AU1241401A - Method and radiation generating system using microtargets - Google Patents

Method and radiation generating system using microtargets

Info

Publication number
AU1241401A
AU1241401A AU12414/01A AU1241401A AU1241401A AU 1241401 A AU1241401 A AU 1241401A AU 12414/01 A AU12414/01 A AU 12414/01A AU 1241401 A AU1241401 A AU 1241401A AU 1241401 A AU1241401 A AU 1241401A
Authority
AU
Australia
Prior art keywords
microtargets
generating system
radiation generating
radiation
generating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU12414/01A
Inventor
John H. Carosella
Richard M. Foster
James H. Morris
Carey A. Pico
Michael F. Powers
I. C. Edmond Turcu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JMAR Research Inc
Original Assignee
JMAR Research Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JMAR Research Inc filed Critical JMAR Research Inc
Publication of AU1241401A publication Critical patent/AU1241401A/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H6/00—Targets for producing nuclear reactions
AU12414/01A 1999-10-27 2000-10-27 Method and radiation generating system using microtargets Abandoned AU1241401A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US16189199P 1999-10-27 1999-10-27
US60161891 1999-10-27
PCT/US2000/029743 WO2001031678A1 (en) 1999-10-27 2000-10-27 Method and radiation generating system using microtargets

Publications (1)

Publication Number Publication Date
AU1241401A true AU1241401A (en) 2001-05-08

Family

ID=22583229

Family Applications (1)

Application Number Title Priority Date Filing Date
AU12414/01A Abandoned AU1241401A (en) 1999-10-27 2000-10-27 Method and radiation generating system using microtargets

Country Status (4)

Country Link
EP (1) EP1232516A4 (en)
JP (1) JP2003513418A (en)
AU (1) AU1241401A (en)
WO (1) WO2001031678A1 (en)

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US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
IT1316249B1 (en) * 2000-12-01 2003-04-03 Enea Ente Nuove Tec PROCEDURE FOR THE REDUCTION OF ION FLOW AND SMALL DETRITATION IN SOFT X-RAY SOURCES FROM PLASMA, THROUGH THE USE OF KRIPTON.
US6714624B2 (en) * 2001-09-18 2004-03-30 Euv Llc Discharge source with gas curtain for protecting optics from particles
US8653437B2 (en) 2010-10-04 2014-02-18 Cymer, Llc EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods
JP2010182698A (en) * 2002-04-10 2010-08-19 Cymer Inc Extreme ultraviolet light source
US7460646B2 (en) * 2003-03-18 2008-12-02 Koninklijke Philips Electronics N.V. Device for and method of generating extreme ultraviolet and/or soft-x-ray radiation by means of a plasma
US7521702B2 (en) 2003-03-26 2009-04-21 Osaka University Extreme ultraviolet light source and extreme ultraviolet light source target
US7164144B2 (en) * 2004-03-10 2007-01-16 Cymer Inc. EUV light source
JP4337648B2 (en) 2004-06-24 2009-09-30 株式会社ニコン EUV LIGHT SOURCE, EUV EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
US7741616B2 (en) 2004-06-24 2010-06-22 Nikon Corporation EUV light source, EUV exposure equipment, and semiconductor device manufacturing method
FR2874785B1 (en) * 2004-08-27 2006-12-01 Commissariat Energie Atomique METHOD AND DEVICE FOR GENERATING RADIATION OR PARTICLES BY INTERACTING BETWEEN A LASER BEAM AND A TARGET
JP2006128157A (en) * 2004-10-26 2006-05-18 Komatsu Ltd Driver laser system for extremely ultraviolet optical source apparatus
WO2006064592A1 (en) * 2004-12-17 2006-06-22 Osaka University Target for extreme ultraviolet light and x-ray source and process for producing the same
JP2006202671A (en) * 2005-01-24 2006-08-03 Ushio Inc Extreme ultraviolet ray light source device and removing method of debris generated therein
JP4710463B2 (en) * 2005-07-21 2011-06-29 ウシオ電機株式会社 Extreme ultraviolet light generator
US8901521B2 (en) 2007-08-23 2014-12-02 Asml Netherlands B.V. Module and method for producing extreme ultraviolet radiation
NL1035846A1 (en) * 2007-08-23 2009-02-24 Asml Netherlands Bv Radiation source.
US7763871B2 (en) 2008-04-02 2010-07-27 Asml Netherlands B.V. Radiation source
DE102007056872A1 (en) * 2007-11-26 2009-05-28 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Berlin Radiation generation by laser irradiation of a free droplet target
WO2009142669A2 (en) * 2007-12-28 2009-11-26 Gregory Piefer High energy proton or neutron source
EP2294582B1 (en) 2008-05-02 2018-08-15 Shine Medical Technologies, Inc. Device and method for producing medical isotopes
JP5576079B2 (en) * 2008-09-29 2014-08-20 ギガフォトン株式会社 Extreme ultraviolet light source device
JP2010103499A (en) * 2008-09-29 2010-05-06 Komatsu Ltd Extreme ultraviolet light source apparatus and method for generating extreme ultraviolet light
DE102009020776B4 (en) * 2009-05-08 2011-07-28 XTREME technologies GmbH, 37077 Arrangement for the continuous production of liquid tin as emitter material in EUV radiation sources
JP5574470B2 (en) * 2009-06-12 2014-08-20 国立大学法人 宮崎大学 Extreme ultraviolet light source and method for generating extreme ultraviolet light
EP2513640B1 (en) 2009-12-15 2020-02-05 Phoenix, LLC Method and apparatus for performing active neutron interrogation of containers
WO2012003009A2 (en) 2010-01-28 2012-01-05 Shine Medical Technologies, Inc. Segmented reaction chamber for radioisotope production
JP5075951B2 (en) * 2010-07-16 2012-11-21 ギガフォトン株式会社 Extreme ultraviolet light source device and driver laser system
US10734126B2 (en) 2011-04-28 2020-08-04 SHINE Medical Technologies, LLC Methods of separating medical isotopes from uranium solutions
JP5881345B2 (en) * 2011-09-13 2016-03-09 ギガフォトン株式会社 Extreme ultraviolet light generator
RU2649662C2 (en) 2012-04-05 2018-04-05 Шайн Медикал Текнолоджиз, Инк. Aqueous assembly and control method
JP6014760B2 (en) * 2013-03-04 2016-10-25 中国科学院近代物理研究所 Target device used in neutron generator, accelerator driven neutron generator and beam combining method thereof
US9699876B2 (en) * 2013-03-14 2017-07-04 Asml Netherlands, B.V. Method of and apparatus for supply and recovery of target material
DE102013209447A1 (en) * 2013-05-22 2014-11-27 Siemens Aktiengesellschaft X-ray source and method for generating X-ray radiation
US10237960B2 (en) 2013-12-02 2019-03-19 Asml Netherlands B.V. Apparatus for and method of source material delivery in a laser produced plasma EUV light source
US9301382B2 (en) * 2013-12-02 2016-03-29 Asml Netherlands B.V. Apparatus for and method of source material delivery in a laser produced plasma EUV light source
US10192711B2 (en) * 2014-07-17 2019-01-29 Siemens Aktiengesellschaft Fluid injector for X-ray tubes and method to provide a liquid anode by liquid metal injection
JP5964400B2 (en) * 2014-12-04 2016-08-03 ギガフォトン株式会社 Extreme ultraviolet light source device and its target supply system
DE102014226814B4 (en) 2014-12-22 2023-05-11 Siemens Healthcare Gmbh metal beam x-ray tube
GB201522590D0 (en) * 2015-12-22 2016-02-03 Sck Cen Target assembly for generation of radioactive isotopes
US10310380B2 (en) 2016-12-07 2019-06-04 Taiwan Semiconductor Manufacturing Co., Ltd. High-brightness light source
US10395881B2 (en) 2017-10-11 2019-08-27 HIL Applied Medical, Ltd. Systems and methods for providing an ion beam
US10847340B2 (en) 2017-10-11 2020-11-24 HIL Applied Medical, Ltd. Systems and methods for directing an ion beam using electromagnets
KR102430082B1 (en) * 2020-03-13 2022-08-04 경희대학교 산학협력단 Extreme ultraviolet light source using eletron beam
DE102021004714A1 (en) 2021-08-23 2023-02-23 Hochschule Mittweida (FH), Körperschaft des öffentlichen Rechts Device for influencing the X-ray emission during laser material processing of a workpiece using a laser
WO2023128856A1 (en) * 2021-12-29 2023-07-06 Innovicum Technology Ab Particle based x-ray source
US11882642B2 (en) 2021-12-29 2024-01-23 Innovicum Technology Ab Particle based X-ray source

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Publication number Priority date Publication date Assignee Title
EP0186491B1 (en) * 1984-12-26 1992-06-17 Kabushiki Kaisha Toshiba Apparatus for producing soft x-rays using a high energy beam
GB2195070B (en) * 1986-09-11 1991-04-03 Hoya Corp Laser plasma x-ray generator capable of continuously generating x-rays
US4953191A (en) * 1989-07-24 1990-08-28 The United States Of America As Represented By The United States Department Of Energy High intensity x-ray source using liquid gallium target
US5052034A (en) * 1989-10-30 1991-09-24 Siemens Aktiengesellschaft X-ray generator
US5459771A (en) * 1994-04-01 1995-10-17 University Of Central Florida Water laser plasma x-ray point source and apparatus
US5577092A (en) * 1995-01-25 1996-11-19 Kublak; Glenn D. Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources
JPH10221499A (en) * 1997-02-07 1998-08-21 Hitachi Ltd Laser plasma x-ray source and device and method for exposing semiconductor using the same
US6285743B1 (en) * 1998-09-14 2001-09-04 Nikon Corporation Method and apparatus for soft X-ray generation
FR2799667B1 (en) * 1999-10-18 2002-03-08 Commissariat Energie Atomique METHOD AND DEVICE FOR GENERATING A DENSE FOG OF MICROMETRIC AND SUBMICROMETRIC DROPLETS, APPLICATION TO THE GENERATION OF LIGHT IN EXTREME ULTRAVIOLET IN PARTICULAR FOR LITHOGRAPHY

Also Published As

Publication number Publication date
EP1232516A1 (en) 2002-08-21
JP2003513418A (en) 2003-04-08
WO2001031678A1 (en) 2001-05-03
EP1232516A4 (en) 2003-03-12

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase