AU4630500A - Carbon plasma pulsed source - Google Patents
Carbon plasma pulsed sourceInfo
- Publication number
- AU4630500A AU4630500A AU46305/00A AU4630500A AU4630500A AU 4630500 A AU4630500 A AU 4630500A AU 46305/00 A AU46305/00 A AU 46305/00A AU 4630500 A AU4630500 A AU 4630500A AU 4630500 A AU4630500 A AU 4630500A
- Authority
- AU
- Australia
- Prior art keywords
- pulsed source
- carbon plasma
- plasma pulsed
- carbon
- source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/48—Generating plasma using an arc
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32614—Consumable cathodes for arc discharge
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Carbon And Carbon Compounds (AREA)
- Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
RO99113232 | 1999-06-02 | ||
RU99113232/06A RU2153782C1 (ru) | 1999-06-02 | 1999-06-02 | Импульсный источник углеродной плазмы |
PCT/RU2000/000178 WO2000075393A2 (fr) | 1999-06-02 | 2000-05-16 | Source a impulsions de plasma carbone |
Publications (1)
Publication Number | Publication Date |
---|---|
AU4630500A true AU4630500A (en) | 2000-12-28 |
Family
ID=20221562
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU46305/00A Abandoned AU4630500A (en) | 1999-06-02 | 2000-05-16 | Carbon plasma pulsed source |
Country Status (3)
Country | Link |
---|---|
AU (1) | AU4630500A (ru) |
RU (1) | RU2153782C1 (ru) |
WO (1) | WO2000075393A2 (ru) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3555844B2 (ja) | 1999-04-09 | 2004-08-18 | 三宅 正二郎 | 摺動部材およびその製造方法 |
WO2002062113A1 (fr) * | 2001-02-01 | 2002-08-08 | Zakrytoe Aktsionernoe Obschestvo 'patinor Coatings Limited' | Source d'impulsions du plasma de carbone |
US6969198B2 (en) | 2002-11-06 | 2005-11-29 | Nissan Motor Co., Ltd. | Low-friction sliding mechanism |
JP4863152B2 (ja) | 2003-07-31 | 2012-01-25 | 日産自動車株式会社 | 歯車 |
EP1666573B1 (en) | 2003-08-06 | 2019-05-15 | Nissan Motor Company Limited | Low-friction sliding mechanism and method of friction reduction |
JP4973971B2 (ja) | 2003-08-08 | 2012-07-11 | 日産自動車株式会社 | 摺動部材 |
EP1508611B1 (en) | 2003-08-22 | 2019-04-17 | Nissan Motor Co., Ltd. | Transmission comprising low-friction sliding members and transmission oil therefor |
DE102004029526A1 (de) | 2004-06-18 | 2006-01-12 | Robert Bosch Gmbh | Vorrichtung zur Kohlenstoffabschiebung |
DE102004029525B4 (de) * | 2004-06-18 | 2006-12-07 | Robert Bosch Gmbh | Befestigungseinheit für Zündeinheiten und Vorrichtung zur Kohlenstoffabscheidung |
JP6487943B2 (ja) * | 2014-05-13 | 2019-03-20 | アルゴール アルジャバ ソシエテ アノニムArgor Aljba S.A. | 真空中の陰極アーク物理蒸着(pvd)においてマクロ粒子をフィルタリングする方法 |
CN113564540B (zh) * | 2021-07-30 | 2023-10-03 | 江苏徐工工程机械研究院有限公司 | 电弧离子镀膜装置及镀膜方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SU1116967A4 (ru) * | 1983-07-13 | 1995-05-27 | Точицкий Эдуард Иванович | Вакуумное электроразрядное устройство |
SU1551233A4 (ru) * | 1988-09-26 | 1995-05-27 | Кунавин Виктор Васильевич | Вакуумное электроразрядное устройство |
FI89725C (fi) * | 1992-01-10 | 1993-11-10 | Asko Anttila | Foerfarande och anordning foer anvaendning vid en ytbelaeggningsanordning |
-
1999
- 1999-06-02 RU RU99113232/06A patent/RU2153782C1/ru not_active IP Right Cessation
-
2000
- 2000-05-16 WO PCT/RU2000/000178 patent/WO2000075393A2/ru active Application Filing
- 2000-05-16 AU AU46305/00A patent/AU4630500A/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
RU2153782C1 (ru) | 2000-07-27 |
WO2000075393A2 (fr) | 2000-12-14 |
WO2000075393A3 (fr) | 2002-03-07 |
WO2000075393A8 (fr) | 2001-03-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |