AU8777598A - Apparatus and method for processing an object - Google Patents

Apparatus and method for processing an object

Info

Publication number
AU8777598A
AU8777598A AU87775/98A AU8777598A AU8777598A AU 8777598 A AU8777598 A AU 8777598A AU 87775/98 A AU87775/98 A AU 87775/98A AU 8777598 A AU8777598 A AU 8777598A AU 8777598 A AU8777598 A AU 8777598A
Authority
AU
Australia
Prior art keywords
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU87775/98A
Inventor
Jerry D. Cripe
Barbara Ann Wills
Moji M. Zahedi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Motorola Solutions Inc
Original Assignee
Motorola Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Motorola Inc filed Critical Motorola Inc
Publication of AU8777598A publication Critical patent/AU8777598A/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching
    • H01L21/67086—Apparatus for fluid treatment for etching for wet etching with the semiconductor substrates being dipped in baths or vessels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
AU87775/98A 1997-08-11 1998-08-10 Apparatus and method for processing an object Abandoned AU8777598A (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US90798197A 1997-08-11 1997-08-11
US08907981 1997-08-11
US12463298A 1998-07-29 1998-07-29
US09124632 1998-07-29
PCT/US1998/016586 WO1999008313A1 (en) 1997-08-11 1998-08-10 Apparatus and method for processing an object

Publications (1)

Publication Number Publication Date
AU8777598A true AU8777598A (en) 1999-03-01

Family

ID=26822791

Family Applications (1)

Application Number Title Priority Date Filing Date
AU87775/98A Abandoned AU8777598A (en) 1997-08-11 1998-08-10 Apparatus and method for processing an object

Country Status (2)

Country Link
AU (1) AU8777598A (en)
WO (1) WO1999008313A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6564469B2 (en) * 2001-07-09 2003-05-20 Motorola, Inc. Device for performing surface treatment on semiconductor wafers
JP4330959B2 (en) * 2003-09-05 2009-09-16 株式会社東芝 Semiconductor substrate cleaning method and cleaning apparatus, semiconductor substrate, and semiconductor device

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR0163362B1 (en) * 1992-03-05 1999-02-01 이노우에 아키라 Treatment bath for cleaning apparatus
US5520205A (en) * 1994-07-01 1996-05-28 Texas Instruments Incorporated Apparatus for wafer cleaning with rotation
DE19541436C2 (en) * 1995-11-07 1998-10-08 Steag Micro Tech Gmbh Plant for the treatment of objects in a process tank

Also Published As

Publication number Publication date
WO1999008313A1 (en) 1999-02-18

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase