AU5587500A - Inverter made of complementary LTiGTpLT/iGT and LTiGTnLT/iGT channel transistorsusing a single directly-deposited microcrystalline silicon film - Google Patents
Inverter made of complementary LTiGTpLT/iGT and LTiGTnLT/iGT channel transistorsusing a single directly-deposited microcrystalline silicon filmInfo
- Publication number
- AU5587500A AU5587500A AU55875/00A AU5587500A AU5587500A AU 5587500 A AU5587500 A AU 5587500A AU 55875/00 A AU55875/00 A AU 55875/00A AU 5587500 A AU5587500 A AU 5587500A AU 5587500 A AU5587500 A AU 5587500A
- Authority
- AU
- Australia
- Prior art keywords
- igt
- transistorsusing
- ltigtplt
- ltigtnlt
- complementary
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1259—Multistep manufacturing methods
- H01L27/127—Multistep manufacturing methods with a particular formation, treatment or patterning of the active layer specially adapted to the circuit arrangement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13337299P | 1999-05-10 | 1999-05-10 | |
US60133372 | 1999-05-10 | ||
PCT/US2000/012762 WO2000068978A1 (en) | 1999-05-10 | 2000-05-10 | INVERTER MADE OF COMPLEMENTARY p AND n CHANNEL TRANSISTORS USING A SINGLE DIRECTLY-DEPOSITED MICROCRYSTALLINE SILICON FILM |
Publications (1)
Publication Number | Publication Date |
---|---|
AU5587500A true AU5587500A (en) | 2000-11-21 |
Family
ID=22458296
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU55875/00A Abandoned AU5587500A (en) | 1999-05-10 | 2000-05-10 | Inverter made of complementary LTiGTpLT/iGT and LTiGTnLT/iGT channel transistorsusing a single directly-deposited microcrystalline silicon film |
Country Status (2)
Country | Link |
---|---|
AU (1) | AU5587500A (en) |
WO (1) | WO2000068978A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104465371A (en) * | 2014-12-31 | 2015-03-25 | 深圳市华星光电技术有限公司 | Excimer laser annealing pretreatment method, thin film transistor and production method of thin film transistor |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4980303A (en) * | 1987-08-19 | 1990-12-25 | Fujitsu Limited | Manufacturing method of a Bi-MIS semiconductor device |
US4889609A (en) * | 1988-09-06 | 1989-12-26 | Ovonic Imaging Systems, Inc. | Continuous dry etching system |
US5223449A (en) * | 1989-02-16 | 1993-06-29 | Morris Francis J | Method of making an integrated circuit composed of group III-V compound field effect and bipolar semiconductors |
US5946561A (en) * | 1991-03-18 | 1999-08-31 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for forming the same |
US5818076A (en) * | 1993-05-26 | 1998-10-06 | Semiconductor Energy Laboratory Co., Ltd. | Transistor and semiconductor device |
JPH08172202A (en) * | 1994-12-20 | 1996-07-02 | Sharp Corp | Thin film transistor and manufacture thereof |
TW303526B (en) * | 1994-12-27 | 1997-04-21 | Matsushita Electric Ind Co Ltd | |
JP3581546B2 (en) * | 1997-11-27 | 2004-10-27 | キヤノン株式会社 | Method for forming microcrystalline silicon film and method for manufacturing photovoltaic element |
-
2000
- 2000-05-10 AU AU55875/00A patent/AU5587500A/en not_active Abandoned
- 2000-05-10 WO PCT/US2000/012762 patent/WO2000068978A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2000068978A1 (en) | 2000-11-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |