BE592540A - Composition de polissage et procédé pour la préparer. - Google Patents

Composition de polissage et procédé pour la préparer.

Info

Publication number
BE592540A
BE592540A BE592540A BE592540A BE592540A BE 592540 A BE592540 A BE 592540A BE 592540 A BE592540 A BE 592540A BE 592540 A BE592540 A BE 592540A BE 592540 A BE592540 A BE 592540A
Authority
BE
Belgium
Prior art keywords
preparing
polishing composition
polishing
composition
Prior art date
Application number
BE592540A
Other languages
English (en)
Inventor
W L Silvernail
Original Assignee
American Potash & Chem Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Potash & Chem Corp filed Critical American Potash & Chem Corp
Publication of BE592540A publication Critical patent/BE592540A/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1481—Pastes, optionally in the form of blocks or sticks
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
BE592540A 1959-07-02 1960-07-01 Composition de polissage et procédé pour la préparer. BE592540A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US824479A US3097083A (en) 1959-07-02 1959-07-02 Polishing composition and process of forming same

Publications (1)

Publication Number Publication Date
BE592540A true BE592540A (fr) 1960-10-02

Family

ID=25241504

Family Applications (1)

Application Number Title Priority Date Filing Date
BE592540A BE592540A (fr) 1959-07-02 1960-07-01 Composition de polissage et procédé pour la préparer.

Country Status (4)

Country Link
US (1) US3097083A (fr)
BE (1) BE592540A (fr)
DE (1) DE1292287B (fr)
GB (1) GB924047A (fr)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3240580A (en) * 1961-04-03 1966-03-15 Libbey Owens Ford Glass Co Glass polishing compositions of rare earth nitrates
JPS396945B1 (fr) * 1961-09-09 1964-05-09
US3317293A (en) * 1964-04-20 1967-05-02 Libbey Owens Ford Glass Co Rare earth chlorides in a glass polishing composition
US3317294A (en) * 1964-07-16 1967-05-02 Libbey Owens Ford Glass Co Glass polishing composition comprising a water-soluble zinc salt
US3388980A (en) * 1965-12-21 1968-06-18 Pittsburgh Plate Glass Co Method of making glass polishing composition
US3328141A (en) * 1966-02-28 1967-06-27 Tizon Chemical Corp Process for polishing crystalline silicon
US3388981A (en) * 1966-09-30 1968-06-18 Pittsburgh Plate Glass Co Method of making glass polishing composition
US3388982A (en) * 1967-08-23 1968-06-18 Pittsburgh Plate Glass Co Glass polishing composition containing an inorganic barium salt
US3388508A (en) * 1967-08-23 1968-06-18 Pittsburgh Plate Glass Co Glass polishing composition containing dissolved zirconium and zirconium oxide
FR2414071A1 (fr) * 1978-01-05 1979-08-03 Essilor Int Materiau de polissage, notamment pour lentille ophtalmique en matiere organique
SU1135625A1 (ru) * 1978-05-04 1985-01-23 Всесоюзный научно-исследовательский и конструкторско-технологический институт природных алмазов и инструмента Масса дл изготовлени абразивных инструментов
FR2472601A1 (fr) * 1979-12-27 1981-07-03 Rhone Poulenc Ind Procede de fabrication de compositions de polissage a base de cerium
FR2545830B1 (fr) * 1983-05-13 1986-01-03 Rhone Poulenc Spec Chim Nouvelle composition de polissage a base de cerium et son procede de fabrication
US4475981A (en) * 1983-10-28 1984-10-09 Ampex Corporation Metal polishing composition and process
FR2604443A1 (fr) * 1986-09-26 1988-04-01 Rhone Poulenc Chimie Composition de polissage a base de cerium destinee au polissage des verres organiques
FR2624519A1 (fr) * 1987-12-09 1989-06-16 Rhone Poulenc Chimie Composition de polissage perfectionnee a base de cerium et son procede de preparation
US6419554B2 (en) * 1999-06-24 2002-07-16 Micron Technology, Inc. Fixed abrasive chemical-mechanical planarization of titanium nitride
US6786945B2 (en) * 2001-02-20 2004-09-07 Hitachi Chemical Co., Ltd. Polishing compound and method for polishing substrate
WO2010118553A1 (fr) * 2009-04-15 2010-10-21 Rhodia (China) Co., Ltd. Composition particulaire à base de cérium et sa préparation
CN102666014B (zh) 2010-03-12 2017-10-31 日立化成株式会社 悬浮液、研磨液套剂、研磨液以及使用它们的基板的研磨方法
WO2012070542A1 (fr) 2010-11-22 2012-05-31 日立化成工業株式会社 Suspension, ensemble de solution de polissage, procédé de polissage d'un substrat et substrat associé
KR20130129396A (ko) 2010-11-22 2013-11-28 히타치가세이가부시끼가이샤 슬러리, 연마액 세트, 연마액, 기판의 연마 방법 및 기판
KR20130133186A (ko) * 2010-11-22 2013-12-06 히타치가세이가부시끼가이샤 지립의 제조 방법, 슬러리의 제조 방법 및 연마액의 제조 방법
WO2013125445A1 (fr) 2012-02-21 2013-08-29 日立化成株式会社 Abrasif, ensemble abrasif et procédé d'abrasion d'un substrat
US10557058B2 (en) 2012-02-21 2020-02-11 Hitachi Chemical Company, Ltd. Polishing agent, polishing agent set, and substrate polishing method
SG11201407029XA (en) 2012-05-22 2014-12-30 Hitachi Chemical Co Ltd Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate
CN104321852B (zh) 2012-05-22 2016-12-28 日立化成株式会社 悬浮液、研磨液套剂、研磨液、基体的研磨方法及基体
SG11201407087XA (en) 2012-05-22 2014-12-30 Hitachi Chemical Co Ltd Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate
DE202014005543U1 (de) 2014-07-08 2015-02-20 Clearopag Gmbh Poliermittelanordnung

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2383500A (en) * 1944-02-04 1945-08-28 Albert S Polan Polishing compound
US2554070A (en) * 1946-06-05 1951-05-22 Shuron Optical Co Inc Method of finishing lenses
FR945664A (fr) * 1947-04-25 1949-05-11 Produit d'entretien
US2744001A (en) * 1950-09-08 1956-05-01 Rare Earths Inc Polishing material and method of making same
US2816824A (en) * 1953-12-28 1957-12-17 Corning Glass Works Cerium oxide polishing composition
US2865725A (en) * 1956-06-18 1958-12-23 Econ O Cloth Polishing article

Also Published As

Publication number Publication date
US3097083A (en) 1963-07-09
GB924047A (en) 1963-04-18
DE1292287B (de) 1969-04-10

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