AU2003242269A1 - Method of forming surface indent and use thereof - Google Patents

Method of forming surface indent and use thereof

Info

Publication number
AU2003242269A1
AU2003242269A1 AU2003242269A AU2003242269A AU2003242269A1 AU 2003242269 A1 AU2003242269 A1 AU 2003242269A1 AU 2003242269 A AU2003242269 A AU 2003242269A AU 2003242269 A AU2003242269 A AU 2003242269A AU 2003242269 A1 AU2003242269 A1 AU 2003242269A1
Authority
AU
Australia
Prior art keywords
forming surface
surface indent
indent
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003242269A
Inventor
Mitsunori Iwamuro
Keiko Kizawa
Takeshi Nojiri
Kazuya Sato
Seiji Tai
Yasuo Tsuruoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2002190516A external-priority patent/JP2004037522A/en
Priority claimed from JP2002190515A external-priority patent/JP2004037521A/en
Priority claimed from JP2002190509A external-priority patent/JP2004037519A/en
Priority claimed from JP2002190511A external-priority patent/JP2004033811A/en
Priority claimed from JP2002190508A external-priority patent/JP2004037518A/en
Priority claimed from JP2002223407A external-priority patent/JP2004062051A/en
Priority claimed from JP2002370626A external-priority patent/JP2004198992A/en
Priority claimed from JP2002370629A external-priority patent/JP2004198995A/en
Priority claimed from JP2002370619A external-priority patent/JP2004198988A/en
Priority claimed from JP2002370628A external-priority patent/JP2004198994A/en
Priority claimed from JP2002370620A external-priority patent/JP2004198989A/en
Priority claimed from JP2002370625A external-priority patent/JP2004198991A/en
Priority claimed from JP2002370617A external-priority patent/JP2004198986A/en
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Publication of AU2003242269A1 publication Critical patent/AU2003242269A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133553—Reflecting elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
AU2003242269A 2002-06-06 2003-06-06 Method of forming surface indent and use thereof Abandoned AU2003242269A1 (en)

Applications Claiming Priority (29)

Application Number Priority Date Filing Date Title
JP2002/165052 2002-06-06
JP2002165052 2002-06-06
JP2002190515A JP2004037521A (en) 2002-06-28 2002-06-28 Surface unevenness forming method, optical film and diffuse reflection plate each obtained by the same and method for manufacturing diffuse reflection plate
JP2002/190515 2002-06-28
JP2002190509A JP2004037519A (en) 2002-06-28 2002-06-28 Surface unevenness formation method, optical film and diffusion reflecting plate obtained by the method, and diffusion reflecting plate production method
JP2002/190516 2002-06-28
JP2002190511A JP2004033811A (en) 2002-06-28 2002-06-28 Method of forming rugged surface, optical film obtained thereby, diffusion reflection plate and manufacturing method of diffusion reflection plate
JP2002190508A JP2004037518A (en) 2002-06-28 2002-06-28 Surface irregularities forming method, optical film obtained thereby and diffuse reflector plate and manufacture method for diffuse reflector plate
JP2002/190509 2002-06-28
JP2002/190511 2002-06-28
JP2002/190508 2002-06-28
JP2002190516A JP2004037522A (en) 2002-06-28 2002-06-28 Surface unevenness formation method, optical film and diffusion reflecting plate obtained by the method and diffusion reflecting plate production method
JP2002/223407 2002-07-31
JP2002223407A JP2004062051A (en) 2002-07-31 2002-07-31 Surface unevenness forming method, optical film obtained by the same, diffuse reflection board and manufacturing method of diffuse reflection board
JP2002370626A JP2004198992A (en) 2002-12-20 2002-12-20 Energy-sensitive negative resin composition to be used for organic substance layer having rugged surface pattern of substrate for liquid crystal display, and photosensitive element
JP2002/370629 2002-12-20
JP2002370629A JP2004198995A (en) 2002-12-20 2002-12-20 Photosensitive resin composition to be used for organic substance layer having rugged surface pattern of substrate for liquid crystal display, and photosensitive element
JP2002/370625 2002-12-20
JP2002/370619 2002-12-20
JP2002/370620 2002-12-20
JP2002/370617 2002-12-20
JP2002/370626 2002-12-20
JP2002370619A JP2004198988A (en) 2002-12-20 2002-12-20 Method for forming rugged surface, and optical film and diffusive reflector obtained by the same
JP2002370628A JP2004198994A (en) 2002-12-20 2002-12-20 Energy-sensitive negative resin composition and photosensitive element used for organic layer having roughened surface of substrate for liquid crystal display device
JP2002370620A JP2004198989A (en) 2002-12-20 2002-12-20 Surface asperity forming method, optical film obtained by the same, diffuse reflection plate, and roughened surface film
JP2002370625A JP2004198991A (en) 2002-12-20 2002-12-20 Energy-sensitive negative resin composition
JP2002/370628 2002-12-20
JP2002370617A JP2004198986A (en) 2002-12-20 2002-12-20 Surface unevenness forming method, optical film obtained thereby, diffuse reflective plate, and film having surface unevenness
PCT/JP2003/007222 WO2003104899A1 (en) 2002-06-06 2003-06-06 Method of forming surface indent and use thereof

Publications (1)

Publication Number Publication Date
AU2003242269A1 true AU2003242269A1 (en) 2003-12-22

Family

ID=29741287

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003242269A Abandoned AU2003242269A1 (en) 2002-06-06 2003-06-06 Method of forming surface indent and use thereof

Country Status (2)

Country Link
AU (1) AU2003242269A1 (en)
WO (1) WO2003104899A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1997940B (en) * 2004-07-13 2011-12-14 斯蒂茨丁荷兰聚合物学会 Microstructuring method of mesogens using contact printing
KR101194469B1 (en) * 2010-12-24 2012-10-24 삼성전기주식회사 Substrate for package and method for manufacturing the same
CN105824064A (en) * 2015-01-08 2016-08-03 深圳市绎立锐光科技开发有限公司 Diffusion plate and making method thereof

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5416203A (en) * 1977-07-07 1979-02-06 Nippon Paint Co Ltd Dry making method of photosensitive resin plate
JPH03182758A (en) * 1989-12-13 1991-08-08 Canon Inc Formation of rugged pattern
JP3941207B2 (en) * 1998-03-04 2007-07-04 凸版印刷株式会社 Diffuse reflector, manufacturing method thereof, and reflective liquid crystal display using the same
JP2002055214A (en) * 2000-05-29 2002-02-20 Hitachi Chem Co Ltd Reflection base photosensitive element, method for manufacturing photosensitive layer laminated substrate by using the same, method for manufacturing substrate laminated with diffusion reflection base layer and method for manufacturing diffusion reflecting plate
JP2002122716A (en) * 2000-10-17 2002-04-26 Matsushita Electric Ind Co Ltd Reflection plate, reflection type liquid crystal display device and method for manufacturing the same
JP4651800B2 (en) * 2000-10-24 2011-03-16 富士フイルム株式会社 Negative photosensitive thermosetting transfer material for interlayer insulating film, method for forming interlayer insulating film, high aperture type liquid crystal display device and manufacturing method thereof
JP2002182017A (en) * 2000-12-14 2002-06-26 Nippon Steel Chem Co Ltd Substrate having rugged shape on surface and method for producing the same
JP2002267805A (en) * 2001-03-08 2002-09-18 Nippon Steel Chem Co Ltd Lens film

Also Published As

Publication number Publication date
WO2003104899A1 (en) 2003-12-18

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase