AU2001249804A1 - Selective deposition of material on a substrate according to an interference pattern - Google Patents

Selective deposition of material on a substrate according to an interference pattern

Info

Publication number
AU2001249804A1
AU2001249804A1 AU2001249804A AU4980401A AU2001249804A1 AU 2001249804 A1 AU2001249804 A1 AU 2001249804A1 AU 2001249804 A AU2001249804 A AU 2001249804A AU 4980401 A AU4980401 A AU 4980401A AU 2001249804 A1 AU2001249804 A1 AU 2001249804A1
Authority
AU
Australia
Prior art keywords
interference pattern
substrate
substrate according
selective deposition
preferentially
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001249804A
Inventor
Todd A. Ballen
Robert S Moshrefzadeh
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/542,256 external-priority patent/US6391528B1/en
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of AU2001249804A1 publication Critical patent/AU2001249804A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles

Abstract

A method of preferentially depositing material on a substrate is disclosed. Material can be preferentially deposited by directing an electromagnetic interference pattern on to a substrate to selectively heat areas of the substrate coincident with the interference pattern maxima. The substrate can then be exposed to gas phase material that is capable of preferentially accumulating on surfaces based on surface temperature.
AU2001249804A 2000-04-03 2001-04-02 Selective deposition of material on a substrate according to an interference pattern Abandoned AU2001249804A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US09/542,256 US6391528B1 (en) 2000-04-03 2000-04-03 Methods of making wire grid optical elements by preferential deposition of material on a substrate
US09542256 2000-04-03
US09820299 2001-03-28
US09/820,299 US20010028925A1 (en) 2000-04-03 2001-03-28 Selective deposition of material on a substrate according to an interference pattern
PCT/US2001/010732 WO2001075491A1 (en) 2000-04-03 2001-04-02 Selective deposition of material on a substrate according to an interference pattern

Publications (1)

Publication Number Publication Date
AU2001249804A1 true AU2001249804A1 (en) 2001-10-15

Family

ID=27066973

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001249804A Abandoned AU2001249804A1 (en) 2000-04-03 2001-04-02 Selective deposition of material on a substrate according to an interference pattern

Country Status (8)

Country Link
EP (1) EP1269225B1 (en)
JP (1) JP2003529680A (en)
CN (1) CN1241036C (en)
AT (1) ATE337568T1 (en)
AU (1) AU2001249804A1 (en)
DE (1) DE60122482T2 (en)
ES (1) ES2270997T3 (en)
WO (1) WO2001075491A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7001529B2 (en) * 2002-10-18 2006-02-21 Lam Research Corporation Pre-endpoint techniques in photoresist etching
US7368744B2 (en) * 2006-02-17 2008-05-06 Asml Netherlands B.V. Photon sieve for optical systems in micro-lithography
EP2137771B1 (en) * 2007-04-26 2017-01-04 HyET Energy Systems B.V. Photovoltaic module comprising layer with conducting spots
CN105453231B (en) * 2013-08-08 2019-06-11 应用材料公司 For using the photon activation for exhausting the reactant that light beam forms sub-micron features structure
CN105695951B (en) * 2016-04-20 2018-10-02 肖志凯 A kind of device and its application suitable for local growth film and coating
CN106947954B (en) * 2017-04-27 2019-06-18 京东方科技集团股份有限公司 A kind of preparation method of vapor deposition apparatus and film

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4289381A (en) * 1979-07-02 1981-09-15 Hughes Aircraft Company High selectivity thin film polarizer
FR2542327B1 (en) * 1983-03-07 1986-03-07 Bensoussan Marcel
US4746934A (en) * 1986-07-07 1988-05-24 Tektronix, Inc. Color image copying system using a cathode-ray tube with diffraction grating face plate
JPH0720766A (en) * 1993-06-29 1995-01-24 Canon Inc Production of hologram and display device
JP3704843B2 (en) * 1995-10-24 2005-10-12 凸版印刷株式会社 Non-contact non-destructive material evaluation method and apparatus, elastic wave excitation method and elastic wave excitation apparatus
JP3624561B2 (en) * 1996-03-12 2005-03-02 旭硝子株式会社 Optical modulation element and optical head device
GB2329484A (en) * 1997-09-22 1999-03-24 Northern Telecom Ltd Writing Bragg reflection gratings in optical waveguides

Also Published As

Publication number Publication date
DE60122482D1 (en) 2006-10-05
CN1422388A (en) 2003-06-04
DE60122482T2 (en) 2007-05-24
WO2001075491A1 (en) 2001-10-11
JP2003529680A (en) 2003-10-07
CN1241036C (en) 2006-02-08
EP1269225A1 (en) 2003-01-02
ATE337568T1 (en) 2006-09-15
EP1269225B1 (en) 2006-08-23
ES2270997T3 (en) 2007-04-16

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