AU2001250694A1 - System and method for deposition of coatings on a substrate - Google Patents

System and method for deposition of coatings on a substrate

Info

Publication number
AU2001250694A1
AU2001250694A1 AU2001250694A AU5069401A AU2001250694A1 AU 2001250694 A1 AU2001250694 A1 AU 2001250694A1 AU 2001250694 A AU2001250694 A AU 2001250694A AU 5069401 A AU5069401 A AU 5069401A AU 2001250694 A1 AU2001250694 A1 AU 2001250694A1
Authority
AU
Australia
Prior art keywords
coatings
deposition
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001250694A
Inventor
Valery Mikhailovich Bashkov
Valery Diamant
Alexandr Igorevich Dodonov
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
VIP-Vacuum Ion Plasma Technologies Ltd
Original Assignee
V I P VACUUM ION PLASMA TECHNO
VIP-Vacuum Ion Plasma Technologies Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by V I P VACUUM ION PLASMA TECHNO, VIP-Vacuum Ion Plasma Technologies Ltd filed Critical V I P VACUUM ION PLASMA TECHNO
Publication of AU2001250694A1 publication Critical patent/AU2001250694A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3178—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for applying thin layers on objects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32412—Plasma immersion ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H01J2237/3142—Ion plating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
AU2001250694A 2000-01-27 2001-01-25 System and method for deposition of coatings on a substrate Abandoned AU2001250694A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
IL134255 2000-01-27
IL13425500A IL134255A0 (en) 2000-01-27 2000-01-27 System and method for deposition of coatings on a substrate
PCT/RU2001/000027 WO2001055475A2 (en) 2000-01-27 2001-01-25 System and method for deposition of coatings on a substrate

Publications (1)

Publication Number Publication Date
AU2001250694A1 true AU2001250694A1 (en) 2001-08-07

Family

ID=11073755

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001250694A Abandoned AU2001250694A1 (en) 2000-01-27 2001-01-25 System and method for deposition of coatings on a substrate

Country Status (5)

Country Link
US (1) US20030077401A1 (en)
EP (1) EP1254277A2 (en)
AU (1) AU2001250694A1 (en)
IL (1) IL134255A0 (en)
WO (1) WO2001055475A2 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AUPR179500A0 (en) 2000-11-30 2000-12-21 Saintech Pty Limited Ion source
EP1411002B1 (en) * 2002-03-14 2008-12-10 Daviplast - Servicos de Consultoria, Sociedade Unipessoal LDA. Method for metallization of a plastic tank and method for metallization of a plastic pallet
GB2437080B (en) * 2006-04-11 2011-10-12 Hauzer Techno Coating Bv A vacuum treatment apparatus, a bias power supply and a method of operating a vacuum treatment apparatus
KR101312752B1 (en) * 2011-09-30 2013-09-27 신크론 컴퍼니 리미티드 Method for depositing film and film deposition system
JP6063816B2 (en) * 2013-05-27 2017-01-18 株式会社デンソー Surface treatment apparatus and surface treatment method
CN103331505B (en) * 2013-07-12 2015-05-27 宣浩 Electric spark bead welding circuit

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5872655A (en) * 1991-07-10 1999-02-16 Optical Coating Laboratory, Inc. Monolithic linear variable filter and method of manufacture
US5346600A (en) * 1992-08-14 1994-09-13 Hughes Aircraft Company Plasma-enhanced magnetron-sputtered deposition of materials
DE19526387C2 (en) * 1994-07-19 1998-12-10 Sumitomo Metal Mining Co Double-coated composite steel article and method for its production
JP3060876B2 (en) * 1995-02-15 2000-07-10 日新電機株式会社 Metal ion implanter
US5837331A (en) * 1996-03-13 1998-11-17 Motorola, Inc. Amorphous multi-layered structure and method of making the same
DE19725930C2 (en) * 1997-06-16 2002-07-18 Eberhard Moll Gmbh Dr Process and system for treating substrates using ions from a low-voltage arc discharge
JPH11273894A (en) * 1998-03-23 1999-10-08 Jeol Ltd Thin film forming device

Also Published As

Publication number Publication date
IL134255A0 (en) 2001-04-30
WO2001055475A2 (en) 2001-08-02
US20030077401A1 (en) 2003-04-24
WO2001055475A3 (en) 2002-02-28
EP1254277A2 (en) 2002-11-06

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