AU3119397A - Methods to increase the exposure sensitivity of photopolymerizable matrices and apparatus useful therefor - Google Patents

Methods to increase the exposure sensitivity of photopolymerizable matrices and apparatus useful therefor

Info

Publication number
AU3119397A
AU3119397A AU31193/97A AU3119397A AU3119397A AU 3119397 A AU3119397 A AU 3119397A AU 31193/97 A AU31193/97 A AU 31193/97A AU 3119397 A AU3119397 A AU 3119397A AU 3119397 A AU3119397 A AU 3119397A
Authority
AU
Australia
Prior art keywords
photopolymerizable
matrices
methods
increase
apparatus useful
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU31193/97A
Inventor
Mitch G. Male
Gregory E. Mueller
David H. Roberts
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Napp Systems Inc
Original Assignee
Napp Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Napp Systems Inc filed Critical Napp Systems Inc
Publication of AU3119397A publication Critical patent/AU3119397A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
AU31193/97A 1996-05-16 1997-05-06 Methods to increase the exposure sensitivity of photopolymerizable matrices and apparatus useful therefor Abandoned AU3119397A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US65092096A 1996-05-16 1996-05-16
US08650920 1996-05-16
PCT/US1997/007789 WO1997043696A1 (en) 1996-05-16 1997-05-06 Methods to increase the exposure sensitivity of photopolymerizable matrices and apparatus useful therefor

Publications (1)

Publication Number Publication Date
AU3119397A true AU3119397A (en) 1997-12-05

Family

ID=24610840

Family Applications (1)

Application Number Title Priority Date Filing Date
AU31193/97A Abandoned AU3119397A (en) 1996-05-16 1997-05-06 Methods to increase the exposure sensitivity of photopolymerizable matrices and apparatus useful therefor

Country Status (2)

Country Link
AU (1) AU3119397A (en)
WO (1) WO1997043696A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BR0203428C1 (en) * 2002-08-29 2004-07-06 Eudes Dantas Digital Light Curing Cannon
US7125650B2 (en) 2004-07-20 2006-10-24 Roberts David H Method for bump exposing relief image printing plates
DE102007024469B4 (en) 2007-05-25 2009-04-23 Eos Gmbh Electro Optical Systems Method of layering a three-dimensional object
US7767383B2 (en) * 2007-08-08 2010-08-03 Roberts David H Method of pre-exposing relief image printing plate
EP3944021A1 (en) * 2020-07-22 2022-01-26 Esko-Graphics Imaging GmbH Method and apparatus for curing a printing plate

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE611541A (en) * 1961-01-13
GB1136544A (en) * 1966-02-28 1968-12-11 Agfa Gevaert Nv Photochemical cross-linking of polymers
US3832421A (en) * 1972-05-05 1974-08-27 Grace W R & Co Curable compositions containing solid styrene-allyl alcohol copolymer based polyenes and polythiols
DE2457882B2 (en) * 1974-12-06 1977-06-02 Siemens AG, 1000 Berlin und 8000 München HEAT-RESISTANT, LIGHT-NETWORKABLE MASS
SU595694A1 (en) * 1975-10-06 1978-02-28 Предприятие П/Я Х-5476 Negative photoresist composition
JPS5560944A (en) * 1978-10-31 1980-05-08 Fuji Photo Film Co Ltd Image forming method
JPS6050356B2 (en) * 1980-11-29 1985-11-08 大日本インキ化学工業株式会社 Method for forming resist coating film for continuous pattern plating
DE3248246A1 (en) * 1982-12-28 1984-06-28 Basf Ag, 6700 Ludwigshafen POSITIVE WORKING METHOD FOR THE PRODUCTION OF RELIEF AND PRINTING FORMS
US4590287A (en) * 1983-02-11 1986-05-20 Ciba-Geigy Corporation Fluorinated titanocenes and photopolymerizable composition containing same
US4609615A (en) * 1983-03-31 1986-09-02 Oki Electric Industry Co., Ltd. Process for forming pattern with negative resist using quinone diazide compound
US4702994A (en) * 1984-10-01 1987-10-27 W. R. Grace & Co. Projection imaged relief printing plates
US4868090A (en) * 1985-08-24 1989-09-19 Atsushi Kitamura Methods for the manufacture of cylindrical photosensitive resin structures and cylindrical printing plates
US4857437A (en) * 1986-12-17 1989-08-15 Ciba-Geigy Corporation Process for the formation of an image
US4801477A (en) * 1987-09-29 1989-01-31 Fudim Efrem V Method and apparatus for production of three-dimensional objects by photosolidification
US4945032A (en) * 1988-03-31 1990-07-31 Desoto, Inc. Stereolithography using repeated exposures to increase strength and reduce distortion
JP2963478B2 (en) * 1988-04-18 1999-10-18 スリーディー、システムズ、インコーポレーテッド Method and apparatus for forming a three-dimensional object
US5164128A (en) * 1988-04-18 1992-11-17 3D Systems, Inc. Methods for curing partially polymerized parts
US5236812A (en) * 1989-12-29 1993-08-17 E. I. Du Pont De Nemours And Company Solid imaging method and apparatus
EP0460919A3 (en) * 1990-06-05 1993-04-28 Nippon Paint Co., Ltd. Process for exposing a photosensitive resin composition to light
US5167882A (en) * 1990-12-21 1992-12-01 Loctite Corporation Stereolithography method
EP0525206B1 (en) * 1991-02-15 1998-04-29 Asahi Kasei Kogyo Kabushiki Kaisha Photosensitive elastomer composition
WO1992015620A1 (en) * 1991-02-27 1992-09-17 Allied-Signal Inc. Stereolithography using vinyl ether based polymers
JPH05226211A (en) * 1992-02-10 1993-09-03 Fujitsu Ltd Exposure method
DE4225828A1 (en) * 1992-08-05 1994-02-10 Hoechst Ag Laser exposure device for printing forms to be exposed imagewise

Also Published As

Publication number Publication date
WO1997043696A1 (en) 1997-11-20

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