AU5966600A - Method and apparatus for production of a doped feed rod by ion implantation - Google Patents
Method and apparatus for production of a doped feed rod by ion implantationInfo
- Publication number
- AU5966600A AU5966600A AU59666/00A AU5966600A AU5966600A AU 5966600 A AU5966600 A AU 5966600A AU 59666/00 A AU59666/00 A AU 59666/00A AU 5966600 A AU5966600 A AU 5966600A AU 5966600 A AU5966600 A AU 5966600A
- Authority
- AU
- Australia
- Prior art keywords
- production
- ion implantation
- feed rod
- doped feed
- doped
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/08—Single-crystal growth by zone-melting; Refining by zone-melting adding crystallising materials or reactants forming it in situ to the molten zone
- C30B13/10—Single-crystal growth by zone-melting; Refining by zone-melting adding crystallising materials or reactants forming it in situ to the molten zone with addition of doping materials
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/02—Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt
- C30B15/04—Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt adding doping materials, e.g. for n-p-junction
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DKPA199901042 | 1999-07-19 | ||
DKPA199901042 | 1999-07-19 | ||
PCT/DK2000/000402 WO2001006041A1 (en) | 1999-07-19 | 2000-07-14 | Method and apparatus for production of a doped feed rod by ion implantation |
Publications (1)
Publication Number | Publication Date |
---|---|
AU5966600A true AU5966600A (en) | 2001-02-05 |
Family
ID=8100346
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU59666/00A Abandoned AU5966600A (en) | 1999-07-19 | 2000-07-14 | Method and apparatus for production of a doped feed rod by ion implantation |
Country Status (2)
Country | Link |
---|---|
AU (1) | AU5966600A (en) |
WO (1) | WO2001006041A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1328416C (en) * | 2003-02-11 | 2007-07-25 | 托普西尔半导体原料公司 | An apparatus for and a method of manufacturing a single crystal rod |
ITVI20110323A1 (en) * | 2011-12-19 | 2013-06-20 | Pvd Technologies Snc Di Vidani A E A | FORCED DRIVING METHOD OF A SEMICONDUCTOR MATERIAL LINE AND PLANT THAT MAKES THIS METHOD |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1186127A (en) * | 1968-01-05 | 1970-04-02 | Dow Corning | Method and Apparatus for Doping Semiconductors. |
DE2356376A1 (en) * | 1973-11-12 | 1975-05-15 | Siemens Ag | PROCESS FOR PRODUCING HOMOGENOUS DOPED SILICON CRYSTALS WITH N-CONDUCTIVITY BY NEUTRON RADIATION |
DE2415717A1 (en) * | 1974-04-01 | 1975-10-16 | Siemens Ag | Reproducible doping of (silicon monocrystal) semiconductor rod - by incorporating dopant in surface layer and non-crucible zone melting |
DE2427645A1 (en) * | 1974-06-07 | 1976-01-02 | Siemens Ag | Doping semiconductor crystal rod - by forming doped layer by nuclear reaction before zone melting, giving reproducible results |
US4094730A (en) * | 1977-03-11 | 1978-06-13 | The United States Of America As Represented By The Secretary Of The Air Force | Method for fabrication of high minority carrier lifetime, low to moderate resistivity, single crystal silicon |
US4270972A (en) * | 1980-03-31 | 1981-06-02 | Rockwell International Corporation | Method for controlled doping semiconductor material with highly volatile dopant |
US4556448A (en) * | 1983-10-19 | 1985-12-03 | International Business Machines Corporation | Method for controlled doping of silicon crystals by improved float zone technique |
JPH085663B2 (en) * | 1987-05-29 | 1996-01-24 | 三菱マテリアル株式会社 | Si-B alloy dopant material for producing Si single crystal by pulling method |
-
2000
- 2000-07-14 AU AU59666/00A patent/AU5966600A/en not_active Abandoned
- 2000-07-14 WO PCT/DK2000/000402 patent/WO2001006041A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2001006041A1 (en) | 2001-01-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |