AU1373399A - Priming composition for bonding photoresists on substrates - Google Patents

Priming composition for bonding photoresists on substrates

Info

Publication number
AU1373399A
AU1373399A AU13733/99A AU1373399A AU1373399A AU 1373399 A AU1373399 A AU 1373399A AU 13733/99 A AU13733/99 A AU 13733/99A AU 1373399 A AU1373399 A AU 1373399A AU 1373399 A AU1373399 A AU 1373399A
Authority
AU
Australia
Prior art keywords
photoresists
substrates
bonding
priming composition
priming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU13733/99A
Inventor
Andrew Michael Thompson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of AU1373399A publication Critical patent/AU1373399A/en
Abandoned legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
AU13733/99A 1998-11-12 1998-11-12 Priming composition for bonding photoresists on substrates Abandoned AU1373399A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US1998/023243 WO2000029907A1 (en) 1998-11-12 1998-11-12 Priming composition for bonding photoresists on substrates

Publications (1)

Publication Number Publication Date
AU1373399A true AU1373399A (en) 2000-06-05

Family

ID=22268211

Family Applications (1)

Application Number Title Priority Date Filing Date
AU13733/99A Abandoned AU1373399A (en) 1998-11-12 1998-11-12 Priming composition for bonding photoresists on substrates

Country Status (5)

Country Link
EP (1) EP1129390A1 (en)
JP (1) JP2002530697A (en)
AU (1) AU1373399A (en)
CA (1) CA2349578A1 (en)
WO (1) WO2000029907A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8476099B2 (en) 2010-07-22 2013-07-02 International Business Machines Corporation Methods for improved adhesion of protective layers of imager microlens structures by forming an interfacial region
ES2617778T3 (en) * 2010-09-02 2017-06-19 Qiagen Gmbh Method for isolating a target nucleic acid that includes small, high yield target nucleic acids

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4060656A (en) * 1973-04-02 1977-11-29 Teijin Limited Support for photosensitive resin
JPS5837532B2 (en) * 1973-04-02 1983-08-17 帝人株式会社 Kankoseijiyushuyoushijiban
JPS52106736A (en) * 1976-03-04 1977-09-07 Hitachi Ltd Copying paper for electronic photography
US4483913A (en) * 1983-07-18 1984-11-20 Polychrome Corporation Planographic printing plate
JPS60186835A (en) * 1984-03-06 1985-09-24 Toyobo Co Ltd Photosensitive laminate
US4732858A (en) * 1986-09-17 1988-03-22 Brewer Science, Inc. Adhesion promoting product and process for treating an integrated circuit substrate
US4950583A (en) * 1986-09-17 1990-08-21 Brewer Science Inc. Adhesion promoting product and process for treating an integrated circuit substrate therewith
JPH0682214B2 (en) * 1986-12-26 1994-10-19 東レ株式会社 Waterless planographic printing plate
JPH0740133B2 (en) * 1987-02-17 1995-05-01 富士写真フイルム株式会社 No dampening water required Photosensitive lithographic printing plate
JPH043066A (en) * 1990-04-20 1992-01-08 Fuji Photo Film Co Ltd Transfer recording medium
JPH0493840A (en) * 1990-08-03 1992-03-26 Konica Corp Dampening waterless photosensitive planographic printing plate
DE4239661A1 (en) * 1992-11-26 1994-06-01 Basf Lacke & Farben Photosensitive recording material
US5425805A (en) * 1994-03-02 1995-06-20 Scitex Digital Printing, Inc. Waterfast dyes for ink jet recording fluids
DE4423140A1 (en) * 1994-07-01 1996-01-04 Hoechst Ag Hydrophilized carrier material and recording material produced therewith
JPH11344803A (en) * 1998-05-29 1999-12-14 Cycolor System Kk Material and method for dry image forming
JP3852889B2 (en) * 1998-09-24 2006-12-06 富士写真フイルム株式会社 Anti-reflective coating material composition for photoresist

Also Published As

Publication number Publication date
JP2002530697A (en) 2002-09-17
WO2000029907A1 (en) 2000-05-25
EP1129390A1 (en) 2001-09-05
CA2349578A1 (en) 2000-05-25

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Legal Events

Date Code Title Description
TH Corrigenda

Free format text: FT="IN" VOL 13, NO 27, PAGE(S) 4082-4084 UNDER THE HEADING APPLICATIONS LAPSED, REFUSED OR WITHDRAWN PLEASE DELETE ALL REFERENCE TO APPLICATION NO. 13733/99

MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase