AU2003210213A8 - Polarisation-optimised illumination system - Google Patents
Polarisation-optimised illumination systemInfo
- Publication number
- AU2003210213A8 AU2003210213A8 AU2003210213A AU2003210213A AU2003210213A8 AU 2003210213 A8 AU2003210213 A8 AU 2003210213A8 AU 2003210213 A AU2003210213 A AU 2003210213A AU 2003210213 A AU2003210213 A AU 2003210213A AU 2003210213 A8 AU2003210213 A8 AU 2003210213A8
- Authority
- AU
- Australia
- Prior art keywords
- polarisation
- illumination system
- optimised illumination
- optimised
- illumination
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
- G02B27/283—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70566—Polarisation control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Polarising Elements (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10206061.4 | 2002-02-08 | ||
DE2002106061 DE10206061A1 (en) | 2002-02-08 | 2002-02-08 | Polarization-optimized lighting system |
PCT/EP2003/001146 WO2003067334A2 (en) | 2002-02-08 | 2003-02-05 | Polarisation-optimised illumination system |
Publications (2)
Publication Number | Publication Date |
---|---|
AU2003210213A1 AU2003210213A1 (en) | 2003-09-02 |
AU2003210213A8 true AU2003210213A8 (en) | 2003-09-02 |
Family
ID=27674625
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2003210213A Abandoned AU2003210213A1 (en) | 2002-02-08 | 2003-02-05 | Polarisation-optimised illumination system |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1474726A2 (en) |
AU (1) | AU2003210213A1 (en) |
DE (1) | DE10206061A1 (en) |
WO (1) | WO2003067334A2 (en) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101484435B1 (en) | 2003-04-09 | 2015-01-19 | 가부시키가이샤 니콘 | Exposure method and apparatus, and device manufacturing method |
AU2003255441A1 (en) * | 2003-08-14 | 2005-03-29 | Carl Zeiss Smt Ag | Illuminating device for a microlithographic projection illumination system |
WO2005050325A1 (en) * | 2003-11-05 | 2005-06-02 | Carl Zeiss Smt Ag | Polarization-optimizing illumination system |
TWI612338B (en) | 2003-11-20 | 2018-01-21 | 尼康股份有限公司 | Optical illuminating apparatus, exposure device, exposure method, and device manufacturing method |
US20070019179A1 (en) | 2004-01-16 | 2007-01-25 | Damian Fiolka | Polarization-modulating optical element |
US8270077B2 (en) | 2004-01-16 | 2012-09-18 | Carl Zeiss Smt Gmbh | Polarization-modulating optical element |
WO2005069081A2 (en) | 2004-01-16 | 2005-07-28 | Carl Zeiss Smt Ag | Polarization-modulating optical element |
TWI412067B (en) | 2004-02-06 | 2013-10-11 | 尼康股份有限公司 | Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method |
DE102004010569A1 (en) * | 2004-02-26 | 2005-09-15 | Carl Zeiss Smt Ag | Illumination system for a microlithography projection exposure apparatus |
DE102004023030B4 (en) * | 2004-05-06 | 2012-12-27 | SIOS Meßtechnik GmbH | Multiple beam splitter |
DE102010049751B4 (en) * | 2010-10-29 | 2020-11-05 | "Stiftung Caesar" (Center Of Advanced European Studies And Research) | Optical beam splitter for the simultaneous recording of a Z-stack on a semiconductor chip, kit for the construction of an optical beam splitter and light microscope |
DE102010061786A1 (en) * | 2010-11-23 | 2012-05-24 | Siemens Aktiengesellschaft | Microscope illumination and microscope |
RU2612361C2 (en) | 2011-03-30 | 2017-03-07 | МЭППЕР ЛИТОГРАФИ АйПи Б.В. | Lithography system with differential interferometer module |
JP6137179B2 (en) | 2011-07-26 | 2017-05-31 | カール・ツァイス・エスエムティー・ゲーエムベーハー | Optical system of microlithography projection exposure apparatus and microlithography exposure method |
DE102011079837A1 (en) * | 2011-07-26 | 2013-01-31 | Carl Zeiss Smt Gmbh | Optical system for microlithographic projection exposure system for manufacturing e.g. LCDs, has beam-splitting optic element arranged such that degree of polarization of incident light beam is lesser than specified value |
US9551563B2 (en) | 2012-09-27 | 2017-01-24 | Mapper Lithography Ip B.V. | Multi-axis differential interferometer |
DE102012217769A1 (en) | 2012-09-28 | 2014-04-03 | Carl Zeiss Smt Gmbh | Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method |
CN112987323B (en) * | 2019-12-13 | 2022-03-22 | 中国科学院大连化学物理研究所 | High-energy solid pulse laser polarization beam combining device |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1992022838A1 (en) * | 1991-06-13 | 1992-12-23 | Minnesota Mining And Manufacturing Company | Retroreflecting polarizer |
KR0153796B1 (en) * | 1993-09-24 | 1998-11-16 | 사토 후미오 | Exposure apparatus and method |
KR0166612B1 (en) * | 1993-10-29 | 1999-02-01 | 가나이 쓰토무 | Method and apparatus for exposing pattern, mask used therefor and semiconductor integrated circuit formed by using the same |
DE19535392A1 (en) * | 1995-09-23 | 1997-03-27 | Zeiss Carl Fa | Radial polarization-rotating optical arrangement and microlithography projection exposure system with it |
KR100472866B1 (en) * | 1996-02-23 | 2005-10-06 | 에이에스엠엘 네델란즈 비.브이. | Lighting unit for optical device |
US6257726B1 (en) * | 1997-02-13 | 2001-07-10 | Canon Kabushiki Kaisha | Illuminating apparatus and projecting apparatus |
JP3697013B2 (en) * | 1997-02-19 | 2005-09-21 | キヤノン株式会社 | Illumination device and projection device using the same |
US6013401A (en) * | 1997-03-31 | 2000-01-11 | Svg Lithography Systems, Inc. | Method of controlling illumination field to reduce line width variation |
KR100584534B1 (en) * | 1999-04-26 | 2006-05-30 | 삼성전자주식회사 | Reflection type projector |
DE19921795A1 (en) * | 1999-05-11 | 2000-11-23 | Zeiss Carl Fa | Projection exposure system and exposure method of microlithography |
JP3600076B2 (en) * | 1999-08-04 | 2004-12-08 | 三洋電機株式会社 | Lighting optical system |
JP2001343611A (en) * | 2000-03-31 | 2001-12-14 | Nikon Corp | Polarization illumination device and projection type display device |
JP2001311912A (en) * | 2000-04-28 | 2001-11-09 | Minolta Co Ltd | Lighting optical system |
-
2002
- 2002-02-08 DE DE2002106061 patent/DE10206061A1/en not_active Withdrawn
-
2003
- 2003-02-05 WO PCT/EP2003/001146 patent/WO2003067334A2/en not_active Application Discontinuation
- 2003-02-05 AU AU2003210213A patent/AU2003210213A1/en not_active Abandoned
- 2003-02-05 EP EP03737317A patent/EP1474726A2/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
EP1474726A2 (en) | 2004-11-10 |
WO2003067334A2 (en) | 2003-08-14 |
DE10206061A1 (en) | 2003-09-04 |
AU2003210213A1 (en) | 2003-09-02 |
WO2003067334A3 (en) | 2004-09-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |