AU2002343844A1 - Method of preparing very pure silicon chloride and/or germanium chloride - Google Patents
Method of preparing very pure silicon chloride and/or germanium chlorideInfo
- Publication number
- AU2002343844A1 AU2002343844A1 AU2002343844A AU2002343844A AU2002343844A1 AU 2002343844 A1 AU2002343844 A1 AU 2002343844A1 AU 2002343844 A AU2002343844 A AU 2002343844A AU 2002343844 A AU2002343844 A AU 2002343844A AU 2002343844 A1 AU2002343844 A1 AU 2002343844A1
- Authority
- AU
- Australia
- Prior art keywords
- chloride
- preparing
- pure silicon
- germanium
- silicon chloride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/10778—Purification
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B9/00—General methods of preparing halides
- C01B9/02—Chlorides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G17/00—Compounds of germanium
- C01G17/04—Halides of germanium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/02—Pretreated ingredients
- C03C1/022—Purification of silica sand or other minerals
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
- C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/31—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with germanium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- General Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- General Health & Medical Sciences (AREA)
- Health & Medical Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL1019371A NL1019371C2 (nl) | 2001-11-15 | 2001-11-15 | Werkwijze voor het bereiden van zeer zuiver siliciumchloride en/of germaniumchloride. |
NL1019371 | 2001-11-15 | ||
PCT/NL2002/000716 WO2003059808A1 (en) | 2001-11-15 | 2002-11-08 | Method of preparing very pure silicon chloride and/or germanium chloride |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2002343844A1 true AU2002343844A1 (en) | 2003-07-30 |
Family
ID=19774314
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2002343844A Abandoned AU2002343844A1 (en) | 2001-11-15 | 2002-11-08 | Method of preparing very pure silicon chloride and/or germanium chloride |
Country Status (3)
Country | Link |
---|---|
AU (1) | AU2002343844A1 (nl) |
NL (1) | NL1019371C2 (nl) |
WO (1) | WO2003059808A1 (nl) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106730964A (zh) * | 2015-11-25 | 2017-05-31 | 衡阳恒荣高纯半导体材料有限公司 | 一种生产高纯四氯化锗的蒸馏装置 |
EP3653577B1 (de) * | 2018-11-14 | 2021-10-06 | Evonik Operations GmbH | Tris(trichlorsilyl)dichlorogallylgerman, verfahren zu dessen herstellung und dessen verwendung |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE632835A (nl) * | 1962-06-04 | |||
JPS53100193A (en) * | 1977-02-14 | 1978-09-01 | Shin Etsu Chem Co Ltd | Silicon tetrachloride purifying method |
US4310341A (en) * | 1980-09-12 | 1982-01-12 | Bell Telephone Laboratories, Incorporated | Removal of --OH impurities from fiber optic precursor materials |
GB2162168B (en) * | 1984-07-25 | 1988-06-29 | Stc Plc | Optical fibre manufacture |
DE3502367A1 (de) * | 1985-01-25 | 1986-07-31 | Philips Patentverwaltung Gmbh, 2000 Hamburg | Verfahren zum entfernen von wasserstoff aus in siliziumtetrachlorid oder germaniumtetrachlorid geloesten wasserstoffhaltigen verbindungen |
JP2867696B2 (ja) * | 1990-11-29 | 1999-03-08 | 信越化学工業株式会社 | 四塩化ケイ素の精製方法 |
CN1117176C (zh) * | 1997-12-31 | 2003-08-06 | 等离子光纤维股份有限公司 | 等离子体化学汽相淀积装置和制造光纤、预制棒及套管的方法以及由此制造的光纤 |
-
2001
- 2001-11-15 NL NL1019371A patent/NL1019371C2/nl not_active IP Right Cessation
-
2002
- 2002-11-08 AU AU2002343844A patent/AU2002343844A1/en not_active Abandoned
- 2002-11-08 WO PCT/NL2002/000716 patent/WO2003059808A1/en not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
NL1019371C2 (nl) | 2003-05-16 |
WO2003059808A1 (en) | 2003-07-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |