AU2000268956A1 - Fluorinated solvent compositions containing ozone - Google Patents
Fluorinated solvent compositions containing ozoneInfo
- Publication number
- AU2000268956A1 AU2000268956A1 AU2000268956A AU6895600A AU2000268956A1 AU 2000268956 A1 AU2000268956 A1 AU 2000268956A1 AU 2000268956 A AU2000268956 A AU 2000268956A AU 6895600 A AU6895600 A AU 6895600A AU 2000268956 A1 AU2000268956 A1 AU 2000268956A1
- Authority
- AU
- Australia
- Prior art keywords
- compositions containing
- fluorinated solvent
- containing ozone
- solvent compositions
- ozone
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000000203 mixture Substances 0.000 title abstract 3
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 title abstract 2
- 239000002904 solvent Substances 0.000 title abstract 2
- 238000004140 cleaning Methods 0.000 abstract 1
- 239000006184 cosolvent Substances 0.000 abstract 1
- 230000001590 oxidative effect Effects 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/39—Organic or inorganic per-compounds
- C11D3/3947—Liquid compositions
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/02—Inorganic compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/50—Solvents
- C11D7/5004—Organic solvents
- C11D7/5018—Halogenated solvents
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02082—Cleaning product to be cleaned
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/263—Ethers
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/264—Aldehydes; Ketones; Acetals or ketals
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/265—Carboxylic acids or salts thereof
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/266—Esters or carbonates
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3263—Amides or imides
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3281—Heterocyclic compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S134/00—Cleaning and liquid contact with solids
- Y10S134/902—Semiconductor wafer
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Organic Chemistry (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- Detergent Compositions (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
A homogeneous non-aqueous composition containing a fluorinated solvent, ozone, and optionally a co-solvent and the use of these compositions for cleaning and oxidizing substrates is described.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/540,590 US6372700B1 (en) | 2000-03-31 | 2000-03-31 | Fluorinated solvent compositions containing ozone |
US09540590 | 2000-03-31 | ||
PCT/US2000/021598 WO2001074985A1 (en) | 2000-03-31 | 2000-08-08 | Fluorinated solvent compositions containing ozone |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2000268956A1 true AU2000268956A1 (en) | 2001-10-15 |
Family
ID=24156103
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2000268956A Abandoned AU2000268956A1 (en) | 2000-03-31 | 2000-08-08 | Fluorinated solvent compositions containing ozone |
Country Status (9)
Country | Link |
---|---|
US (2) | US6372700B1 (en) |
EP (1) | EP1268734B1 (en) |
JP (1) | JP4532806B2 (en) |
KR (1) | KR100728845B1 (en) |
AT (1) | ATE280214T1 (en) |
AU (1) | AU2000268956A1 (en) |
DE (1) | DE60015190T2 (en) |
TW (1) | TWI254075B (en) |
WO (1) | WO2001074985A1 (en) |
Families Citing this family (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6552090B1 (en) * | 1997-09-15 | 2003-04-22 | 3M Innovative Properties Company | Perfluoroalkyl haloalkyl ethers and compositions and applications thereof |
US6372700B1 (en) * | 2000-03-31 | 2002-04-16 | 3M Innovative Properties Company | Fluorinated solvent compositions containing ozone |
TWI259202B (en) * | 2000-06-01 | 2006-08-01 | Asahi Kasei Corp | Cleaning method and cleaning apparatus |
US6678082B2 (en) | 2001-09-12 | 2004-01-13 | Harris Corporation | Electro-optical component including a fluorinated poly(phenylene ether ketone) protective coating and related methods |
JP3914842B2 (en) * | 2001-10-23 | 2007-05-16 | 有限会社ユーエムエス | Method and apparatus for removing organic coating |
DE10229041A1 (en) * | 2002-06-28 | 2004-01-22 | Solvay Fluor Und Derivate Gmbh | Production of homogeneous gas mixtures |
JP4434950B2 (en) * | 2002-08-22 | 2010-03-17 | ダイキン工業株式会社 | Stripping solution |
US7087805B2 (en) * | 2002-10-22 | 2006-08-08 | Steris Inc. | Use of an ozone containing fluid to neutralize chemical and/or biological warfare agents |
US8517795B2 (en) * | 2002-11-06 | 2013-08-27 | Nomura Plating Co., Ltd. | Surface treatment method for vacuum member |
US20040117918A1 (en) * | 2002-12-11 | 2004-06-24 | The Procter & Gamble Company | Fluorine-containing solvents and compositions and methods employing same |
US6858124B2 (en) | 2002-12-16 | 2005-02-22 | 3M Innovative Properties Company | Methods for polishing and/or cleaning copper interconnects and/or film and compositions therefor |
US6884338B2 (en) | 2002-12-16 | 2005-04-26 | 3M Innovative Properties Company | Methods for polishing and/or cleaning copper interconnects and/or film and compositions therefor |
US7147767B2 (en) | 2002-12-16 | 2006-12-12 | 3M Innovative Properties Company | Plating solutions for electrochemical or chemical deposition of copper interconnects and methods therefor |
KR101026095B1 (en) * | 2003-06-27 | 2011-03-31 | 아사히 가라스 가부시키가이샤 | Cleaning/rinsing method |
US20050106774A1 (en) * | 2003-11-13 | 2005-05-19 | Dmitri Simonian | Surface processes in fabrications of microstructures |
US7071154B2 (en) * | 2003-12-18 | 2006-07-04 | 3M Innovative Properties Company | Azeotrope-like compositions and their use |
JP2005217262A (en) * | 2004-01-30 | 2005-08-11 | Matsushita Electric Ind Co Ltd | Method for manufacturing compound semiconductor device |
KR100627139B1 (en) * | 2004-06-18 | 2006-09-25 | 한국전자통신연구원 | Micromechanical structures and Method thereof |
JP4559250B2 (en) * | 2005-02-16 | 2010-10-06 | シチズンファインテックミヨタ株式会社 | Actuator and manufacturing method thereof |
JP2006278966A (en) * | 2005-03-30 | 2006-10-12 | Toshiba Corp | Semiconductor manufacturing system |
US20070129273A1 (en) * | 2005-12-07 | 2007-06-07 | Clark Philip G | In situ fluoride ion-generating compositions and uses thereof |
JP4803821B2 (en) | 2007-03-23 | 2011-10-26 | 大日本スクリーン製造株式会社 | Substrate processing equipment |
JP2010529670A (en) * | 2007-06-07 | 2010-08-26 | レール・リキード−ソシエテ・アノニム・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード | Non-flammable solvents for semiconductor applications |
US8071816B2 (en) * | 2008-06-30 | 2011-12-06 | 3M Innovative Properties Company | Hydrofluoroacetal compounds and processes for their preparation and use |
TWI558876B (en) * | 2010-07-05 | 2016-11-21 | 大陽日酸股份有限公司 | Surface oxidation treatment method and surface oxidation treatment apparatus |
US20120039796A1 (en) * | 2010-08-15 | 2012-02-16 | Demetrios Markou | Novel method for creating, suspending and stabilizing electronically modified oxygen derivatives, along with creating, suspending and stabilizing electronically modified reaction intermediates, in a bio compatible fluorocarbon suspension, for the purpose of inducing a cascading immune response in mammalian patients |
JP5862353B2 (en) * | 2011-08-05 | 2016-02-16 | 東京エレクトロン株式会社 | Manufacturing method of semiconductor device |
JP5630679B1 (en) * | 2013-09-08 | 2014-11-26 | 株式会社E・テック | Volatile disinfectant and method for producing volatile disinfectant |
US9321635B2 (en) * | 2013-11-28 | 2016-04-26 | Solid State System Co., Ltd. | Method to release diaphragm in MEMS device |
JP2016164977A (en) * | 2015-02-27 | 2016-09-08 | キヤノン株式会社 | Nanoimprint liquid material, method for manufacturing nanoimprint liquid material, method for manufacturing hardened material pattern, method for manufacturing optical component, method for manufacturing circuit board, and method for manufacturing electronic component |
CN109642159B (en) * | 2016-03-24 | 2022-02-15 | 安万托特性材料有限公司 | Non-aqueous tungsten compatible metal nitride selective etchants and cleaners |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3235335A (en) * | 1958-01-30 | 1966-02-15 | Olin Mathieson | Stabilized liquid ozone |
DE1298514B (en) | 1965-12-02 | 1969-07-03 | Hoechst Ag | Process for the preparation of perfluoroalkyl-alkyl-ethers |
FR2287432A1 (en) | 1974-10-10 | 1976-05-07 | Poudres & Explosifs Ste Nale | Fluoroethers from silver fluoride complexes - used as hypnotics and anaesthetics, in prepn. of thermostable polymers, and as plant protection agents |
US4182663A (en) | 1978-03-13 | 1980-01-08 | Vaseen Vesper A | Converting oxygen to ozone by U.V. radiation of a halogen saturated hydrocarbon liquid containing dissolved or absorbed oxygen |
JP3016301B2 (en) * | 1992-04-15 | 2000-03-06 | 三菱電機株式会社 | Cleaning method |
JP2589930B2 (en) | 1993-03-05 | 1997-03-12 | 工業技術院長 | Methyl 1,1,2,2,3,3-hexafluoropropyl ether, method for producing the same, and detergent containing the same |
JP2551522B2 (en) * | 1993-06-29 | 1996-11-06 | 株式会社白洋舎 | Bleaching / deodorizing / sterilizing method |
US5658962A (en) | 1994-05-20 | 1997-08-19 | Minnesota Mining And Manufacturing Company | Omega-hydrofluoroalkyl ethers, precursor carboxylic acids and derivatives thereof, and their preparation and application |
US5603750A (en) | 1995-08-14 | 1997-02-18 | Minnesota Mining And Manufacturing Company | Fluorocarbon fluids as gas carriers to aid in precious and base metal heap leaching operations |
DE69620642T2 (en) * | 1995-12-15 | 2002-11-28 | Minnesota Mining And Mfg. Co., Saint Paul | CLEANING PROCEDURE AND COMPOSITION |
US5750797A (en) | 1996-04-15 | 1998-05-12 | Minnesota Mining And Manufacturing Company | Process for the production of hydrofluoroethers |
DE19701971C1 (en) | 1997-01-22 | 1998-11-26 | Invent Gmbh Entwicklung Neuer Technologien | Method and device for cleaning substrate surfaces |
US5882425A (en) | 1997-01-23 | 1999-03-16 | Semitool, Inc. | Composition and method for passivation of a metallization layer of a semiconductor circuit after metallization etching |
US6552090B1 (en) | 1997-09-15 | 2003-04-22 | 3M Innovative Properties Company | Perfluoroalkyl haloalkyl ethers and compositions and applications thereof |
CA2303979A1 (en) | 1997-09-23 | 1999-04-01 | Gary W. Ferrell | Improved chemical drying and cleaning system |
US6046368A (en) | 1998-03-17 | 2000-04-04 | 3M Innovative Properties Company | Catalytic process for making hydrofluoroethers |
US5914003A (en) | 1998-06-09 | 1999-06-22 | Mach I, Inc. | Cellulose oxidation |
JP4107720B2 (en) * | 1998-07-07 | 2008-06-25 | スリーエム カンパニー | Method for cleaning contaminants in semiconductor manufacturing equipment |
US6297308B1 (en) * | 1999-10-07 | 2001-10-02 | 3M Innovative Properties Company | Chemical compositions |
US6310018B1 (en) * | 2000-03-31 | 2001-10-30 | 3M Innovative Properties Company | Fluorinated solvent compositions containing hydrogen fluoride |
US6372700B1 (en) * | 2000-03-31 | 2002-04-16 | 3M Innovative Properties Company | Fluorinated solvent compositions containing ozone |
-
2000
- 2000-03-31 US US09/540,590 patent/US6372700B1/en not_active Expired - Lifetime
- 2000-08-08 AT AT00957319T patent/ATE280214T1/en not_active IP Right Cessation
- 2000-08-08 WO PCT/US2000/021598 patent/WO2001074985A1/en active IP Right Grant
- 2000-08-08 KR KR1020027012923A patent/KR100728845B1/en not_active IP Right Cessation
- 2000-08-08 AU AU2000268956A patent/AU2000268956A1/en not_active Abandoned
- 2000-08-08 EP EP00957319A patent/EP1268734B1/en not_active Expired - Lifetime
- 2000-08-08 JP JP2001572661A patent/JP4532806B2/en not_active Expired - Fee Related
- 2000-08-08 DE DE60015190T patent/DE60015190T2/en not_active Expired - Lifetime
-
2001
- 2001-03-12 TW TW090105710A patent/TWI254075B/en not_active IP Right Cessation
-
2002
- 2002-01-07 US US10/041,924 patent/US6537380B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
WO2001074985A1 (en) | 2001-10-11 |
US20020107160A1 (en) | 2002-08-08 |
KR100728845B1 (en) | 2007-06-14 |
DE60015190T2 (en) | 2006-03-09 |
JP4532806B2 (en) | 2010-08-25 |
JP2003529925A (en) | 2003-10-07 |
KR20020081595A (en) | 2002-10-28 |
TWI254075B (en) | 2006-05-01 |
DE60015190D1 (en) | 2004-11-25 |
US6372700B1 (en) | 2002-04-16 |
US6537380B2 (en) | 2003-03-25 |
ATE280214T1 (en) | 2004-11-15 |
EP1268734B1 (en) | 2004-10-20 |
EP1268734A1 (en) | 2003-01-02 |
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