AU2003275655A1 - Polishing slurry and polished substrate - Google Patents

Polishing slurry and polished substrate

Info

Publication number
AU2003275655A1
AU2003275655A1 AU2003275655A AU2003275655A AU2003275655A1 AU 2003275655 A1 AU2003275655 A1 AU 2003275655A1 AU 2003275655 A AU2003275655 A AU 2003275655A AU 2003275655 A AU2003275655 A AU 2003275655A AU 2003275655 A1 AU2003275655 A1 AU 2003275655A1
Authority
AU
Australia
Prior art keywords
polishing slurry
polished substrate
polished
substrate
polishing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003275655A
Inventor
Fumio Imai
Katsura Ito
Hiroshi Saegusa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Publication of AU2003275655A1 publication Critical patent/AU2003275655A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
AU2003275655A 2002-10-25 2003-10-24 Polishing slurry and polished substrate Abandoned AU2003275655A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2002311212 2002-10-25
JP2002-311212 2002-10-25
US42337602P 2002-11-04 2002-11-04
US60/423,376 2002-11-04
PCT/JP2003/013641 WO2004037943A1 (en) 2002-10-25 2003-10-24 Polishing slurry and polished substrate

Publications (1)

Publication Number Publication Date
AU2003275655A1 true AU2003275655A1 (en) 2004-05-13

Family

ID=34611350

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003275655A Abandoned AU2003275655A1 (en) 2002-10-25 2003-10-24 Polishing slurry and polished substrate

Country Status (4)

Country Link
US (1) US20050287931A1 (en)
EP (1) EP1554357A1 (en)
AU (1) AU2003275655A1 (en)
WO (1) WO2004037943A1 (en)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004349426A (en) * 2003-05-21 2004-12-09 Jsr Corp Chemical mechanical polishing method for sti
JP2006089363A (en) * 2004-08-27 2006-04-06 Showa Denko Kk Process for manufacturing glass substrate for magnetic recording medium, glass substrate for magnetic recording medium obtained by the process, and magnetic recording medium obtained using the substrate
TWI323741B (en) * 2004-12-16 2010-04-21 K C Tech Co Ltd Abrasive particles, polishing slurry, and producing method thereof
JP2007214205A (en) * 2006-02-07 2007-08-23 Fujimi Inc Polishing composition
JP5448824B2 (en) * 2006-10-16 2014-03-19 キャボット マイクロエレクトロニクス コーポレイション Glass polishing composition and method
DE102006061891A1 (en) * 2006-12-28 2008-07-03 Basf Se Composition for polishing surfaces, especially of semiconductors, comprises a lanthanide oxide abrasive, a polymeric dispersant, a polysaccharide gelling agent and water
SG188090A1 (en) * 2008-02-01 2013-03-28 Fujimi Inc Polishing composition and polishing method using the same
JP2009280410A (en) * 2008-04-21 2009-12-03 Konica Minolta Opto Inc Mold for forming glass substrate, method of manufacturing glass substrate, method of manufacturing glass substrate for information recording medium, method of manufacturing information recording medium, glass substrate for information recording medium, and information recording medium
JP5326638B2 (en) * 2009-02-18 2013-10-30 富士電機株式会社 Method of manufacturing glass substrate for magnetic recording medium, glass substrate for magnetic recording medium in which it is used, and perpendicular magnetic recording medium
RU2607214C2 (en) * 2010-09-08 2017-01-10 Басф Се Aqueous polishing composition and process for chemically mechanically polishing substrates for electrical, mechanical and optical devices
JP5695068B2 (en) * 2010-09-30 2015-04-01 Hoya株式会社 Method for manufacturing glass substrate for information recording medium and method for manufacturing information recording medium
CN102751187B (en) * 2011-04-20 2015-11-25 中芯国际集成电路制造(上海)有限公司 The formation method of finishing method and grid
CN102911605A (en) * 2011-08-05 2013-02-06 安集微电子（上海）有限公司 Chemical mechanical polishing solution
US8859428B2 (en) * 2012-10-19 2014-10-14 Air Products And Chemicals, Inc. Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof
WO2014070461A1 (en) * 2012-11-02 2014-05-08 Lawrence Livermore National Security, Llc Method for preventing agglomeration of charged colloids without loss of surface activity
JP6393231B2 (en) * 2015-05-08 2018-09-19 信越化学工業株式会社 Polishing agent for synthetic quartz glass substrate and method for polishing synthetic quartz glass substrate
KR20180095846A (en) * 2015-12-16 2018-08-28 로디아 오퍼레이션스 Method for polishing a phosphate glass or fluorophosphate glass substrate

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000248263A (en) * 1999-03-01 2000-09-12 Hitachi Chem Co Ltd Cmp grinding liquid
US7037352B2 (en) * 2000-12-12 2006-05-02 Showa Denko Kabushiki Kaisha Polishing particle and method for producing polishing particle
TWI292780B (en) * 2000-12-12 2008-01-21 Showa Denko Kk

Also Published As

Publication number Publication date
US20050287931A1 (en) 2005-12-29
WO2004037943A1 (en) 2004-05-06
EP1554357A1 (en) 2005-07-20

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase