AU2003211995A1 - Position measuring method, exposure method, and device producing method - Google Patents

Position measuring method, exposure method, and device producing method

Info

Publication number
AU2003211995A1
AU2003211995A1 AU2003211995A AU2003211995A AU2003211995A1 AU 2003211995 A1 AU2003211995 A1 AU 2003211995A1 AU 2003211995 A AU2003211995 A AU 2003211995A AU 2003211995 A AU2003211995 A AU 2003211995A AU 2003211995 A1 AU2003211995 A1 AU 2003211995A1
Authority
AU
Australia
Prior art keywords
position measuring
device producing
exposure
measuring method
exposure method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003211995A
Inventor
Yuji Kokumai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2003211995A1 publication Critical patent/AU2003211995A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
    • G01B11/27—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
AU2003211995A 2002-02-15 2003-02-14 Position measuring method, exposure method, and device producing method Abandoned AU2003211995A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002-038966 2002-02-15
JP2002038966 2002-02-15
PCT/JP2003/001567 WO2003069276A1 (en) 2002-02-15 2003-02-14 Position measuring method, exposure method, and device producing method

Publications (1)

Publication Number Publication Date
AU2003211995A1 true AU2003211995A1 (en) 2003-09-04

Family

ID=27678209

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003211995A Abandoned AU2003211995A1 (en) 2002-02-15 2003-02-14 Position measuring method, exposure method, and device producing method

Country Status (4)

Country Link
JP (1) JPWO2003069276A1 (en)
AU (1) AU2003211995A1 (en)
TW (1) TW588411B (en)
WO (1) WO2003069276A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7687925B2 (en) 2005-09-07 2010-03-30 Infineon Technologies Ag Alignment marks for polarized light lithography and method for use thereof
JP4862396B2 (en) * 2005-12-27 2012-01-25 株式会社ニコン Edge position measuring method and apparatus, and exposure apparatus
JP2008203214A (en) * 2007-02-22 2008-09-04 Taiko Denki Co Ltd Work deformation/distortion detecting method
JP5457767B2 (en) * 2009-09-08 2014-04-02 キヤノン株式会社 Exposure apparatus and device manufacturing method
KR20140056336A (en) * 2011-08-23 2014-05-09 에이에스엠엘 네델란즈 비.브이. Metrology method and apparatus, and device manufacturing method
JP2013120108A (en) * 2011-12-07 2013-06-17 Sumitomo Heavy Ind Ltd Thin film formation device and thin film formation method

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5721605A (en) * 1994-03-29 1998-02-24 Nikon Corporation Alignment device and method with focus detection system
KR100467858B1 (en) * 1996-02-05 2005-11-01 가부시키가이샤 니콘 Alignment, Exposure Methods and Exposure Equipment
AU8129398A (en) * 1997-07-14 1999-02-10 Nikon Corporation Position sensing method and position sensor
JP2001343215A (en) * 2000-06-02 2001-12-14 Ricoh Co Ltd Position-adjusting apparatus and its method

Also Published As

Publication number Publication date
WO2003069276A1 (en) 2003-08-21
TW200305193A (en) 2003-10-16
JPWO2003069276A1 (en) 2005-06-09
TW588411B (en) 2004-05-21

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase