AU5651399A - Exposure system, exposure device, application device, development device, and method of controlling wafer treating environment in the exposure system - Google Patents

Exposure system, exposure device, application device, development device, and method of controlling wafer treating environment in the exposure system

Info

Publication number
AU5651399A
AU5651399A AU56513/99A AU5651399A AU5651399A AU 5651399 A AU5651399 A AU 5651399A AU 56513/99 A AU56513/99 A AU 56513/99A AU 5651399 A AU5651399 A AU 5651399A AU 5651399 A AU5651399 A AU 5651399A
Authority
AU
Australia
Prior art keywords
exposure
exposure system
wafer treating
controlling wafer
development
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU56513/99A
Inventor
Toshihiko Tsuji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU5651399A publication Critical patent/AU5651399A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum

Landscapes

  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU56513/99A 1999-09-14 1999-09-14 Exposure system, exposure device, application device, development device, and method of controlling wafer treating environment in the exposure system Abandoned AU5651399A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP1999/005026 WO2001020650A1 (en) 1999-09-14 1999-09-14 Exposure system, exposure device, application device, development device, and method of controlling wafer treating environment in the exposure system

Publications (1)

Publication Number Publication Date
AU5651399A true AU5651399A (en) 2001-04-17

Family

ID=14236716

Family Applications (1)

Application Number Title Priority Date Filing Date
AU56513/99A Abandoned AU5651399A (en) 1999-09-14 1999-09-14 Exposure system, exposure device, application device, development device, and method of controlling wafer treating environment in the exposure system

Country Status (3)

Country Link
AU (1) AU5651399A (en)
TW (1) TW430877B (en)
WO (1) WO2001020650A1 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW594835B (en) 2000-05-09 2004-06-21 Tokyo Electron Ltd System for coating and developing
EP1457832A1 (en) * 2003-03-11 2004-09-15 ASML Netherlands B.V. Lithographic projection assembly, load lock and method for transferring objects
SG115631A1 (en) 2003-03-11 2005-10-28 Asml Netherlands Bv Lithographic projection assembly, load lock and method for transferring objects
CN102854755A (en) * 2003-07-09 2013-01-02 株式会社尼康 Exposure apparatus
JP4759272B2 (en) * 2005-01-13 2011-08-31 ルネサスエレクトロニクス株式会社 Exposure equipment
JP2006286709A (en) * 2005-03-31 2006-10-19 Toppan Printing Co Ltd Exposure apparatus and method of forming photoresist pattern using the same
JP5304647B2 (en) 2007-06-28 2013-10-02 富士通セミコンダクター株式会社 Heat treatment apparatus and semiconductor device manufacturing method
CN113721429A (en) * 2021-09-10 2021-11-30 大连理工大学 Maskless photoetching system and corresponding photoetching method thereof

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6079358A (en) * 1983-10-07 1985-05-07 Nippon Kogaku Kk <Nikon> Projecting optical device
JPH0590133A (en) * 1991-09-27 1993-04-09 Matsushita Electric Ind Co Ltd X-ray aligner

Also Published As

Publication number Publication date
WO2001020650A1 (en) 2001-03-22
TW430877B (en) 2001-04-21

Similar Documents

Publication Publication Date Title
AU6005499A (en) Substrate, stage device, method of driving stage, exposure system and exposure method
AU4653999A (en) Exposure method and system
AU1179200A (en) Exposure method and device
AU7617900A (en) System and method for controlling effluents in treatment systems
AU6853698A (en) Method and device for exposure control, method and device for exposure, and method of manufacture of device
AU1051899A (en) Exposure apparatus, apparatus for manufacturing devices, and method of manufacturing exposure apparatuses
AU2076099A (en) Exposure method and device
AU3193800A (en) Exposure method, illuminating device, and exposure system
AU6038600A (en) Device and method for treatment of mitral insufficiency
AU2002246319A1 (en) Exposure device and substrate processing system and device producing method
AU6875100A (en) Laser device and exposure method
AU2576000A (en) Stage device and production method thereof, position control method, exposure system and production method thereof, and device and production method thereof
AU5446000A (en) Wafer drying apparatus and method
AU1555001A (en) Exposure method and apparatus
AU6365499A (en) Stage device, exposure system, method of device manufacture, and device
AU4143000A (en) Exposure method and apparatus
GB2332757B (en) Development system for manufacturing semiconductor devices and controlling method thereof
AU4949900A (en) Exposure method and apparatus
AU4779700A (en) Exposure system, method of manufacturing device, and method of environmental control of exposure system
AU2327800A (en) Exposure method and apparatus
AU1554901A (en) Exposure method and exposure apparatus
AU2616500A (en) Semiconductor fabrication method and system
AU1890699A (en) Exposure method and lithography system, exposure apparatus and method of producing the apparatus, and method of producing device
EP2237281B8 (en) Semiconductor memory device, and method of controlling the same
AU4395099A (en) Exposure method and device

Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase