AU3124193A - Device and method for reflection and dispersion of x-rays - Google Patents
Device and method for reflection and dispersion of x-raysInfo
- Publication number
- AU3124193A AU3124193A AU31241/93A AU3124193A AU3124193A AU 3124193 A AU3124193 A AU 3124193A AU 31241/93 A AU31241/93 A AU 31241/93A AU 3124193 A AU3124193 A AU 3124193A AU 3124193 A AU3124193 A AU 3124193A
- Authority
- AU
- Australia
- Prior art keywords
- rays
- reflection
- dispersion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000006185 dispersion Substances 0.000 title 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
- G21K1/062—Devices having a multilayer structure
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/067—Construction details
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US78756091A | 1991-11-04 | 1991-11-04 | |
US787560 | 1991-11-04 |
Publications (1)
Publication Number | Publication Date |
---|---|
AU3124193A true AU3124193A (en) | 1993-06-07 |
Family
ID=25141883
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU31241/93A Abandoned AU3124193A (en) | 1991-11-04 | 1992-10-30 | Device and method for reflection and dispersion of x-rays |
Country Status (2)
Country | Link |
---|---|
AU (1) | AU3124193A (en) |
WO (1) | WO1993009545A1 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7261957B2 (en) | 2000-03-31 | 2007-08-28 | Carl Zeiss Smt Ag | Multilayer system with protecting layer system and production method |
JP3629520B2 (en) * | 2002-03-05 | 2005-03-16 | 理学電機工業株式会社 | X-ray spectroscopic element and fluorescent X-ray analyzer using the same |
EP1348984A1 (en) * | 2002-03-27 | 2003-10-01 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Optical broad band element and process for its production |
DE102008040265A1 (en) | 2008-07-09 | 2010-01-14 | Carl Zeiss Smt Ag | Reflective optical element and method for its production |
US9773578B2 (en) | 2013-02-15 | 2017-09-26 | Asml Netherlands B.V. | Radiation source-collector and method for manufacture |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4727000A (en) * | 1983-06-06 | 1988-02-23 | Ovonic Synthetic Materials Co., Inc. | X-ray dispersive and reflective structures |
EP0137697B1 (en) * | 1983-08-31 | 1987-11-25 | Kabushiki Kaisha Toshiba | Method of producing an optical information recording medium |
US4785470A (en) * | 1983-10-31 | 1988-11-15 | Ovonic Synthetic Materials Company, Inc. | Reflectivity and resolution X-ray dispersive and reflective structures for carbon, beryllium and boron analysis |
US4675889A (en) * | 1985-07-08 | 1987-06-23 | Ovonic Synthetic Materials Company, Inc. | Multiple wavelength X-ray dispersive devices and method of making the devices |
US4992153A (en) * | 1989-04-26 | 1991-02-12 | Balzers Aktiengesellschaft | Sputter-CVD process for at least partially coating a workpiece |
-
1992
- 1992-10-30 AU AU31241/93A patent/AU3124193A/en not_active Abandoned
- 1992-10-30 WO PCT/US1992/009308 patent/WO1993009545A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO1993009545A1 (en) | 1993-05-13 |
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