AU2003243779A1 - Method and apparatus for maskless photolithography - Google Patents

Method and apparatus for maskless photolithography

Info

Publication number
AU2003243779A1
AU2003243779A1 AU2003243779A AU2003243779A AU2003243779A1 AU 2003243779 A1 AU2003243779 A1 AU 2003243779A1 AU 2003243779 A AU2003243779 A AU 2003243779A AU 2003243779 A AU2003243779 A AU 2003243779A AU 2003243779 A1 AU2003243779 A1 AU 2003243779A1
Authority
AU
Australia
Prior art keywords
maskless photolithography
maskless
photolithography
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003243779A
Other versions
AU2003243779A8 (en
Inventor
David P. Fries
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of South Florida
Original Assignee
University of South Florida
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/179,083 external-priority patent/US6544698B1/en
Priority claimed from US10/408,696 external-priority patent/US7095484B1/en
Application filed by University of South Florida filed Critical University of South Florida
Publication of AU2003243779A8 publication Critical patent/AU2003243779A8/en
Publication of AU2003243779A1 publication Critical patent/AU2003243779A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
AU2003243779A 2002-06-25 2003-06-24 Method and apparatus for maskless photolithography Abandoned AU2003243779A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US10/179,083 2002-06-25
US10/179,083 US6544698B1 (en) 2001-06-27 2002-06-25 Maskless 2-D and 3-D pattern generation photolithography
US10/408,696 US7095484B1 (en) 2001-06-27 2003-04-07 Method and apparatus for maskless photolithography
US10/408,696 2003-04-07
PCT/US2003/020019 WO2004001508A2 (en) 2002-06-25 2003-06-24 Method and apparatus for maskless photolithography

Publications (2)

Publication Number Publication Date
AU2003243779A8 AU2003243779A8 (en) 2004-01-06
AU2003243779A1 true AU2003243779A1 (en) 2004-01-06

Family

ID=30002663

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003243779A Abandoned AU2003243779A1 (en) 2002-06-25 2003-06-24 Method and apparatus for maskless photolithography

Country Status (2)

Country Link
AU (1) AU2003243779A1 (en)
WO (1) WO2004001508A2 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7012674B2 (en) * 2004-01-13 2006-03-14 Asml Holding N.V. Maskless optical writer
DE102006019963B4 (en) * 2006-04-28 2023-12-07 Envisiontec Gmbh Device and method for producing a three-dimensional object by layer-by-layer solidifying a material that can be solidified under the influence of electromagnetic radiation using mask exposure
KR20110020839A (en) * 2008-05-23 2011-03-03 쓰리엠 이노베이티브 프로퍼티즈 컴파니 Fabrication of microscale tooling
US9336993B2 (en) * 2014-02-26 2016-05-10 Taiwan Semiconductor Manufacturing Company, Ltd. Digital pattern generator (DPG) for E-beam lithography
CN110603491B (en) 2017-06-26 2022-02-22 应用材料公司 Image improvement for alignment by incoherent illumination mixing
CN110930316B (en) * 2019-10-24 2023-09-05 中山新诺科技股份有限公司 Gray image processing exposure method, device, system and equipment
US11366307B2 (en) 2020-08-27 2022-06-21 Kla Corporation Programmable and reconfigurable mask with MEMS micro-mirror array for defect detection
CN116300319A (en) * 2021-12-21 2023-06-23 广东洛恩光电科技有限公司 Photoetching machine and method for manufacturing holographic master plate, holographic master plate and anti-counterfeiting element

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6816302B2 (en) * 1998-03-02 2004-11-09 Micronic Laser Systems Ab Pattern generator
US6379867B1 (en) * 2000-01-10 2002-04-30 Ball Semiconductor, Inc. Moving exposure system and method for maskless lithography system

Also Published As

Publication number Publication date
AU2003243779A8 (en) 2004-01-06
WO2004001508A2 (en) 2003-12-31
WO2004001508A3 (en) 2004-08-05

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase