AU2002325340A1 - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
AU2002325340A1
AU2002325340A1 AU2002325340A AU2002325340A AU2002325340A1 AU 2002325340 A1 AU2002325340 A1 AU 2002325340A1 AU 2002325340 A AU2002325340 A AU 2002325340A AU 2002325340 A AU2002325340 A AU 2002325340A AU 2002325340 A1 AU2002325340 A1 AU 2002325340A1
Authority
AU
Australia
Prior art keywords
resin composition
photosensitive resin
photosensitive
composition
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002325340A
Inventor
Hisatoshi Kura
Masaki Ohwa
Hidetaka Oka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of AU2002325340A1 publication Critical patent/AU2002325340A1/en
Abandoned legal-status Critical Current

Links

AU2002325340A 2001-07-26 2002-07-18 Photosensitive resin composition Abandoned AU2002325340A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP01810734.2 2001-07-26

Publications (1)

Publication Number Publication Date
AU2002325340A1 true AU2002325340A1 (en) 2003-02-17

Family

ID=

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