AU2003230593A8 - Refractive projection objective - Google Patents

Refractive projection objective

Info

Publication number
AU2003230593A8
AU2003230593A8 AU2003230593A AU2003230593A AU2003230593A8 AU 2003230593 A8 AU2003230593 A8 AU 2003230593A8 AU 2003230593 A AU2003230593 A AU 2003230593A AU 2003230593 A AU2003230593 A AU 2003230593A AU 2003230593 A8 AU2003230593 A8 AU 2003230593A8
Authority
AU
Australia
Prior art keywords
projection objective
refractive projection
refractive
objective
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003230593A
Other versions
AU2003230593A1 (en
Inventor
Hans-Jurgen Rostalski
Wilhelm Ulrich
Russell Hudyma
Rolf Freimann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of AU2003230593A8 publication Critical patent/AU2003230593A8/en
Publication of AU2003230593A1 publication Critical patent/AU2003230593A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B9/00—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or -
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70975—Assembly, maintenance, transport or storage of apparatus
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Prostheses (AREA)
  • Endoscopes (AREA)
AU2003230593A 2002-03-01 2003-03-03 Refractive projection objective Abandoned AU2003230593A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US36084502P 2002-03-01 2002-03-01
US60/360,845 2002-03-01
PCT/US2003/006592 WO2003075049A2 (en) 2002-03-01 2003-03-03 Refractive projection objective

Publications (2)

Publication Number Publication Date
AU2003230593A8 true AU2003230593A8 (en) 2003-09-16
AU2003230593A1 AU2003230593A1 (en) 2003-09-16

Family

ID=27789034

Family Applications (2)

Application Number Title Priority Date Filing Date
AU2003210214A Abandoned AU2003210214A1 (en) 2002-03-01 2003-02-06 Refractive projection lens
AU2003230593A Abandoned AU2003230593A1 (en) 2002-03-01 2003-03-03 Refractive projection objective

Family Applications Before (1)

Application Number Title Priority Date Filing Date
AU2003210214A Abandoned AU2003210214A1 (en) 2002-03-01 2003-02-06 Refractive projection lens

Country Status (5)

Country Link
EP (1) EP1483626A2 (en)
JP (1) JP2005519332A (en)
KR (1) KR20040089688A (en)
AU (2) AU2003210214A1 (en)
WO (2) WO2003075096A2 (en)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10229249A1 (en) 2002-03-01 2003-09-04 Zeiss Carl Semiconductor Mfg Refractive projection lens with a waist
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
AU2003304557A1 (en) * 2003-10-22 2005-06-08 Carl Zeiss Smt Ag Refractive projection objective for immersion lithography
DE602004019142D1 (en) 2003-12-02 2009-03-05 Zeiss Carl Smt Ag OPTICAL PROJECTION SYSTEM
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
WO2005111689A2 (en) 2004-05-17 2005-11-24 Carl Zeiss Smt Ag Catadioptric projection objective with intermediate images
US7301707B2 (en) 2004-09-03 2007-11-27 Carl Zeiss Smt Ag Projection optical system and method
US7508488B2 (en) 2004-10-13 2009-03-24 Carl Zeiss Smt Ag Projection exposure system and method of manufacturing a miniaturized device
DE102005045862A1 (en) 2004-10-19 2006-04-20 Carl Zeiss Smt Ag Optical system for ultraviolet light has liquid lens arranged in space between first and second limiting optical elements and containing liquid transparent for wavelength less than or equal to 200 nm
US7508489B2 (en) 2004-12-13 2009-03-24 Carl Zeiss Smt Ag Method of manufacturing a miniaturized device
KR20070097083A (en) 2004-12-30 2007-10-02 칼 짜이스 에스엠테 아게 Projection optical system
JP2007114750A (en) 2005-09-09 2007-05-10 Asml Netherlands Bv Projection system design method, lithography apparatus, and device manufacturing method
KR101235492B1 (en) 2006-07-03 2013-02-20 칼 짜이스 에스엠테 게엠베하 Method for revising/repairing a lithographic projection objective
DE102006045075A1 (en) 2006-09-21 2008-04-03 Carl Zeiss Smt Ag Controllable optical element
KR101507622B1 (en) 2006-12-01 2015-03-31 칼 짜이스 에스엠티 게엠베하 Optical system with an exchangeable, manipulable correction arrangement for reducing image aberations
DE102008000790A1 (en) 2007-03-20 2008-09-25 Carl Zeiss Smt Ag A method for improving imaging properties of an optical system and such an optical system
JP5462791B2 (en) 2007-08-03 2014-04-02 カール・ツァイス・エスエムティー・ゲーエムベーハー Projection objective, projection exposure apparatus, and projection exposure method for microlithography
DE102008041144A1 (en) 2007-08-21 2009-03-05 Carl Zeiss Smt Ag Optical arrangement for e.g. projection lens, has structure for optimizing arrangement with respect to angle of incident angle-dependent polarization division in phase and amplitude, and another structure compensating change of wave front
JP5579063B2 (en) 2007-08-24 2014-08-27 カール・ツァイス・エスエムティー・ゲーエムベーハー Controllable optical element, method of operating optical element with thermal actuator, and projection exposure apparatus for semiconductor lithography
EP2048540A1 (en) 2007-10-09 2009-04-15 Carl Zeiss SMT AG Microlithographic projection exposure apparatus
DE102007055567A1 (en) 2007-11-20 2009-05-28 Carl Zeiss Smt Ag Optical system
JP5533656B2 (en) * 2008-09-18 2014-06-25 株式会社ニコン Imaging optical system, exposure apparatus, and electronic device manufacturing method
DE102008042356A1 (en) 2008-09-25 2010-04-08 Carl Zeiss Smt Ag Projection exposure system with optimized adjustment option
WO2011116792A1 (en) 2010-03-26 2011-09-29 Carl Zeiss Smt Gmbh Optical system, exposure apparatus, and waverfront correction method
JP6282742B2 (en) 2013-09-09 2018-02-21 カール・ツァイス・エスエムティー・ゲーエムベーハー Microlithographic projection exposure apparatus and method for correcting optical wavefront deformation in such an apparatus
US9494772B1 (en) 2014-03-16 2016-11-15 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low field curvature
US9091843B1 (en) 2014-03-16 2015-07-28 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low track length to focal length ratio
US9726859B1 (en) 2014-03-16 2017-08-08 Navitar Industries, Llc Optical assembly for a wide field of view camera with low TV distortion
US10386604B1 (en) 2014-03-16 2019-08-20 Navitar Industries, Llc Compact wide field of view digital camera with stray light impact suppression
US9316808B1 (en) 2014-03-16 2016-04-19 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with a low sag aspheric lens element
US9995910B1 (en) 2014-03-16 2018-06-12 Navitar Industries, Llc Optical assembly for a compact wide field of view digital camera with high MTF
US9316820B1 (en) 2014-03-16 2016-04-19 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low astigmatism
US10139595B1 (en) 2014-03-16 2018-11-27 Navitar Industries, Llc Optical assembly for a compact wide field of view digital camera with low first lens diameter to image diagonal ratio
US10545314B1 (en) 2014-03-16 2020-01-28 Navitar Industries, Llc Optical assembly for a compact wide field of view digital camera with low lateral chromatic aberration

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3624973B2 (en) * 1995-10-12 2005-03-02 株式会社ニコン Projection optical system
DE19855157A1 (en) * 1998-11-30 2000-05-31 Zeiss Carl Fa Projection lens
DE19855108A1 (en) * 1998-11-30 2000-05-31 Zeiss Carl Fa Microlithographic reduction lens, projection exposure system and method
WO2001050171A1 (en) * 1999-12-29 2001-07-12 Carl Zeiss Projection lens comprising adjacent aspheric lens surfaces

Also Published As

Publication number Publication date
WO2003075049A2 (en) 2003-09-12
KR20040089688A (en) 2004-10-21
AU2003210214A1 (en) 2003-09-16
JP2005519332A (en) 2005-06-30
EP1483626A2 (en) 2004-12-08
AU2003230593A1 (en) 2003-09-16
WO2003075096A2 (en) 2003-09-12
WO2003075049A3 (en) 2004-04-08
WO2003075096A3 (en) 2003-11-13

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase