AU2002218480A1 - Polishing pad, method of manufacturing the polishing pad, and cushion layer for polishing pad - Google Patents

Polishing pad, method of manufacturing the polishing pad, and cushion layer for polishing pad

Info

Publication number
AU2002218480A1
AU2002218480A1 AU2002218480A AU1848002A AU2002218480A1 AU 2002218480 A1 AU2002218480 A1 AU 2002218480A1 AU 2002218480 A AU2002218480 A AU 2002218480A AU 1848002 A AU1848002 A AU 1848002A AU 2002218480 A1 AU2002218480 A1 AU 2002218480A1
Authority
AU
Australia
Prior art keywords
polishing pad
manufacturing
cushion layer
polishing
pad
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002218480A
Inventor
Shigeru Komai
Masahiko Nakamori
Koichi Ono
Tetsuo Shimomura
Masayuki Tsutsumi
Takatoshi Yamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyobo Co Ltd
Original Assignee
Toyobo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyobo Co Ltd filed Critical Toyobo Co Ltd
Priority claimed from PCT/JP2001/010363 external-priority patent/WO2002043921A1/en
Publication of AU2002218480A1 publication Critical patent/AU2002218480A1/en
Abandoned legal-status Critical Current

Links

AU2002218480A 2000-12-01 2001-11-28 Polishing pad, method of manufacturing the polishing pad, and cushion layer for polishing pad Abandoned AU2002218480A1 (en)

Applications Claiming Priority (24)

Application Number Priority Date Filing Date Title
JP2000367468 2000-12-01
JP2000-367469 2000-12-01
JP2000-367468 2000-12-01
JP2000367469 2000-12-01
JP2001013405 2001-01-22
JP2001-13405 2001-01-22
JP2001-61221 2001-03-06
JP2001061221 2001-03-06
JP2001-103699 2001-04-02
JP2001103699 2001-04-02
JP2001-225568 2001-07-26
JP2001225568 2001-07-26
JP2001234577 2001-08-02
JP2001-234577 2001-08-02
JP2001269928 2001-09-06
JP2001-269928 2001-09-06
JP2001-274011 2001-09-10
JP2001274011 2001-09-10
JP2001302939 2001-09-28
JP2001-302939 2001-09-28
JP2001-302940 2001-09-28
JP2001302940 2001-09-28
JP2001-302941 2001-09-28
PCT/JP2001/010363 WO2002043921A1 (en) 2000-12-01 2001-11-28 Polishing pad, method of manufacturing the polishing pad, and cushion layer for polishing pad

Publications (1)

Publication Number Publication Date
AU2002218480A1 true AU2002218480A1 (en) 2002-06-11

Family

ID=27582325

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002218480A Abandoned AU2002218480A1 (en) 2000-12-01 2001-11-28 Polishing pad, method of manufacturing the polishing pad, and cushion layer for polishing pad

Country Status (1)

Country Link
AU (1) AU2002218480A1 (en)

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