AU2001296006A1 - Composite structure and method and apparatus for manufacture thereof - Google Patents

Composite structure and method and apparatus for manufacture thereof

Info

Publication number
AU2001296006A1
AU2001296006A1 AU2001296006A AU9600601A AU2001296006A1 AU 2001296006 A1 AU2001296006 A1 AU 2001296006A1 AU 2001296006 A AU2001296006 A AU 2001296006A AU 9600601 A AU9600601 A AU 9600601A AU 2001296006 A1 AU2001296006 A1 AU 2001296006A1
Authority
AU
Australia
Prior art keywords
manufacture
composite structure
composite
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001296006A
Inventor
Hironori Hatono
Tomokazu Ito
Masakatsu Kiyohara
Katsuhiko Mori
Tatsuro Yokoyama
Atsushi Yoshida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toto Ltd
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Toto Ltd
National Institute of Advanced Industrial Science and Technology AIST
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toto Ltd, National Institute of Advanced Industrial Science and Technology AIST filed Critical Toto Ltd
Publication of AU2001296006A1 publication Critical patent/AU2001296006A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/02—Coating starting from inorganic powder by application of pressure only
    • C23C24/04—Impact or kinetic deposition of particles
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/249921—Web or sheet containing structurally defined element or component
    • Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
    • Y10T428/249967—Inorganic matrix in void-containing component
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less
AU2001296006A 2000-10-23 2001-10-23 Composite structure and method and apparatus for manufacture thereof Abandoned AU2001296006A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000-322843 2000-10-23
JP2000322843 2000-10-23
PCT/JP2001/009305 WO2002034966A1 (en) 2000-10-23 2001-10-23 Composite structure and method and apparatus for manufacture thereof

Publications (1)

Publication Number Publication Date
AU2001296006A1 true AU2001296006A1 (en) 2002-05-06

Family

ID=18800643

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001296006A Abandoned AU2001296006A1 (en) 2000-10-23 2001-10-23 Composite structure and method and apparatus for manufacture thereof

Country Status (5)

Country Link
US (5) US7255934B2 (en)
JP (1) JP3554735B2 (en)
CN (1) CN1225570C (en)
AU (1) AU2001296006A1 (en)
WO (1) WO2002034966A1 (en)

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US7067965B2 (en) * 2002-09-18 2006-06-27 Tdk Corporation Piezoelectric porcelain composition, piezoelectric device, and methods of making thereof
JP4139891B2 (en) * 2003-03-20 2008-08-27 独立行政法人産業技術総合研究所 Method for manufacturing RF module
US7579251B2 (en) 2003-05-15 2009-08-25 Fujitsu Limited Aerosol deposition process
US7226510B2 (en) * 2003-10-27 2007-06-05 Fujifilm Corporation Film forming apparatus
JP2005147941A (en) * 2003-11-18 2005-06-09 Seiko Epson Corp Manufacturing method for machine part, machine part and clock equipped with the same
JP2005274260A (en) * 2004-03-24 2005-10-06 Fuji Photo Film Co Ltd Method for manufacturing photoconductive layer constituting radiation imaging panel
EP1583163B1 (en) * 2004-03-30 2012-02-15 Brother Kogyo Kabushiki Kaisha Method for manufacturing film or piezoelectric film
JP2005344171A (en) * 2004-06-03 2005-12-15 Fuji Photo Film Co Ltd Raw material powder for film deposition, and film deposition method using the same
JP2006097087A (en) * 2004-09-29 2006-04-13 Fuji Photo Film Co Ltd Film deposition method and film deposition apparatus
JP2006179856A (en) * 2004-11-25 2006-07-06 Fuji Electric Holdings Co Ltd Insulating substrate and semiconductor device
DE102004059716B3 (en) * 2004-12-08 2006-04-06 Siemens Ag Cold gas spraying method uses particles which are chemical components of high temperature superconductors and are sprayed on to substrate with crystal structure corresponding to that of superconductors
JP4949668B2 (en) * 2004-12-09 2012-06-13 富士フイルム株式会社 Manufacturing method of ceramic film and structure including ceramic film
JP4664054B2 (en) * 2004-12-09 2011-04-06 富士フイルム株式会社 Deposition equipment
US8268408B2 (en) * 2005-09-30 2012-09-18 Fujifilm Corporation Method of manufacturing composite structure, impurity removal processing apparatus, film forming apparatus, composite structure and raw material powder
US20070156249A1 (en) * 2006-01-05 2007-07-05 Howmedica Osteonics Corp. High velocity spray technique for medical implant components
US20070158446A1 (en) * 2006-01-05 2007-07-12 Howmedica Osteonics Corp. Method for fabricating a medical implant component and such component
US8187660B2 (en) * 2006-01-05 2012-05-29 Howmedica Osteonics Corp. Method for fabricating a medical implant component and such component
JP4930120B2 (en) * 2006-03-28 2012-05-16 ブラザー工業株式会社 Film forming apparatus and film forming method
US7878143B2 (en) * 2006-03-28 2011-02-01 Brother Kogyo Kabushiki Kaisha Film-forming apparatus, film-forming method and particle-supplying apparatus
US8020508B2 (en) * 2006-09-19 2011-09-20 The Board Of Regents Of The University Of Oklahoma Methods and apparatus for depositing nanoparticles on a substrate
US7615385B2 (en) 2006-09-20 2009-11-10 Hypres, Inc Double-masking technique for increasing fabrication yield in superconducting electronics
US7479464B2 (en) * 2006-10-23 2009-01-20 Applied Materials, Inc. Low temperature aerosol deposition of a plasma resistive layer
US8114473B2 (en) * 2007-04-27 2012-02-14 Toto Ltd. Composite structure and production method thereof
JP4626829B2 (en) * 2007-11-15 2011-02-09 Ｔｏｔｏ株式会社 Method for producing porous composite structure and porous fine particles used for the production
JP5304333B2 (en) * 2008-03-10 2013-10-02 Ｔｏｔｏ株式会社 Composite structure forming method and prepared particles
DE102008024504A1 (en) * 2008-05-21 2009-11-26 Linde Ag Method and apparatus for cold gas spraying
US8163335B2 (en) * 2008-05-23 2012-04-24 Toto Ltd. Particle cluster, composite structure formation method, and formation system
US8349398B2 (en) * 2008-06-02 2013-01-08 Samsung Electro-Mechanics Co., Ltd. Normal pressure aerosol spray apparatus and method of forming a film using the same
JP4510116B2 (en) * 2008-06-20 2010-07-21 富士通株式会社 Capacitor manufacturing method, structure, and capacitor
ES2537069T3 (en) * 2008-07-03 2015-06-02 University Of Virginia Patent Foundation Dosing unit of Apadenosón
US8329071B2 (en) * 2008-12-08 2012-12-11 Hestia Tec, Llc Multicomponent nanoparticle materials and process and apparatus therefor
KR101097173B1 (en) 2009-09-04 2011-12-22 신한다이아몬드공업 주식회사 Cutting/Polishing Tool And Manufacturing Method Thereof
EP2333133B1 (en) 2009-11-23 2013-03-06 Linde Aktiengesellschaft Method for manufacturing a multilayer coil
DE102009053987A1 (en) 2009-11-23 2011-06-01 Linde Aktiengesellschaft Method and device for producing a multilayer coil
US8679246B2 (en) 2010-01-21 2014-03-25 The University Of Connecticut Preparation of amorphous mixed metal oxides and their use as feedstocks in thermal spray coating
US8563448B2 (en) 2010-01-29 2013-10-22 Eaton Corporation Friction member and friction material thereof
JP5429019B2 (en) 2010-04-16 2014-02-26 富士通株式会社 Capacitor and manufacturing method thereof
US8461064B2 (en) 2010-07-29 2013-06-11 Eaton Corporation Friction member and friction material thereof
WO2012056808A1 (en) 2010-10-25 2012-05-03 日本碍子株式会社 Ceramic material, member for semiconductor manufacturing device, sputtering target member, and manufacturing method for ceramic material
WO2012056807A1 (en) 2010-10-25 2012-05-03 日本碍子株式会社 Ceramic material, laminated body, member for semiconductor manufacturing device, and sputtering target member
WO2012108704A2 (en) * 2011-02-10 2012-08-16 고려대학교 산학협력단 Apparatus for manufacturing an inorganic thin-film solar cell, and method for controlling same
US9815072B2 (en) * 2011-10-12 2017-11-14 1366 Technologies Inc. Apparatus for depositing a thin layer of polymer resist on a substrate
US9675640B2 (en) 2012-08-07 2017-06-13 Southwest Research Institute Magnetic calcium phosphate nanoparticles, applications and methods of preparation thereof
JP6134106B2 (en) * 2012-08-20 2017-05-24 積水化学工業株式会社 Method for producing porous membrane
US9708713B2 (en) 2013-05-24 2017-07-18 Applied Materials, Inc. Aerosol deposition coating for semiconductor chamber components
US9566216B2 (en) 2013-11-18 2017-02-14 Southwest Research Institute Bone cements containing magnetic calcium phosphate nanoparticles
CN108495719A (en) * 2016-02-26 2018-09-04 倍耐克有限公司 Improved aerosol apparatus for coating and method
KR101957571B1 (en) 2017-04-14 2019-07-05 인하대학교 산학협력단 Ferroelectric-antiferroelectric ceramic composite manufacturing method
WO2019022096A1 (en) * 2017-07-26 2019-01-31 国立研究開発法人産業技術総合研究所 Structure, laminated body thereof, and manufacturing method and manufacturing device thereof
KR102649715B1 (en) * 2020-10-30 2024-03-21 세메스 주식회사 Surface treatment apparatus and surface treatment method
CN112718289B (en) * 2020-12-15 2022-04-15 中国人民解放军空军工程大学 Laser-assisted vacuum electric-sweeping supersonic deposition spray gun
CN113289789A (en) * 2021-04-13 2021-08-24 广东丰展涂装科技有限公司 High-insulativity automatic heat supply paint equipment

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US5494520A (en) * 1994-10-07 1996-02-27 Xerox Corporation Apparatus for coating jet milled particulates onto a substrate by use of a rotatable applicator
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Also Published As

Publication number Publication date
US20060099336A1 (en) 2006-05-11
US20080096007A1 (en) 2008-04-24
US7318967B2 (en) 2008-01-15
WO2002034966A1 (en) 2002-05-02
CN1225570C (en) 2005-11-02
US20040026030A1 (en) 2004-02-12
US7632353B2 (en) 2009-12-15
US7255934B2 (en) 2007-08-14
US20060102074A1 (en) 2006-05-18
US20070122610A1 (en) 2007-05-31
CN1481450A (en) 2004-03-10
JPWO2002034966A1 (en) 2004-03-04
JP3554735B2 (en) 2004-08-18

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