AU2860599A - Method for electrochemically etching a p-type semiconducting material, and a substrate of at least partly porous semiconducting material - Google Patents
Method for electrochemically etching a p-type semiconducting material, and a substrate of at least partly porous semiconducting materialInfo
- Publication number
- AU2860599A AU2860599A AU28605/99A AU2860599A AU2860599A AU 2860599 A AU2860599 A AU 2860599A AU 28605/99 A AU28605/99 A AU 28605/99A AU 2860599 A AU2860599 A AU 2860599A AU 2860599 A AU2860599 A AU 2860599A
- Authority
- AU
- Australia
- Prior art keywords
- semiconducting material
- substrate
- electrochemically etching
- partly porous
- type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000004065 semiconductor Substances 0.000 title 2
- 238000005530 etching Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3063—Electrolytic etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
- B81C1/005—Bulk micromachining
- B81C1/00515—Bulk micromachining techniques not provided for in B81C1/00507
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/02—Etching
- C25F3/14—Etching locally
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
- B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
- B81C2201/0111—Bulk micromachining
- B81C2201/0114—Electrochemical etching, anodic oxidation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
- B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
- B81C2201/0111—Bulk micromachining
- B81C2201/0115—Porous silicon
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Weting (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL1008441A NL1008441C2 (en) | 1998-03-02 | 1998-03-02 | Electrochemically etching a p-type semiconductor layer |
| NL1008441 | 1998-03-02 | ||
| NL1010234A NL1010234C1 (en) | 1998-03-02 | 1998-10-02 | Method for the electrochemical etching of a p-type semiconductor material, as well as a substrate of at least partially porous semiconductor material. |
| NL1010234 | 1998-10-02 | ||
| PCT/NL1999/000111 WO1999045583A1 (en) | 1998-03-02 | 1999-03-02 | Method for electrochemically etching a p-type semiconducting material, and a substrate of at least partly porous semiconducting material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AU2860599A true AU2860599A (en) | 1999-09-20 |
Family
ID=26642754
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU28605/99A Abandoned AU2860599A (en) | 1998-03-02 | 1999-03-02 | Method for electrochemically etching a p-type semiconducting material, and a substrate of at least partly porous semiconducting material |
Country Status (3)
| Country | Link |
|---|---|
| AU (1) | AU2860599A (en) |
| NL (1) | NL1010234C1 (en) |
| WO (1) | WO1999045583A1 (en) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10032579B4 (en) * | 2000-07-05 | 2020-07-02 | Robert Bosch Gmbh | Method for producing a semiconductor component and a semiconductor component produced by the method |
| DE10046622B4 (en) * | 2000-09-20 | 2010-05-20 | Robert Bosch Gmbh | Method for producing a membrane sensor unit and membrane sensor unit |
| DE10054484A1 (en) | 2000-11-03 | 2002-05-08 | Bosch Gmbh Robert | Micromechanical component and corresponding manufacturing method |
| DE10055872B4 (en) * | 2000-11-10 | 2004-02-05 | Robert Bosch Gmbh | Process for producing a porous structure for a sieve or a filter and porous structure for a sieve or a filter |
| DE10065026A1 (en) | 2000-12-23 | 2002-07-04 | Bosch Gmbh Robert | Micromechanical component and corresponding manufacturing method |
| DE10138759A1 (en) * | 2001-08-07 | 2003-03-06 | Bosch Gmbh Robert | Method for producing a semiconductor component and semiconductor component, in particular membrane sensor |
| GR1004106B (en) * | 2002-01-24 | 2003-01-13 | Εκεφε "Δημοκριτος" Ινστιτουτο Μικροηλεκτρονικης | Low power silicon thermal sensors and microfluidic devices based on the use of porous silicon sealed air cavity technology or microchannel technology |
| DE10210335A1 (en) * | 2002-03-08 | 2003-10-02 | Bosch Gmbh Robert | diaphragm sensor |
| KR100692593B1 (en) * | 2005-01-24 | 2007-03-13 | 삼성전자주식회사 | Manufacturing method of mems structure |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5139624A (en) * | 1990-12-06 | 1992-08-18 | Sri International | Method for making porous semiconductor membranes |
| DE19653097A1 (en) * | 1996-12-20 | 1998-07-02 | Forschungszentrum Juelich Gmbh | Layer with a porous layer area, an interference filter containing such a layer and method for its production |
-
1998
- 1998-10-02 NL NL1010234A patent/NL1010234C1/en not_active IP Right Cessation
-
1999
- 1999-03-02 WO PCT/NL1999/000111 patent/WO1999045583A1/en active Search and Examination
- 1999-03-02 AU AU28605/99A patent/AU2860599A/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| WO1999045583A1 (en) | 1999-09-10 |
| NL1010234C1 (en) | 1999-09-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| AU5199899A (en) | Method and installation for etching a substrate | |
| AU4057999A (en) | Scanning aligner, method of manufacture thereof, and method of manufacturing device | |
| AU4183300A (en) | Method and apparatus for forming an electrical contact with a semiconductor substrate | |
| AU5952298A (en) | Substrate and production method thereof | |
| AU2237599A (en) | Apparatus and method for depositing a material on a substrate | |
| AU5895400A (en) | Assembly and method for rotating and placing strip of material on a substrate | |
| AU5116499A (en) | Method of forming a silicon contact interface | |
| WO2002084714A3 (en) | Method and apparatus for electrochemically depositing a material onto a workpiece surface | |
| AU3875899A (en) | A system and method for inspecting semiconductor wafers | |
| AU1683800A (en) | Semiconductor device and production method thereof | |
| EP1011298A4 (en) | Substrate for formation of special pattern, and method of manufacture of substrate | |
| AU2001240599A1 (en) | Flexible metal substrate for cis solar cells, and method for producing the same | |
| EP0939531A3 (en) | Method for forming an icon | |
| AU1567000A (en) | Method and installation for surface marking of a substrate | |
| TW337040B (en) | Method of doping trench sidewalls before trench etching | |
| AU1922500A (en) | High rate electrochemical cell and assembly method | |
| AU2860599A (en) | Method for electrochemically etching a p-type semiconducting material, and a substrate of at least partly porous semiconducting material | |
| IL143440A0 (en) | A method for forming a conductive layer on a substrate | |
| AU1781499A (en) | Semiconductor etching process and apparatus | |
| AU2452899A (en) | Method for etching | |
| AU9527598A (en) | Semiconductor element, especially a solar cell, and method for the production thereof | |
| AU1431500A (en) | Method for semiconductor manufacturing | |
| AU1183999A (en) | Semiconductor component and manufacturing method for semiconductor component | |
| AU6665398A (en) | Improved method for manufacturing a circuit on a circuit substrate | |
| AU6782798A (en) | Composition and method for forming doped a-site deficient thin-film manganate layers on a substrate |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |