AU2001232256A1 - Position measuring apparatus and aligner - Google Patents

Position measuring apparatus and aligner

Info

Publication number
AU2001232256A1
AU2001232256A1 AU2001232256A AU3225601A AU2001232256A1 AU 2001232256 A1 AU2001232256 A1 AU 2001232256A1 AU 2001232256 A AU2001232256 A AU 2001232256A AU 3225601 A AU3225601 A AU 3225601A AU 2001232256 A1 AU2001232256 A1 AU 2001232256A1
Authority
AU
Australia
Prior art keywords
aligner
measuring apparatus
position measuring
measuring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001232256A
Other languages
English (en)
Inventor
Akira Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2001232256A1 publication Critical patent/AU2001232256A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7092—Signal processing

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Signal Processing (AREA)
  • Multimedia (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AU2001232256A 2000-03-02 2001-02-09 Position measuring apparatus and aligner Abandoned AU2001232256A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000-57827 2000-03-02
JP2000057827 2000-03-02
PCT/JP2001/000910 WO2001065591A1 (fr) 2000-03-02 2001-02-09 Appareil de mesure de position et dispositif d'alignement

Publications (1)

Publication Number Publication Date
AU2001232256A1 true AU2001232256A1 (en) 2001-09-12

Family

ID=18578524

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001232256A Abandoned AU2001232256A1 (en) 2000-03-02 2001-02-09 Position measuring apparatus and aligner

Country Status (5)

Country Link
US (1) US6744512B2 (ko)
KR (1) KR20020077515A (ko)
AU (1) AU2001232256A1 (ko)
TW (1) TW552623B (ko)
WO (1) WO2001065591A1 (ko)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6992756B1 (en) * 2002-10-21 2006-01-31 Og Technologies, Inc. Apparatus and method for movement measurement and position tracking of long, non-textured metal objects at an elevated temperature
US7265881B2 (en) * 2002-12-20 2007-09-04 Hewlett-Packard Development Company, L.P. Method and apparatus for measuring assembly and alignment errors in sensor assemblies
JP4174356B2 (ja) * 2003-03-10 2008-10-29 キヤノン株式会社 露光方法
DE10315086B4 (de) * 2003-04-02 2006-08-24 Infineon Technologies Ag Verfahren und Vorrichtung zum Ausrichten von Halbleiterwafern bei der Halbleiterherstellung
US7728953B2 (en) * 2004-03-01 2010-06-01 Nikon Corporation Exposure method, exposure system, and substrate processing apparatus
JP4760705B2 (ja) * 2004-03-01 2011-08-31 株式会社ニコン 事前計測処理方法、露光システム及び基板処理装置
JP4721651B2 (ja) * 2004-04-14 2011-07-13 株式会社 日立ディスプレイズ 表示装置
US7414722B2 (en) * 2005-08-16 2008-08-19 Asml Netherlands B.V. Alignment measurement arrangement and alignment measurement method
JP5041582B2 (ja) * 2006-12-05 2012-10-03 キヤノン株式会社 露光装置、計測条件を選定するための方法及びデバイス製造方法
KR20100107019A (ko) * 2008-03-31 2010-10-04 후지쯔 가부시끼가이샤 면형체의 얼라이먼트 장치, 제조 장치, 면형체의 얼라이먼트 방법 및 제조 방법
JP5692991B2 (ja) * 2009-11-10 2015-04-01 キヤノン株式会社 露光装置、及びそれを用いたデバイスの製造方法
US8088633B2 (en) * 2009-12-02 2012-01-03 Ultratech, Inc. Optical alignment methods for forming LEDs having a rough surface
KR101914101B1 (ko) * 2011-06-28 2018-11-02 삼성전자 주식회사 척의 제어 장치 및 방법, 노광 장치 및 그 제어 방법
DE102013211403B4 (de) * 2013-06-18 2020-12-17 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zum automatisierten Bestimmen eines Referenzpunktes einer Ausrichtungsmarkierung auf einem Substrat einer photolithographischen Maske
WO2016185298A1 (en) * 2015-05-19 2016-11-24 Ismeca Semiconductor Holding Sa Component handling assembly and method of adjusting a component handling assembly

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4679942A (en) * 1984-02-24 1987-07-14 Nippon Kogaku K. K. Method of aligning a semiconductor substrate and a photomask
JPH0612249B2 (ja) * 1985-05-27 1994-02-16 株式会社ニコン パタ−ン検査装置
JPH07120621B2 (ja) * 1989-05-08 1995-12-20 キヤノン株式会社 位置合せ方法
US5473410A (en) * 1990-11-28 1995-12-05 Nikon Corporation Projection exposure apparatus
US6141107A (en) * 1991-02-28 2000-10-31 Nikon Corporation Apparatus for detecting a position of an optical mark
US6198527B1 (en) * 1992-09-14 2001-03-06 Nikon Corporation Projection exposure apparatus and exposure method
US5464715A (en) * 1993-04-02 1995-11-07 Nikon Corporation Method of driving mask stage and method of mask alignment
US5721605A (en) * 1994-03-29 1998-02-24 Nikon Corporation Alignment device and method with focus detection system
JPH10106937A (ja) * 1996-09-26 1998-04-24 Nikon Corp 位置検出方法及びその装置並びに投影露光装置
JPH10260010A (ja) * 1997-03-19 1998-09-29 Nikon Corp マーク計測方法及び装置
WO1999056308A1 (fr) * 1998-04-28 1999-11-04 Nikon Corporation Systeme d'exposition et procede de production d'un microdispositif
JP2000028321A (ja) * 1998-07-13 2000-01-28 Nikon Corp 位置検出装置及びこれを用いた露光装置並びに位置検出方法
JP2000164845A (ja) * 1998-11-26 2000-06-16 Nikon Corp 固体撮像装置およびそれを備えた位置合わせ装置
JP3003694B2 (ja) 1998-12-07 2000-01-31 株式会社ニコン 投影露光装置

Also Published As

Publication number Publication date
KR20020077515A (ko) 2002-10-11
WO2001065591A1 (fr) 2001-09-07
US6744512B2 (en) 2004-06-01
TW552623B (en) 2003-09-11
US20030048444A1 (en) 2003-03-13

Similar Documents

Publication Publication Date Title
AU2001279532A1 (en) Method and device for measuring distances
AU2001291608A1 (en) Device and method for measuring angles
AU2002224949A1 (en) Method and device for measuring levels
AU2001251028A1 (en) Force measuring device and method
AU2001279795A1 (en) Measuring device and measuring method for determining distance and/or position
AU2001243298A1 (en) Apparatus and method for determining position
AU2001261098A1 (en) Methods and apparatus for spectroscopic calibration model transfer
AU2001297667A1 (en) Impact and roll measurement device
AU2001251237A1 (en) Area measurement device and method
AU2001267837A1 (en) Integrated sensor device and measuring system using the same
AU2001253052A1 (en) Devices and methods for cervix measurement
AU2001232256A1 (en) Position measuring apparatus and aligner
AU2553801A (en) Sir measuring device and sir measuring method
AU2001269464A1 (en) Pupil measuring device
AU2002221607A1 (en) Pmd -emulation, measurement and compensating device
AU2001288438A1 (en) Force measuring apparatus
AU3584101A (en) Test apparatus
AU2002221785A1 (en) Method and device for determining position
AU2001248369A1 (en) Method and device for measuring vital parameters
AU2002222596A1 (en) Position measuring method, exposure method and system thereof, device productionmethod
AU2002243285A1 (en) Auxiliary metering apparatus and methods
AU1864401A (en) Measuring device
AU2001278617A1 (en) Measuring device
AU2001215504A1 (en) Shape measuring method and apparatus
AU5800100A (en) Method and device for measuring distance