AU2002211892A1 - Deep grayscale etching of silicon - Google Patents

Deep grayscale etching of silicon

Info

Publication number
AU2002211892A1
AU2002211892A1 AU2002211892A AU1189202A AU2002211892A1 AU 2002211892 A1 AU2002211892 A1 AU 2002211892A1 AU 2002211892 A AU2002211892 A AU 2002211892A AU 1189202 A AU1189202 A AU 1189202A AU 2002211892 A1 AU2002211892 A1 AU 2002211892A1
Authority
AU
Australia
Prior art keywords
deep
silicon
grayscale
etching
grayscale etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002211892A
Inventor
Gregg T. Borek
David Renick Brown
Rodney L. Clark
Peter Scott Erbach
Russell Jay Shaw
Michael Ray Whitley
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mems Optical Inc
Original Assignee
Mems Optical Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mems Optical Inc filed Critical Mems Optical Inc
Publication of AU2002211892A1 publication Critical patent/AU2002211892A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12166—Manufacturing methods
    • G02B2006/12173—Masking
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12166—Manufacturing methods
    • G02B2006/12176—Etching

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Drying Of Semiconductors (AREA)
  • Micromachines (AREA)
AU2002211892A 2000-10-10 2001-10-10 Deep grayscale etching of silicon Abandoned AU2002211892A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US23843700P 2000-10-10 2000-10-10
US60238437 2000-10-10
PCT/US2001/042629 WO2002031600A1 (en) 2000-10-10 2001-10-10 Deep grayscale etching of silicon

Publications (1)

Publication Number Publication Date
AU2002211892A1 true AU2002211892A1 (en) 2002-04-22

Family

ID=22897891

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002211892A Abandoned AU2002211892A1 (en) 2000-10-10 2001-10-10 Deep grayscale etching of silicon

Country Status (2)

Country Link
AU (1) AU2002211892A1 (en)
WO (1) WO2002031600A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5127181B2 (en) * 2005-08-10 2013-01-23 株式会社半導体エネルギー研究所 Method for manufacturing micro electromechanical device
US8932894B2 (en) * 2007-10-09 2015-01-13 The United States of America, as represented by the Secratary of the Navy Methods and systems of curved radiation detector fabrication
US8071275B2 (en) 2008-04-10 2011-12-06 Lexmark International, Inc. Methods for planarizing unevenness on surface of wafer photoresist layer and wafers produced by the methods
CN110600376B (en) * 2019-09-20 2022-04-08 上海华力微电子有限公司 Polymer removal process
CN112731774A (en) * 2020-12-31 2021-04-30 嘉兴驭光光电科技有限公司 Method for manufacturing micro-nano optical device

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5310623A (en) * 1992-11-27 1994-05-10 Lockheed Missiles & Space Company, Inc. Method for fabricating microlenses
DE4241045C1 (en) * 1992-12-05 1994-05-26 Bosch Gmbh Robert Process for anisotropic etching of silicon
US6027595A (en) * 1998-07-02 2000-02-22 Samsung Electronics Co., Ltd. Method of making optical replicas by stamping in photoresist and replicas formed thereby

Also Published As

Publication number Publication date
WO2002031600A1 (en) 2002-04-18

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