AU2002218309A1 - Substituted 5-aryl and 5-heteroaryl-2-(2-hydroxyphenyl)-2h-benzotriazole derivatives as uv absorbers - Google Patents

Substituted 5-aryl and 5-heteroaryl-2-(2-hydroxyphenyl)-2h-benzotriazole derivatives as uv absorbers

Info

Publication number
AU2002218309A1
AU2002218309A1 AU2002218309A AU1830902A AU2002218309A1 AU 2002218309 A1 AU2002218309 A1 AU 2002218309A1 AU 2002218309 A AU2002218309 A AU 2002218309A AU 1830902 A AU1830902 A AU 1830902A AU 2002218309 A1 AU2002218309 A1 AU 2002218309A1
Authority
AU
Australia
Prior art keywords
substituted
heteroaryl
aryl
hydroxyphenyl
absorbers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002218309A
Inventor
Anthony David Debellis
Robert Edward Detlefsen
Deborah Judd
Andrew B. Naughton
Stephen Daniel Pastor
Ramanathan Ravichandran
Joseph Suhadolnik
Mervin Gale Wood
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Ciba SC Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/722,876 external-priority patent/US6649770B1/en
Priority claimed from US09/722,973 external-priority patent/US6387992B1/en
Application filed by Ciba Spezialitaetenchemie Holding AG, Ciba SC Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of AU2002218309A1 publication Critical patent/AU2002218309A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D401/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
    • C07D401/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
    • C07D401/04—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings directly linked by a ring-member-to-ring-member bond
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
    • C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
    • C07D249/18—Benzotriazoles
    • C07D249/20—Benzotriazoles with aryl radicals directly attached in position 2
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D403/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00
    • C07D403/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings
    • C07D403/04—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings directly linked by a ring-member-to-ring-member bond
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
    • C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
    • C07D405/04—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings directly linked by a ring-member-to-ring-member bond
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
    • C07D409/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
    • C07D409/04—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings directly linked by a ring-member-to-ring-member bond
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
    • C07D409/14—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing three or more hetero rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/815—Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
    • G03C1/8155—Organic compounds therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)

Abstract

Compounds of formula (I) or (II) where R is a heteroaryl moiety, such as 3-pyridyl; or R is an aryl moiety, such as phenyl, naphthyl or biphenylyl, or is phenyl substituted by one or more trifluoromethyl, bromo or cyano; T is a heteroaryl moiety, such as thien-2,5-diyl or is a direct bond, 1,4-phenylene or said phenylenen substituted by one or two alkyl of 1 to 12 carbon atoms, and E1 and E2 are independently hydrogen, alkyl, aralkyl and the like, are prepared by reaction of a benzotriazole substituted on the 5-position of the benzo zing by a halogen atom with a heteroarylboronic acid or ester in the presence of a transition-metal catalyst, such as palladium (II) diacetate. The benzotriarole compounds of formula (I) or (II) are particularly efficacious as stabilizers for automotive coatings and candle wax.
AU2002218309A 2000-11-27 2001-11-20 Substituted 5-aryl and 5-heteroaryl-2-(2-hydroxyphenyl)-2h-benzotriazole derivatives as uv absorbers Abandoned AU2002218309A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US09/722,876 US6649770B1 (en) 2000-11-27 2000-11-27 Substituted 5-aryl-2-(2-hydroxyphenyl)-2H-benzotriazole UV absorbers, compositions stabilized therewith and process for preparation thereof
US09722876 2000-11-27
US09/722,973 US6387992B1 (en) 2000-11-27 2000-11-27 Substituted 5-heteroaryl-2-(2-hydroxyphenyl)-2h-benzotriazole UV absorbers, a process for preparation thereof and compositions stabilized therewith
US09722973 2000-11-27
PCT/EP2001/013440 WO2002042281A1 (en) 2000-11-27 2001-11-20 Substituted 5-aryl and 5-heteroaryl-2-(2-hydroxyphenyl)-2h-benzotriazole derivatives as uv absorbers

Publications (1)

Publication Number Publication Date
AU2002218309A1 true AU2002218309A1 (en) 2002-06-03

Family

ID=27110683

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002218309A Abandoned AU2002218309A1 (en) 2000-11-27 2001-11-20 Substituted 5-aryl and 5-heteroaryl-2-(2-hydroxyphenyl)-2h-benzotriazole derivatives as uv absorbers

Country Status (9)

Country Link
EP (1) EP1337520B1 (en)
JP (1) JP4307071B2 (en)
AT (1) ATE284874T1 (en)
AU (1) AU2002218309A1 (en)
DE (1) DE60107874T2 (en)
ES (1) ES2232683T3 (en)
MX (1) MXPA03004655A (en)
TW (1) TWI290564B (en)
WO (1) WO2002042281A1 (en)

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EP1520450B1 (en) * 2002-06-06 2017-08-02 UDC Ireland Limited Electroluminescent device
WO2004000921A1 (en) * 2002-06-19 2003-12-31 Ciba Specialty Chemicals Holding Inc. Stabilized polyamide compositions
JP2004347617A (en) * 2003-04-11 2004-12-09 Clariant Internatl Ltd Adhesion improving agent for substrate for photosensitive resin composition and photosensitive resin composition containing same
AR049631A1 (en) 2004-04-27 2006-08-23 Wyeth Corp COUPLING PROCESS FOR THE GENERATION OF PIRROL REACTIVE DERIVATIVES -2- CARBONITRILE N- REPLACED WITH BORO CONTENT TO PRODUCE BIARILOS
MXPA06012402A (en) 2004-04-27 2007-01-17 Wyeth Corp Cyanopyrrole containing cyclic carbamate and thiocarbamate biaryls and methods for preparing the same.
TWI439740B (en) * 2006-11-17 2014-06-01 Dainippon Printing Co Ltd Optical film, polarizing plate and image display device
JP5444601B2 (en) * 2006-11-17 2014-03-19 大日本印刷株式会社 Polarizing plate, image display device, and manufacturing method of polarizing plate
WO2008059983A1 (en) * 2006-11-17 2008-05-22 Dai Nippon Printing Co., Ltd. Optical film, polarizing plate and image display device
JP5444602B2 (en) * 2007-10-04 2014-03-19 大日本印刷株式会社 Polarizing plate, image display device, and manufacturing method of polarizing plate
EP2113536B1 (en) 2007-02-20 2012-07-04 FUJIFILM Corporation Use of polymer material containing ultraviolet absorbent
US20100130638A1 (en) 2007-03-30 2010-05-27 Fujifilm Corporation Ultraviolet absorbent composition
US8039532B2 (en) 2007-08-16 2011-10-18 Fujifilm Corporation Heterocyclic compound, ultraviolet absorbent and composition containing the same
JP5244437B2 (en) 2008-03-31 2013-07-24 富士フイルム株式会社 UV absorber composition
JP5250289B2 (en) 2008-03-31 2013-07-31 富士フイルム株式会社 UV absorber composition
JP2009270062A (en) 2008-05-09 2009-11-19 Fujifilm Corp Ultraviolet absorbent composition
GB0821913D0 (en) 2008-12-02 2009-01-07 Price & Co Antibacterial compounds
JP5979873B2 (en) * 2009-03-18 2016-08-31 保土谷化学工業株式会社 Compound having benzotriazole ring structure and organic electroluminescence device
GB2480813A (en) * 2010-06-01 2011-12-07 Summit Corp Plc Compounds for the treatment of clostridium difficile-associated disease
AU2011260097B2 (en) 2010-06-01 2015-01-22 Summit (Oxford) Limited Compounds for the treatment of clostridium difficile associated disease
KR101882044B1 (en) * 2011-04-01 2018-07-25 쓰리엠 이노베이티브 프로퍼티즈 캄파니 Films including triazine-based ultraviolet absorbers
CN104557803A (en) * 2014-12-31 2015-04-29 宏业生化股份有限公司 Stabilizer prolonging furfuryl alcohol storing time and application of stabilizer
WO2017007673A1 (en) * 2015-07-07 2017-01-12 3M Innovative Properties Company Polymeric matrices with ionic additives
US10752720B2 (en) 2017-06-26 2020-08-25 Johnson & Johnson Vision Care, Inc. Polymerizable blockers of high energy light
US10723732B2 (en) 2017-06-30 2020-07-28 Johnson & Johnson Vision Care, Inc. Hydroxyphenyl phenanthrolines as polymerizable blockers of high energy light
US10526296B2 (en) 2017-06-30 2020-01-07 Johnson & Johnson Vision Care, Inc. Hydroxyphenyl naphthotriazoles as polymerizable blockers of high energy light
CN111051473B (en) * 2017-10-02 2023-08-01 捷恩智株式会社 Liquid crystal composition and liquid crystal display element
US10935695B2 (en) 2018-03-02 2021-03-02 Johnson & Johnson Vision Care, Inc. Polymerizable absorbers of UV and high energy visible light
US10889901B2 (en) 2018-07-25 2021-01-12 International Business Machines Corporation Ultraviolet-stabilized corrosion inhibitors
CN109705728B (en) * 2019-03-01 2021-03-02 拓米(成都)应用技术研究院有限公司 Anti-ultraviolet film for QD-LCD surface and preparation method thereof
US11958824B2 (en) 2019-06-28 2024-04-16 Johnson & Johnson Vision Care, Inc. Photostable mimics of macular pigment
US11543683B2 (en) 2019-08-30 2023-01-03 Johnson & Johnson Vision Care, Inc. Multifocal contact lens displaying improved vision attributes
CN110950804A (en) * 2019-11-29 2020-04-03 广东省石油与精细化工研究院 2- (2-alkoxy phenyl) -4, 5-diphenyl imidazole compound and synthesis method and application thereof
CN112898633B (en) * 2021-01-26 2022-08-16 双键化工（泰兴）有限公司 Preparation method of additive for monomer copolymerization of plastic material

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL279767A (en) * 1961-06-16
FR2483637A1 (en) * 1980-05-30 1981-12-04 Asahi Chemical Ind DRY IMAGE TRAINING MATERIAL
EP0363318B1 (en) * 1988-09-28 1994-03-02 Ciba-Geigy Ag Process for the preparation of benzotriazole derivatives
FR2755444B1 (en) * 1996-11-07 2004-10-08 Ciba Sc Holding Ag COATING COMPOSITION COMPRISING A STABILIZING COMPOUND THEREOF AND USE THEREOF

Also Published As

Publication number Publication date
WO2002042281A1 (en) 2002-05-30
EP1337520A1 (en) 2003-08-27
EP1337520B1 (en) 2004-12-15
ATE284874T1 (en) 2005-01-15
JP4307071B2 (en) 2009-08-05
DE60107874D1 (en) 2005-01-20
DE60107874T2 (en) 2005-05-19
ES2232683T3 (en) 2005-06-01
JP2004520284A (en) 2004-07-08
MXPA03004655A (en) 2003-09-04
TWI290564B (en) 2007-12-01

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