AU2001259509A1 - Polymers for photoresist compositions for microlithography - Google Patents
Polymers for photoresist compositions for microlithographyInfo
- Publication number
- AU2001259509A1 AU2001259509A1 AU2001259509A AU5950901A AU2001259509A1 AU 2001259509 A1 AU2001259509 A1 AU 2001259509A1 AU 2001259509 A AU2001259509 A AU 2001259509A AU 5950901 A AU5950901 A AU 5950901A AU 2001259509 A1 AU2001259509 A1 AU 2001259509A1
- Authority
- AU
- Australia
- Prior art keywords
- microlithography
- polymers
- photoresist compositions
- photoresist
- compositions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US20196100P | 2000-05-05 | 2000-05-05 | |
US60201961 | 2000-05-05 | ||
PCT/US2001/014520 WO2001086352A2 (en) | 2000-05-05 | 2001-05-04 | Polymers for photoresist compositions for microlithography |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2001259509A1 true AU2001259509A1 (en) | 2001-11-20 |
Family
ID=22748003
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001259509A Abandoned AU2001259509A1 (en) | 2000-05-05 | 2001-05-04 | Polymers for photoresist compositions for microlithography |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1279069A2 (en) |
JP (1) | JP2003532932A (en) |
AU (1) | AU2001259509A1 (en) |
WO (1) | WO2001086352A2 (en) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003186198A (en) * | 2001-12-19 | 2003-07-03 | Sony Corp | Resist material and exposure method |
JP2003186197A (en) * | 2001-12-19 | 2003-07-03 | Sony Corp | Resist material and exposure method |
TWI307819B (en) | 2002-05-28 | 2009-03-21 | Arch Spec Chem Inc | Acetal protected polymers and photoresist compositions thereof |
US7297811B2 (en) | 2003-12-04 | 2007-11-20 | International Business Machines Corporation | Precursors to fluoroalkanol-containing olefin monomers and associated methods of synthesis and use |
US7820369B2 (en) | 2003-12-04 | 2010-10-26 | International Business Machines Corporation | Method for patterning a low activation energy photoresist |
US7495135B2 (en) | 2003-12-04 | 2009-02-24 | International Business Machines Corporation | Precursors to fluoroalkanol-containing olefin monomers, and associated methods of synthesis and use |
US7193023B2 (en) | 2003-12-04 | 2007-03-20 | International Business Machines Corporation | Low activation energy photoresists |
JP5472217B2 (en) * | 2011-06-29 | 2014-04-16 | 信越化学工業株式会社 | Method for producing photoacid generator using 2,2-bis (fluoroalkyl) oxirane |
US8968990B2 (en) * | 2011-09-15 | 2015-03-03 | Tokyo Ohka Kogyo Co., Ltd. | Method of forming resist pattern |
US9943027B2 (en) | 2013-03-14 | 2018-04-17 | Precision Planting Llc | Systems, methods, and apparatus for agricultural implement trench depth control and soil monitoring |
BR122020026139B1 (en) | 2017-10-02 | 2023-11-14 | Precision Planting Llc | SOIL APPARATUS FOR FIRMING A SEED IN A DITCH |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IL141803A0 (en) * | 1998-09-23 | 2002-03-10 | Du Pont | Photoresists, polymers and processes for microlithography |
CN1251022C (en) * | 1998-10-27 | 2006-04-12 | 纳幕尔杜邦公司 | Photoresists and associated processes for microlitho graphy |
EP1240554A2 (en) * | 1999-11-17 | 2002-09-18 | E.I. Du Pont De Nemours And Company | Nitrile/fluoroalcohol polymer-containing photoresists and associated processes for microlithography |
-
2001
- 2001-05-04 WO PCT/US2001/014520 patent/WO2001086352A2/en not_active Application Discontinuation
- 2001-05-04 AU AU2001259509A patent/AU2001259509A1/en not_active Abandoned
- 2001-05-04 JP JP2001583241A patent/JP2003532932A/en active Pending
- 2001-05-04 EP EP01933046A patent/EP1279069A2/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
EP1279069A2 (en) | 2003-01-29 |
WO2001086352A2 (en) | 2001-11-15 |
WO2001086352A3 (en) | 2002-03-28 |
JP2003532932A (en) | 2003-11-05 |
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