AU2002237806A1 - Method for fabricating 3-d structures with smoothly-varying topographic features in photo-sensitized epoxy resists - Google Patents

Method for fabricating 3-d structures with smoothly-varying topographic features in photo-sensitized epoxy resists

Info

Publication number
AU2002237806A1
AU2002237806A1 AU2002237806A AU2002237806A AU2002237806A1 AU 2002237806 A1 AU2002237806 A1 AU 2002237806A1 AU 2002237806 A AU2002237806 A AU 2002237806A AU 2002237806 A AU2002237806 A AU 2002237806A AU 2002237806 A1 AU2002237806 A1 AU 2002237806A1
Authority
AU
Australia
Prior art keywords
fabricating
photo
smoothly
structures
topographic features
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002237806A
Inventor
Martin A. Afromowitz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority claimed from PCT/US2002/000764 external-priority patent/WO2003069409A1/en
Publication of AU2002237806A1 publication Critical patent/AU2002237806A1/en
Abandoned legal-status Critical Current

Links

AU2002237806A 2002-01-11 2002-01-11 Method for fabricating 3-d structures with smoothly-varying topographic features in photo-sensitized epoxy resists Abandoned AU2002237806A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2002/000764 WO2003069409A1 (en) 2001-07-10 2002-01-11 Method for fabricating 3-d structures with smoothly-varying topographic features in photo-sensitized epoxy resists

Publications (1)

Publication Number Publication Date
AU2002237806A1 true AU2002237806A1 (en) 2003-09-04

Family

ID=34078410

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002237806A Abandoned AU2002237806A1 (en) 2002-01-11 2002-01-11 Method for fabricating 3-d structures with smoothly-varying topographic features in photo-sensitized epoxy resists

Country Status (1)

Country Link
AU (1) AU2002237806A1 (en)

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase