BE592540A - Composition de polissage et procédé pour la préparer. - Google Patents
Composition de polissage et procédé pour la préparer.Info
- Publication number
- BE592540A BE592540A BE592540A BE592540A BE592540A BE 592540 A BE592540 A BE 592540A BE 592540 A BE592540 A BE 592540A BE 592540 A BE592540 A BE 592540A BE 592540 A BE592540 A BE 592540A
- Authority
- BE
- Belgium
- Prior art keywords
- preparing
- polishing composition
- polishing
- composition
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1481—Pastes, optionally in the form of blocks or sticks
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1463—Aqueous liquid suspensions
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US824479A US3097083A (en) | 1959-07-02 | 1959-07-02 | Polishing composition and process of forming same |
Publications (1)
Publication Number | Publication Date |
---|---|
BE592540A true BE592540A (fr) | 1960-10-02 |
Family
ID=25241504
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE592540A BE592540A (fr) | 1959-07-02 | 1960-07-01 | Composition de polissage et procédé pour la préparer. |
Country Status (4)
Country | Link |
---|---|
US (1) | US3097083A (fr) |
BE (1) | BE592540A (fr) |
DE (1) | DE1292287B (fr) |
GB (1) | GB924047A (fr) |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3240580A (en) * | 1961-04-03 | 1966-03-15 | Libbey Owens Ford Glass Co | Glass polishing compositions of rare earth nitrates |
JPS396945B1 (fr) * | 1961-09-09 | 1964-05-09 | ||
US3317293A (en) * | 1964-04-20 | 1967-05-02 | Libbey Owens Ford Glass Co | Rare earth chlorides in a glass polishing composition |
US3317294A (en) * | 1964-07-16 | 1967-05-02 | Libbey Owens Ford Glass Co | Glass polishing composition comprising a water-soluble zinc salt |
US3388980A (en) * | 1965-12-21 | 1968-06-18 | Pittsburgh Plate Glass Co | Method of making glass polishing composition |
US3328141A (en) * | 1966-02-28 | 1967-06-27 | Tizon Chemical Corp | Process for polishing crystalline silicon |
US3388981A (en) * | 1966-09-30 | 1968-06-18 | Pittsburgh Plate Glass Co | Method of making glass polishing composition |
US3388982A (en) * | 1967-08-23 | 1968-06-18 | Pittsburgh Plate Glass Co | Glass polishing composition containing an inorganic barium salt |
US3388508A (en) * | 1967-08-23 | 1968-06-18 | Pittsburgh Plate Glass Co | Glass polishing composition containing dissolved zirconium and zirconium oxide |
FR2414071A1 (fr) * | 1978-01-05 | 1979-08-03 | Essilor Int | Materiau de polissage, notamment pour lentille ophtalmique en matiere organique |
SU1135625A1 (ru) * | 1978-05-04 | 1985-01-23 | Всесоюзный научно-исследовательский и конструкторско-технологический институт природных алмазов и инструмента | Масса дл изготовлени абразивных инструментов |
FR2472601A1 (fr) * | 1979-12-27 | 1981-07-03 | Rhone Poulenc Ind | Procede de fabrication de compositions de polissage a base de cerium |
FR2545830B1 (fr) * | 1983-05-13 | 1986-01-03 | Rhone Poulenc Spec Chim | Nouvelle composition de polissage a base de cerium et son procede de fabrication |
US4475981A (en) * | 1983-10-28 | 1984-10-09 | Ampex Corporation | Metal polishing composition and process |
FR2604443A1 (fr) * | 1986-09-26 | 1988-04-01 | Rhone Poulenc Chimie | Composition de polissage a base de cerium destinee au polissage des verres organiques |
FR2624519A1 (fr) * | 1987-12-09 | 1989-06-16 | Rhone Poulenc Chimie | Composition de polissage perfectionnee a base de cerium et son procede de preparation |
US6419554B2 (en) * | 1999-06-24 | 2002-07-16 | Micron Technology, Inc. | Fixed abrasive chemical-mechanical planarization of titanium nitride |
US6786945B2 (en) * | 2001-02-20 | 2004-09-07 | Hitachi Chemical Co., Ltd. | Polishing compound and method for polishing substrate |
WO2010118553A1 (fr) * | 2009-04-15 | 2010-10-21 | Rhodia (China) Co., Ltd. | Composition particulaire à base de cérium et sa préparation |
CN102666014B (zh) | 2010-03-12 | 2017-10-31 | 日立化成株式会社 | 悬浮液、研磨液套剂、研磨液以及使用它们的基板的研磨方法 |
WO2012070542A1 (fr) | 2010-11-22 | 2012-05-31 | 日立化成工業株式会社 | Suspension, ensemble de solution de polissage, procédé de polissage d'un substrat et substrat associé |
KR20130129396A (ko) | 2010-11-22 | 2013-11-28 | 히타치가세이가부시끼가이샤 | 슬러리, 연마액 세트, 연마액, 기판의 연마 방법 및 기판 |
KR20130133186A (ko) * | 2010-11-22 | 2013-12-06 | 히타치가세이가부시끼가이샤 | 지립의 제조 방법, 슬러리의 제조 방법 및 연마액의 제조 방법 |
WO2013125445A1 (fr) | 2012-02-21 | 2013-08-29 | 日立化成株式会社 | Abrasif, ensemble abrasif et procédé d'abrasion d'un substrat |
US10557058B2 (en) | 2012-02-21 | 2020-02-11 | Hitachi Chemical Company, Ltd. | Polishing agent, polishing agent set, and substrate polishing method |
SG11201407029XA (en) | 2012-05-22 | 2014-12-30 | Hitachi Chemical Co Ltd | Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate |
CN104321852B (zh) | 2012-05-22 | 2016-12-28 | 日立化成株式会社 | 悬浮液、研磨液套剂、研磨液、基体的研磨方法及基体 |
SG11201407087XA (en) | 2012-05-22 | 2014-12-30 | Hitachi Chemical Co Ltd | Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate |
DE202014005543U1 (de) | 2014-07-08 | 2015-02-20 | Clearopag Gmbh | Poliermittelanordnung |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2383500A (en) * | 1944-02-04 | 1945-08-28 | Albert S Polan | Polishing compound |
US2554070A (en) * | 1946-06-05 | 1951-05-22 | Shuron Optical Co Inc | Method of finishing lenses |
FR945664A (fr) * | 1947-04-25 | 1949-05-11 | Produit d'entretien | |
US2744001A (en) * | 1950-09-08 | 1956-05-01 | Rare Earths Inc | Polishing material and method of making same |
US2816824A (en) * | 1953-12-28 | 1957-12-17 | Corning Glass Works | Cerium oxide polishing composition |
US2865725A (en) * | 1956-06-18 | 1958-12-23 | Econ O Cloth | Polishing article |
-
1959
- 1959-07-02 US US824479A patent/US3097083A/en not_active Expired - Lifetime
-
1960
- 1960-07-01 GB GB23134/60A patent/GB924047A/en not_active Expired
- 1960-07-01 DE DEA35031A patent/DE1292287B/de active Pending
- 1960-07-01 BE BE592540A patent/BE592540A/fr unknown
Also Published As
Publication number | Publication date |
---|---|
US3097083A (en) | 1963-07-09 |
GB924047A (en) | 1963-04-18 |
DE1292287B (de) | 1969-04-10 |
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