AU4630500A - Carbon plasma pulsed source - Google Patents

Carbon plasma pulsed source

Info

Publication number: AU4630500A
Authority: AU; Australia
Prior art keywords: pulsed source; carbon plasma; plasma pulsed; carbon; source
Prior art date: 1999-06-02
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Abandoned

Application number

AU46305/00A

Other languages

English (en)

Inventor

Valery Pavlovich Goncharenko

Vitaly Nikolaevich Inkin

Grigory Grigorievich Kirpilenko

Alexandr Yakovlevich Kolpakov

Anatoly Ivanovich Maslov

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

ZAKRYTOE AKTSIONERNOE OBSCHESTVO "PATINOR KOUTINGS LIMITED"

Original Assignee

ZAKRYTOE AKTSIONERNOE OBSCHESTVO "PATINOR KOUTINGS LIMITED"

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1999-06-02

Filing date

2000-05-16

Publication date

2000-12-28

2000-05-16 Application filed by ZAKRYTOE AKTSIONERNOE OBSCHESTVO "PATINOR KOUTINGS LIMITED" filed Critical ZAKRYTOE AKTSIONERNOE OBSCHESTVO "PATINOR KOUTINGS LIMITED"

2000-12-28 Publication of AU4630500A publication Critical patent/AU4630500A/en

Status Abandoned legal-status Critical Current

Links

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/48—Generating plasma using an arc
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32614—Consumable cathodes for arc discharge

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Plasma & Fusion (AREA)
Physics & Mathematics (AREA)
Materials Engineering (AREA)
Chemical Kinetics & Catalysis (AREA)
Spectroscopy & Molecular Physics (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Analytical Chemistry (AREA)
Chemical Vapour Deposition (AREA)
Carbon And Carbon Compounds (AREA)
Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)

AU46305/00A 1999-06-02 2000-05-16 Carbon plasma pulsed source Abandoned AU4630500A (en)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
RO99113232		1999-06-02
RU99113232/06A RU2153782C1 (ru)	1999-06-02	1999-06-02	Импульсный источник углеродной плазмы
PCT/RU2000/000178 WO2000075393A2 (fr)	1999-06-02	2000-05-16	Source a impulsions de plasma carbone

Publications (1)

Publication Number	Publication Date
AU4630500A true AU4630500A (en)	2000-12-28

Family

ID=20221562

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
AU46305/00A Abandoned AU4630500A (en)	1999-06-02	2000-05-16	Carbon plasma pulsed source

Country Status (3)

Country	Link
AU (1)	AU4630500A (ru)
RU (1)	RU2153782C1 (ru)
WO (1)	WO2000075393A2 (ru)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP3555844B2 (ja)	1999-04-09	2004-08-18	三宅正二郎	摺動部材およびその製造方法
WO2002062113A1 (fr) *	2001-02-01	2002-08-08	Zakrytoe Aktsionernoe Obschestvo 'patinor Coatings Limited'	Source d'impulsions du plasma de carbone
US6969198B2 (en)	2002-11-06	2005-11-29	Nissan Motor Co., Ltd.	Low-friction sliding mechanism
JP4863152B2 (ja)	2003-07-31	2012-01-25	日産自動車株式会社	歯車
EP1666573B1 (en)	2003-08-06	2019-05-15	Nissan Motor Company Limited	Low-friction sliding mechanism and method of friction reduction
JP4973971B2 (ja)	2003-08-08	2012-07-11	日産自動車株式会社	摺動部材
EP1508611B1 (en)	2003-08-22	2019-04-17	Nissan Motor Co., Ltd.	Transmission comprising low-friction sliding members and transmission oil therefor
DE102004029526A1 (de)	2004-06-18	2006-01-12	Robert Bosch Gmbh	Vorrichtung zur Kohlenstoffabschiebung
DE102004029525B4 (de) *	2004-06-18	2006-12-07	Robert Bosch Gmbh	Befestigungseinheit für Zündeinheiten und Vorrichtung zur Kohlenstoffabscheidung
JP6487943B2 (ja) *	2014-05-13	2019-03-20	アルゴールアルジャバソシエテアノニムＡｒｇｏｒＡｌｊｂａＳ．Ａ．	真空中の陰極アーク物理蒸着（ｐｖｄ）においてマクロ粒子をフィルタリングする方法
CN113564540B (zh) *	2021-07-30	2023-10-03	江苏徐工工程机械研究院有限公司	电弧离子镀膜装置及镀膜方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
SU1116967A4 (ru) *	1983-07-13	1995-05-27	Точицкий Эдуард Иванович	Вакуумное электроразрядное устройство
SU1551233A4 (ru) *	1988-09-26	1995-05-27	Кунавин Виктор Васильевич	Вакуумное электроразрядное устройство
FI89725C (fi) *	1992-01-10	1993-11-10	Asko Anttila	Foerfarande och anordning foer anvaendning vid en ytbelaeggningsanordning

1999
- 1999-06-02 RU RU99113232/06A patent/RU2153782C1/ru not_active IP Right Cessation
2000
- 2000-05-16 WO PCT/RU2000/000178 patent/WO2000075393A2/ru active Application Filing
- 2000-05-16 AU AU46305/00A patent/AU4630500A/en not_active Abandoned

Also Published As

Publication number	Publication date
RU2153782C1 (ru)	2000-07-27
WO2000075393A2 (fr)	2000-12-14
WO2000075393A3 (fr)	2002-03-07
WO2000075393A8 (fr)	2001-03-15

Legal Events

Date	Code	Title	Description
2002-04-11	MK6	Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase

Publication	Publication Date	Title
AU2003299015A1 (en)	2004-04-08	Beam plasma source
AU2001291945A1 (en)	2002-03-26	Plasma sterilisation system
GB0023701D0 (en)	2000-11-08	High-frequency ion source
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AU7570900A (en)	2000-12-28	Atmospheric-pressure plasma decontamination/sterilization chamber
AU4026699A (en)	1999-12-20	Metastable atom bombardment source
AU7828298A (en)	1998-12-30	Plasma torch
AUPS044202A0 (en)	2002-03-07	Microwave plasma source
AUPQ861500A0 (en)	2000-08-03	Plasma source for spectrometry
EP1220272A4 (en)	2007-04-11	SOURCE OF BEAMS
AUPQ831200A0 (en)	2000-07-13	X-ray micro-target source
AU1062000A (en)	2000-05-29	Power source
AU4334499A (en)	1999-12-20	Radiation source
AU3926901A (en)	2001-09-03	High frequency plasma source
AUPP479298A0 (en)	1998-08-13	Ion source
AU4630500A (en)	2000-12-28	Carbon plasma pulsed source
GB2363676B (en)	2005-03-02	Plasma source
GB2357897B (en)	2004-04-14	Ion source assembly
AU2003231431A1 (en)	2003-10-08	Plasma electron-emitting source
AU1321601A (en)	2001-05-08	Multiple source location method
AU2003206510A1 (en)	2003-09-02	Gazeification de dechets par plasma
EP1087479B8 (en)	2006-02-01	Stabilized laser source
AU2001237845A1 (en)	2001-12-11	Plasma ion source and method
AU1533901A (en)	2001-06-04	An illumination source
AUPP979099A0 (en)	1999-05-13	Ioniser for effluent gas