material on a filament from ionized coating material |
US3913520A (en) * | 1972-08-14 | 1975-10-21 | Precision Thin Film Corp | High vacuum deposition apparatus |
US4066527A (en) * | 1975-07-18 | 1978-01-03 | Futaba Denshi Kogyo K. K. | Method of producing semiconductor device |
NL7905720A (nl) * | 1979-07-24 | 1981-01-27 | Hazemeijer Bv | Werkwijze voor het verbeteren van schakelkontakten, in het bijzonder voor vakuumschakelaars. |
US4333808A (en) * | 1979-10-30 | 1982-06-08 | International Business Machines Corporation | Method for manufacture of ultra-thin film capacitor |
DK116681A (da) * | 1981-03-16 | 1982-09-17 | G Soerensen | Fremgangsmaade til fremstilling af en legering eller en blanding af gundstoffer i et substrats overflade |
US4664960A (en) * | 1982-09-23 | 1987-05-12 | Energy Conversion Devices, Inc. | Compositionally varied materials and method for synthesizing the materials |
US4520039A (en) * | 1982-09-23 | 1985-05-28 | Sovonics Solar Systems | Compositionally varied materials and method for synthesizing the materials |
GB2148608B (en) * | 1983-10-22 | 1987-03-18 | Stc Plc | Forming conductive regions in polymeric materials |
US4888202A (en) * | 1986-07-31 | 1989-12-19 | Nippon Telegraph And Telephone Corporation | Method of manufacturing thin compound oxide film and apparatus for manufacturing thin oxide film |
JPS6353259A (ja) * | 1986-08-22 | 1988-03-07 | Mitsubishi Electric Corp | 薄膜形成方法 |
US4804852A (en) * | 1987-01-29 | 1989-02-14 | Eaton Corporation | Treating work pieces with electro-magnetically scanned ion beams |
GB9113023D0 (en) | 1991-06-17 | 1991-08-07 | Xaar Ltd | Multi-channel arrary droplet deposition apparatus and method of manufacture thereof |
EP0901415B1 (en) | 1996-04-23 | 2002-07-24 | Xaar Technology Limited | Droplet deposition apparatus |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2563503A (en) * | 1951-08-07 | Transistor | ||
US2465715A (en) * | 1946-01-22 | 1949-03-29 | Allied Chem & Dye Corp | Isolation of styrene by azeotropic distillation with morpholines |
US2702863A (en) * | 1949-07-12 | 1955-02-22 | Koch Jorgen | Method of treating optical elements |
NL88584C (ko) * | 1950-01-31 | |||
US2784115A (en) * | 1953-05-04 | 1957-03-05 | Eastman Kodak Co | Method of producing titanium dioxide coatings |
US2860251A (en) * | 1953-10-15 | 1958-11-11 | Rauland Corp | Apparatus for manufacturing semi-conductor devices |
US2921892A (en) * | 1954-12-08 | 1960-01-19 | Amalgamated Growth Ind Inc | Apparatus and process for conducting chemical reactions |
US3119707A (en) * | 1960-03-31 | 1964-01-28 | Space Technology Lab Inc | Method for the deposition of thin films by electron deposition |
US3117022A (en) * | 1960-09-06 | 1964-01-07 | Space Technhology Lab Inc | Deposition arrangement |
-
0
- NL NL281145D patent/NL281145A/xx unknown
- BE BE620882D patent/BE620882A/xx unknown
-
1961
- 1961-05-08 US US108439A patent/US3245895A/en not_active Expired - Lifetime
-
1962
- 1962-07-04 GB GB25614/62A patent/GB1010209A/en not_active Expired
- 1962-07-27 DE DE19621464258 patent/DE1464258A1/de active Pending
- 1962-07-31 LU LU42151D patent/LU42151A1/xx unknown
Also Published As
Publication number | Publication date |
---|---|
NL281145A (ko) | |
LU42151A1 (ko) | 1963-01-31 |
US3245895A (en) | 1966-04-12 |
GB1010209A (en) | 1965-11-17 |
DE1464258A1 (de) | 1969-03-27 |