AU2003212341A1 - Objective lens consisting of crystal lenses - Google Patents

Objective lens consisting of crystal lenses

Info

Publication number
AU2003212341A1
AU2003212341A1 AU2003212341A AU2003212341A AU2003212341A1 AU 2003212341 A1 AU2003212341 A1 AU 2003212341A1 AU 2003212341 A AU2003212341 A AU 2003212341A AU 2003212341 A AU2003212341 A AU 2003212341A AU 2003212341 A1 AU2003212341 A1 AU 2003212341A1
Authority
AU
Australia
Prior art keywords
objective lens
lens consisting
crystal lenses
lenses
crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003212341A
Other versions
AU2003212341A8 (en
Inventor
Aksel Goehnermeier
Daniel Kraehmer
Birgit Mecking
Alexandra Pazidis
Christoph Zaczek
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of AU2003212341A8 publication Critical patent/AU2003212341A8/en
Publication of AU2003212341A1 publication Critical patent/AU2003212341A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU2003212341A 2002-03-12 2003-03-12 Objective lens consisting of crystal lenses Abandoned AU2003212341A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10210782.3 2002-03-12
DE2002110782 DE10210782A1 (en) 2002-03-12 2002-03-12 Lens with crystal lenses
PCT/EP2003/002549 WO2003077007A2 (en) 2002-03-12 2003-03-12 Objective lens consisting of crystal lenses

Publications (2)

Publication Number Publication Date
AU2003212341A8 AU2003212341A8 (en) 2003-09-22
AU2003212341A1 true AU2003212341A1 (en) 2003-09-22

Family

ID=27797700

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003212341A Abandoned AU2003212341A1 (en) 2002-03-12 2003-03-12 Objective lens consisting of crystal lenses

Country Status (6)

Country Link
EP (1) EP1483614A2 (en)
JP (1) JP2005520187A (en)
CN (1) CN1653359A (en)
AU (1) AU2003212341A1 (en)
DE (1) DE10210782A1 (en)
WO (1) WO2003077007A2 (en)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6683710B2 (en) 2001-06-01 2004-01-27 Optical Research Associates Correction of birefringence in cubic crystalline optical systems
US6995908B2 (en) 2001-10-30 2006-02-07 Asml Netherlands B.V. Methods for reducing aberration in optical systems
US7453641B2 (en) 2001-10-30 2008-11-18 Asml Netherlands B.V. Structures and methods for reducing aberration in optical systems
US6970232B2 (en) 2001-10-30 2005-11-29 Asml Netherlands B.V. Structures and methods for reducing aberration in integrated circuit fabrication systems
JP4333078B2 (en) 2002-04-26 2009-09-16 株式会社ニコン Projection optical system, exposure apparatus including the projection optical system, exposure method using the projection optical system, and device manufacturing method
US7072102B2 (en) 2002-08-22 2006-07-04 Asml Netherlands B.V. Methods for reducing polarization aberration in optical systems
AU2003298405A1 (en) 2002-09-03 2004-03-29 Carl Zeiss Smt Ag Optimization method for an objective with fluoride crystal lenses and objective with fluoride crystal lenses
US7466489B2 (en) 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
CN1910672A (en) * 2004-01-16 2007-02-07 皇家飞利浦电子股份有限公司 Optical system
US7423727B2 (en) * 2005-01-25 2008-09-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR20070105976A (en) * 2005-02-25 2007-10-31 칼 짜이스 에스엠티 아게 Optical system, in particular objective or illumination system for a microlithographic projection exposure apparatus
WO2007063136A2 (en) * 2005-12-02 2007-06-07 Carl Zeiss Smt Ag Optical element comprising a double-refractive coating
US7518797B2 (en) 2005-12-02 2009-04-14 Carl Zeiss Smt Ag Microlithographic exposure apparatus
DE102007058862A1 (en) 2007-12-06 2009-06-10 Carl Zeiss Smt Ag Optical system, particularly for microlithographic projection illumination system, has transparent optical element during working wavelength
US9599787B2 (en) 2011-12-27 2017-03-21 Tera Xtal Technology Corporation Using sapphire lens to protect the lens module
DE102012206154A1 (en) 2012-04-16 2013-06-06 Carl Zeiss Smt Gmbh Optical system for microlithographic projection exposure system utilized for manufacturing e.g. LCD, has mirror elements adjusted independent of each other, and retarding layer arranged on reflection surface of one of mirror elements
DE102013108321B3 (en) * 2013-08-02 2014-10-23 Leibniz-Institut für Analytische Wissenschaften-ISAS-e.V. Fresnel parallelepiped

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6201634B1 (en) * 1998-03-12 2001-03-13 Nikon Corporation Optical element made from fluoride single crystal, method for manufacturing optical element, method for calculating birefringence of optical element and method for determining direction of minimum birefringence of optical element
JP2004526331A (en) * 2001-05-15 2004-08-26 カール・ツアイス・エスエムテイ・アーゲー Objective lens including fluoride crystal lens
AU2002257270A1 (en) * 2001-05-16 2002-11-25 Corning Incorporated Preferred crystal orientation optical elements from cubic materials
JP2003050349A (en) * 2001-05-30 2003-02-21 Nikon Corp Optical system and exposure system provided with the optical system
US6683710B2 (en) * 2001-06-01 2004-01-27 Optical Research Associates Correction of birefringence in cubic crystalline optical systems
JP3639807B2 (en) * 2001-06-27 2005-04-20 キヤノン株式会社 Optical element and manufacturing method
US6831731B2 (en) * 2001-06-28 2004-12-14 Nikon Corporation Projection optical system and an exposure apparatus with the projection optical system
JPWO2003003429A1 (en) * 2001-06-28 2004-10-21 株式会社ニコン Projection optical system, exposure apparatus and method
US6788389B2 (en) * 2001-07-10 2004-09-07 Nikon Corporation Production method of projection optical system
TW571344B (en) * 2001-07-10 2004-01-11 Nikon Corp Manufacturing method for projection optic system

Also Published As

Publication number Publication date
WO2003077007A2 (en) 2003-09-18
CN1653359A (en) 2005-08-10
JP2005520187A (en) 2005-07-07
EP1483614A2 (en) 2004-12-08
AU2003212341A8 (en) 2003-09-22
WO2003077007A3 (en) 2004-04-08
DE10210782A1 (en) 2003-10-09

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase