AU2021104387A4 - Two-dimensional measurement method and system of anti-optical aliasing of heterodyne grating interference - Google Patents
Two-dimensional measurement method and system of anti-optical aliasing of heterodyne grating interference Download PDFInfo
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- 238000000691 measurement method Methods 0.000 title claims abstract description 16
- 230000010287 polarization Effects 0.000 claims abstract description 54
- 238000005259 measurement Methods 0.000 claims abstract description 35
- 230000003287 optical effect Effects 0.000 claims abstract description 32
- 230000033001 locomotion Effects 0.000 claims abstract description 8
- 230000035559 beat frequency Effects 0.000 claims abstract description 6
- 238000001514 detection method Methods 0.000 claims abstract description 6
- 239000000835 fiber Substances 0.000 claims description 9
- 239000013307 optical fiber Substances 0.000 claims description 5
- 230000005540 biological transmission Effects 0.000 claims description 3
- 239000000523 sample Substances 0.000 claims description 2
- 238000001459 lithography Methods 0.000 abstract description 7
- 230000000737 periodic effect Effects 0.000 abstract description 4
- 238000000034 method Methods 0.000 abstract description 2
- 238000006073 displacement reaction Methods 0.000 description 13
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
- G01B9/02002—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies
- G01B9/02003—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies using beat frequencies
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02056—Passive reduction of errors
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/45—Multiple detectors for detecting interferometer signals
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
- G01B2290/70—Using polarization in the interferometer
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- Optics & Photonics (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
Two-dimensional measurement method and system of anti-optical aliasing of
heterodyne grating interference belongs to grating measurement technology.The
system comprises laser, grating interferometer and photoelectric detection and signal
processing unit, wherein two laser beams with different frequencies and separated
spaces simultaneously output by the laser incident in parallel onto polarization beam
splitter, the first beams is reflected by the polarization beam splitter and then being
incident on referencing grating to form multiple referencing diffraction beams of
multiple grades, and the second beams is transmitted by the polarization beam splitter
and then being incident on measurement grating to form multiple measurement
diffraction beams. Three beams in the referencing diffraction beams meet with the 0
and ±1 grade beams in the measurement diffraction beams in turns to form an optical
beat frequency, and the two-dimensional relative motion information of the measuring
grating is obtained by photoelectric detection and signal processing. The method and
system of this invention eliminates the optical frequency aliasing, polarization state
aliasing and corresponding periodic nonlinear errors caused by the incomplete
polarization splitting, and it can improve the comprehensive performance when it is
used in the ultra-precision workpiece table position measurement system of
lithography machine.
1/1
FIGURES
2
Figure 1
Description
1/1
2
Figure 1
Two-dimensional measurement method and system of anti-optical aliasing of heterodyne grating interference
The invention relates to a grating measuring method and a measuring system, in particular to two-dimensional measurement method and system of anti-optical aliasing of heterodyne grating interference.
The lithography machine is the key in semiconductor chip manufacturing. Ultra precision stage is the core subsystem of lithography machine, which is used to carry mask plate and silicon wafer to complete high-speed ultra-precision step scan movement. Ultra-precision workpiece table has become the most representative type of ultra-precision motion system because of its high speed, high acceleration, long stroke, ultra-precision and multiple degrees of freedom. In grade to realize the above movement, the ultra-precision workpiece table usually adopts a heterodyne interferometer measurement system to measure the multi-degree-of-freedom displacement of the ultra precision workpiece table. However, with the continuous improvement of measurement accuracy, measurement distance, measurement speed and other movement indexes, the heterodyne interferometer cannot meet the measurement requirements due to a series of problems such as environmental sensitivity, and difficulties in improving the measurement speed, occupying space, high price, as well as the measurement target workbench is difficult to be designed, manufactured and controlled.
In view of the above problems, the major companies and research institutions in the field of ultra-precision measurement in the world have launched a series of studies, mainly focusing on grating measurement system based on diffraction interference principle, and the research results have been revealed in many patent papers. American patents US7,102,729b2 (published on August 4th, 2005), US7,483,120b2 (published on
November 15th, 2007), US7,940, 392B2 (published on Dec. 24, 2009) and US2010/0321665A1 (published on Dec. 23, 2010) by Dutch company ASML disclose a plane grating measuring system and layout scheme applied to ultra-precision workpiece table of lithography machine. The measuring system mainly uses one-dimensional or two-dimensional plane grating to measure horizontal large-stroke displacement of workpiece table with reading head, and height sensors such as eddy current or interferometer are used for height direction displacement measurement, but many of them are used. US patent publication No. US2011/0255096A1 (published on Oct. 20, 2011) by ZYGO company of the United States discloses a grating measurement system applied to an ultra-precision workpiece table of a lithography machine. The measurement system also uses a one-dimensional or two-dimensional grating with a specific reading head to realize displacement measurement, and can simultaneously measure horizontal and vertical displacements.
Chinese patent CN102937411A by Tsinghua University (published on Feb. 20, 2013) and Chinese patent CN102944176A by Tsinghua University (published on Feb. 27, 2013) discloses displacement measurement system of heterodyne grating interferometer for ultra-precision workpiece stage of lithography machine. The measurement system replaces the measurement target reflector (corner cone) of traditional heterodyne interferometer with grating. heterodyne grating interferometer can measure horizontal long-range displacement and vertical displacement at the same time. However, because heterodyne is coaxial, polarization beam splitter is used to separate reference light and measurement light, which leads to the problems of optical frequency aliasing, polarization state aliasing and corresponding periodic nonlinear error caused by incomplete polarization beam splitting.
Chinese patent CN102353327A (published on February 15th, 2013) of National Defense Science and Technology University of Chinese People's Liberation Army discloses heterodyne grating interference measurement method and measurement system. In this scheme, heterodyne is divided into reference light and measurement light by polarization beam splitter, and the reference light and measurement light are incident on the moving measurement grating at the same time. The reference light diffracted by the measurement grating and the measurement light converge to form an optical beat frequency. The position shift of moving grating is obtained by photoelectric detection and signal processing. This system can only realize one-dimensional measurement, and there are also problems of optical frequency aliasing, polarization state aliasing and corresponding periodic nonlinear error caused by incomplete polarization splitting.
The technical problem to be solved by the invention is to overcome the shortcomings of the prior art and seek a heterodyne grating interference measurement method and system with anti-optical aliasing, which can realize sub-nanometer and even higher resolution and precision, and can simultaneously measure horizontal long-stroke displacement and vertical displacement. The measurement system is used to measure the displacement of ultra-precision workpiece table, which can effectively reduce the shortcomings of laser interferometer measurement system in the application of ultra precision workpiece table and improve the performance of ultra-precision workpiece table of lithography machine.
The purpose of the invention is realized as follows:
Two-dimensional measurement method and system of anti-optical aliasing of heterodyne grating interference, wherein laser simultaneously outputs two beams, wherein the first beams of laser light is a first frequency and the second beams of laser light is a second frequency, the first beams of laser light and the second beams of laser light are spatially separated and parallelly incident on beam splitter, the first beams of laser light is reflected by the beam splitter to form a referencing beams which is incident on a reference grating, and diffracted by the reference grating to form multiple reference diffracted beams of multiple grades. The second laser beams is transmitted through the beam splitter to form a measuring beams, which is incident on the measuring grating, and diffracted by the measuring grating to form multiple measuring diffraction beams of multiple grades. The first, second and third laser beams in the reference diffraction beams respectively meet with the first, second and third laser beams in the measuring diffraction beams in turn to form optical beat interference, and the optical beat signals are subjected to photoelectric detection and signal processing to obtain the two dimensional relative motion information of the measuring grating.
Two-dimensional measurement method and system of anti-optical aliasing of heterodyne grating interference comprises laser and polarization beams splitter which can output two laser beams with different frequencies, wherein one laser beams are transmitted to the incident end of the polarization beam splitter through the first single mode polarization maintaining fiber to form the first incident laser beam, and the other laser beams are transmitted to the incident end of the polarization beams splitter through the second single-mode polarization maintaining fiber to form a second incident laser beams, which is characterized in that the polarization state of the first incident laser beams is adjusted, so that the first incident laser beams reflects on the splitting film surface of a polarization beams splitter to form a referencing arm beams, and referencing arm quarter-wave plate, referencing arm refraction element and reference grating are sequentially arranged on the optical path of the reference arm beams. The referencing arm beam is transmitted to the referencing grating through the referencing arm quarter wave plate and the referencing arm refractive element, and is diffracted and reflected by the referencing grating to form (+1,0) grade beams, (+1,+1) grade beams and (+1-1) grade beams. After the described (+1,0), (+1,+1) and (+1,-1) beams pass through the reference arm refractive element, their beam directions are adjusted to be parallel and opposite to the reference arm beam, (+1,0) grade beams and (+1,+1) grade beams and (+1, -1) grade beams return to the polarization beams splitter via the referencing arm quarter-wave plate, and passes through the beams splitter film. Photodetectors A, B and C are sequentially arranged on the transmission path passing through the beam splitter film, and the (+1, +1) grade beams is incident to photodetectors A, (+1, 0)gradebeams is incident to photodetectors B, (+1, -1) is incident to photodetectors C. Adjusting the polarization state of the second incident laser beams so that the second incident laser beams is transmitted on the splitting film surface of the polarization beams splitter to form a measuring arm beams, and sequentially arranging a measuring arm quarter-wave plate, refractive element of measuring arm and measuring grating on the optical path of the measuring arm beam. The 0 grade beams, +1 grade beams and -1 grade beams return to the polarization beams splitter via the measuring arm quarter-wave plate 8, and are reflected by the polarization beams splitter to form beams B, beams A and beams C, respectively. The beams A merges with the (+1, +1) grade beams to be incident to the photodetector Al1, and the beams B merges with the (+1, 0) grade beams to be incident to the photodetector. The beam C and the (+1, -1) grade light beams converge to the photodetector C, and the photodetectors A, B, C convert the beat-frequency optical signals into electrical signals, the signals are sent to the signal processing unit by wires or optical fibers to complete the processing.
Compared with the prior art, the invention has the advantages that:
(1) The invention provides heterodyne beams output by the laser are separately transmitted in space and separately incident on the polarization beam splitter, thus eliminating the optical frequency aliasing, polarization state aliasing and corresponding periodic nonlinear errors caused by the incomplete splitting of the polarization beam splitter of the traditional coaxial heterodyne.
(2) In the invention, two single-mode polarization maintaining fibers are used to transmit heterodyne separately, which is beneficial to the polarization state adjustment and optical path alignment of heterodyne.
(3) In the invention, the 0 grade diffraction light and symmetrical higher-grade diffraction light generated by the diffraction of the measuring grating respectively form optical beat interference with the diffraction light of the reference grating, which is measured by three photodetectors at the same time, and the relative displacement of the measuring grating in the two-dimensional plane can be accurately measured through signal processing. Since a laser is not required to provide a single beat signal with a heterodyne frequency difference, the optical components are reduced and the optical path layout is simplified.
The attached figure is a structural schematic diagram of two-dimensional measurement method and system of anti-optical aliasing of heterodyne grating interference.
Wherein:1-Laser; 2-The first single-mode polarization maintaining fiber; 3-The second single-mode polarization maintaining fiber; 4-Polarization beams splitter; 5 Referencing arm quarter-wave plate; 6-Referencing arm refractive element; 7 Referencing grating; 8-Measuring arm quarter-wave plate; 9-Refractive element of measuring arm; 10-Measuring grating; 11-Photodetector A; 12-Photodetector B; 13 Photodetector C; 14-Signal processing unit; 20-The first incident laser beams; 21 Referencing arm beams; 22-(+1, +1) Grade beams; 23-(+1,0) Grade beams; 24-(+1, -1) Grade beamss; 30-Second incident laser beams; 31-Measuring arm beams; 32 -+1 grade beams; 33-0 grade beams; 34-1 beams; 35, 36, 37- beams A, B, C.
Specific embodiments of the present invention will be described in further detail with reference to the accompanying drawings.
Two-dimensional measurement method and system of anti-optical aliasing of heterodyne grating interference, wherein laser simultaneously outputs two beams, wherein the first beams of laser light is a first frequency and the second beams of laser light is a second frequency, the first beams of laser light and the second beams of laser light are spatially separated and parallelly incident on beam splitter, the first beams of laser light is reflected by the beam splitter to form a referencing beams which is incident on a reference grating, and diffracted by the reference grating to form multiple reference diffracted beams of multiple grades. The second laser beams is transmitted through the beam splitter to form a measuring beams, which is incident on the measuring grating, and diffracted by the measuring grating to form multiple measuring diffraction beams of multiple grades. The first, second and third laser beams in the reference diffraction beams respectively meet with the first, second and third laser beams in the measuring diffraction beams in turn to form optical beat interference, and the optical beat signals are subjected to photoelectric detection and signal processing to obtain the two dimensional relative motion information of the measuring grating.
Two-dimensional measurement method and system of anti-optical aliasing of heterodyne grating interference comprises laser (1) and polarization beams splitter (4) which can output two laser beams with different frequencies, wherein one laser beams are transmitted to the incident end of the polarization beam splitter (4) through the first single-mode polarization maintaining fiber (2) to form the first incident laser beam (20), and the other laser beams are transmitted to the incident end of the polarization beams splitter (4) through the second single-mode polarization maintaining fiber (3) to form the second incident laser beams (30), which is characterized in that the polarization state of the first incident laser beams (20) is adjusted, so that the first incident laser beams (20) reflects on the splitting film surface of polarization beams splitter (4) to form referencing arm beams (21), the referencing arm quarter-wave plate (5), referencing arm refraction element (6) and reference grating (7) are sequentially arranged on the optical path of the reference arm beams (21). the referencing arm beam (21) is incident to the referencing grating (7) through referencing arm quarter-wave plate (5) and referencing arm refractive element (6), the reference arm beam (21) is diffracted and reflected by the reference grating (7) to form (+1,0) grade beams (23), (+1,+1) grade beams (22) and (+1,-i) grade beams(24). After the (+1,0) grade beams (23), (+1,+1) grade beams (22) and (+1,-1) grade beams(24) pass through the reference arm refractive element (6), their beam directions are adjusted to be parallel to and opposite to the reference arm beams (21). (+1,0) grade beams (23), (+1,+1) grade beams (22) and (+1,-i) grade beams(24) returns to the polarization beams splitter (4) via the referencing arm quarter-wave plate (5),and passes through the beams splitter film. Photodetectors A(11), B(12) and C(13) are sequentially arranged on the transmission path passing through the beam splitter film, the (+1, +1) grade beams (22) are incident to photodetector A(11), (+1, 0) grade beams (23) are incident to photodetector B(12), and (+1, -1) grade beams (24) are incident to photodetector C(13), and adjusting the polarization state of the second incident laser beams (30), so that the second incident laser beams (30) that are incident on the splitting film surface of the polarization beam splitter (4) to form a measuring arm beam (31), the described measuring arm quarter-wave plate (8) and refractive element of measuring arm (9) and measuring grating (10) are sequentially arranged on the optical path of the measuring arm beams (31), and the measuring arm beam (31) is transmitted to the measuring grating (10) through measuring arm quarter-wave plate (8) and refractive element of measuring arm (9). The measuring arm beam (31) is diffracted and reflected by the measuring grating (10) to form 0 grade beams (33), +1 grade beams (32) and -1 grade beams (34), the 0 grade beams (33), +1 grade beams (32) and -1 grade beams (34) pass through the measuring arm refractive element (9), and their beam directions are adjusted to be parallel and opposite to the measuring arm beam (31), and the described 0 grade beams (33),+1 grade beams (32) and -1 grade beam (34) return to the polarization beam splitter (4) through the measuring arm quarter-wave plate (8), and they are reflected by the polarization beams splitter (4) to form beams B(36), beams A(35) and beams C(37) respectively in turns, the beams A(35) and (+1, +1) grade beams (22) are converged and incident to the photodetector A(11), the beams B(36) and (+1, 0) grade beams are converged and incicent to the photodetector B(12), and the beams C(37) and (+1,-i) grade deams are converged and incicent to the photodetector C(13), the photodetectors A, B and C(11, 12 and 13) convert beat frequency optical signals into electrical signals, which are respectively sent to a signal processing unit (14) by wires or optical fibers for processing.
The referencing grating 7 is a planar reflective two-dimensional orthogonal grating, and the measuring grating 10 is a planar reflective one-dimensional grating or a planar reflective two-dimensional orthogonal grating.
Two-dimensional measurement method and system of anti-optical aliasing of heterodyne grating interference can detect optical beat signals by the described photodetectors Al1, B12 and C13 directly or remotely by optical fiber probes.
When the measuring grating 10 is stationary, (+1, +1) grade beams 22 and A35, (+1, 0) grade beams 23 and beams B 36, and (+1, -1) grade beams 24 and beams C 37 respectively form measuring optical beat interference, whose beat frequency is the frequency difference of the heterodyne output by the laser 1. When the measuring grating 10 moves parallel to the measuring arm beams 31, the 0 grade beams,
When the measuring grating 10 moves perpendicularly to the measuring arm beam 31 and simultaneously perpendicularly to the grating characterization direction of the measuring grating 10, the +1 grade beams 32 and the -1 grade beams 34 will generate Doppler frequency shifts with the same magnitude and opposite sign, which changes the optical beat signals detected by the photodetectors Al1, B12 and C13. Finally, the signals received by the photodetectors All, B12 and C13 are processed, and the relative displacement of the grating 10 in the two-dimensional plane can be accurately measured.
Claims (3)
1. Two-dimensional measurement method and system of anti-optical aliasing of heterodyne grating interference is characterized in the laser outputs two laser beams at the same time, wherein the first laser beams is of the first frequency and the second laser beam is of the second frequency; the first laser beam and the second laser beam are spatially separated and being incident on a beam splitter in parallel. The first laser beam is reflected by the beam splitter to form a reference beam, which is incident on referencing grating and diffracted by the referencing grating to form multiple referencing diffracted beams of multiple grades. The second laser beams is transmitted through the beam splitter to form a measuring beams which is incident on the measuring grating, the measurement grating diffracts to form multiple measurement diffraction beams of multiple grades, and the first, second and third laser beams in the reference diffraction beams respectively meet with the first, second and third laser beams in the measurement diffraction beams in turn to form optical beat interference, and the optical beat signals are subjected to photoelectric detection and signal processing to obtain the two-dimensional relative motion information of the measurement grating.
1. Two-dimensional measurement method and system of anti-optical aliasing of heterodyne grating interference comprises laser (1) and polarization beams splitter (4) which can output two laser beams with different frequencies, wherein one laser beams are transmitted to the incident end of the polarization beam splitter (4) through the first single-mode polarization maintaining fiber (2) to form the first incident laser beam (20), and the other laser beams are transmitted to the incident end of the polarization beams splitter (4) through the second single-mode polarization maintaining fiber (3) to form the second incident laser beams (30), which is characterized in that the polarization state of the first incident laser beams (20) is adjusted, so that the first incident laser beams (20) reflects on the splitting film surface of polarization beams splitter (4) to form referencing arm beams (21), the referencing arm quarter-wave plate (5), referencing arm refraction element (6) and reference grating (7) are sequentially arranged on the optical path of the reference arm beams (21). the referencing arm beam (21) is incident to the referencing grating (7) through referencing arm quarter-wave plate (5) and referencing arm refractive element (6), the reference arm beam (21) is diffracted and reflected by the reference grating (7) to form (+1,0) grade beams (23), (+1,+1) grade beams (22) and (+1,-i) grade beams(24). After the (+1,0) grade beams (23), (+1,+1) grade beams (22) and (+1,-i) grade beams(24) pass through the reference arm refractive element (6), their beam directions are adjusted to be parallel to and opposite to the reference arm beam (21), (+1,0) grade beams (23), (+1,+1) grade beams (22) and (+1,-i) grade beams(24) returns to the polarization beams splitter (4) via the referencing arm quarter-wave plate (5),and passes through the beams splitter film. Photodetectors A(11), B(12) and C(13) are sequentially arranged on the transmission path passing through the beam splitter film, the (+1, +1) grade beams (22) are incident to photodetector A(11), (+1, 0) grade beams (23) are incident to photodetector B(12), and (+1, -1) grade beams (24) are incident to photodetector C(13), and adjusting the polarization state of the second incident laser beams (30), so that the second incident laser beams (30) that are incident on the splitting film surface of the polarization beam splitter (4) to form a measuring arm beam (31), the described measuring arm quarter-wave plate (8) and refractive element of measuring arm (9) and measuring grating (10) are sequentially arranged on the optical path of the measuring arm beam (31), and the measuring arm beam (31) is transmitted to the measuring grating (10) through measuring arm quarter-wave plate (8) and refractive element of measuring arm (9). The measuring arm beam (31) is diffracted and reflected by the measuring grating (10) to form 0 grade beams (33), +1 grade beams (32) and -1 grade beams (34), the 0 grade beams (33), +1 grade beams (32) and -1 grade beams (34) pass through the measuring arm refractive element (9), and their beam directions are adjusted to be parallel and opposite to the measuring arm beam (31), and the described 0 grade beams (33),+1 grade beams (32) and -1 grade beam (34) return to the polarization beam splitter (4) through the measuring arm quarter-wave plate (8), and they are reflected by the polarization beams splitter (4) to form beams B(36), beams A(35) and beams C(37) respectively in turns, the beams A(35) and (+1, +1) grade beams (22) are converged and incident to the photodetector A(11), the beams B(36) and (+1, 0) grade beams are converged and incicent to the photodetector B(12), and the beams C(37) and (+1,-i) grade deams are converged and incicent to the photodetector C(13), the photodetectors A, B and C(11, 12 and 13) convert beat- frequency optical signals into electrical signals, which are respectively sent to a signal processing unit (14) by wires or optical fibers for processing.
2. According to claim 2, two-dimensional measurement method and system of anti optical aliasing of heterodyne grating interference is characterized in that the referencing grating (7) is a planar reflective two-dimensional orthogonal grating, and the measuring grating (10) is a planar reflective one-dimensional optical grating or a planar reflective two-dimensional orthogonal grating.
3. According to claim 2, two-dimensional measurement method and system of anti optical aliasing of heterodyne grating interference is characterized in that the photodetectors A, B and C(11, 12 and 13) can detect optical beat signals directly by photodetectors or remotely by optical fiber probes.
FIGURES 1/1
Figure 1
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