ATE551624T1 - Kompensation und/oder variation von auf wafern produzierten linsen und daraus resultierenden strukturen - Google Patents

Kompensation und/oder variation von auf wafern produzierten linsen und daraus resultierenden strukturen

Info

Publication number
ATE551624T1
ATE551624T1 AT01946677T AT01946677T ATE551624T1 AT E551624 T1 ATE551624 T1 AT E551624T1 AT 01946677 T AT01946677 T AT 01946677T AT 01946677 T AT01946677 T AT 01946677T AT E551624 T1 ATE551624 T1 AT E551624T1
Authority
AT
Austria
Prior art keywords
micro
compensation
array
wafers
variation
Prior art date
Application number
AT01946677T
Other languages
English (en)
Inventor
James Morris
Michael Feldman
Original Assignee
Digitaloptics Corp East
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Digitaloptics Corp East filed Critical Digitaloptics Corp East
Application granted granted Critical
Publication of ATE551624T1 publication Critical patent/ATE551624T1/de

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/005—Arrays characterized by the distribution or form of lenses arranged along a single direction only, e.g. lenticular sheets
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0062—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between
    • G02B3/0068—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between arranged in a single integral body or plate, e.g. laminates or hybrid structures with other optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4205—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant
    • G02B27/4211—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant correcting chromatic aberrations
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1876—Diffractive Fresnel lenses; Zone plates; Kinoforms
    • G02B5/189—Structurally combined with optical elements not having diffractive power
    • G02B5/1895—Structurally combined with optical elements not having diffractive power such optical elements having dioptric power

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Lenses (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
AT01946677T 2001-02-09 2001-06-22 Kompensation und/oder variation von auf wafern produzierten linsen und daraus resultierenden strukturen ATE551624T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US26743201P 2001-02-09 2001-02-09
PCT/US2001/020033 WO2002065165A2 (en) 2001-02-09 2001-06-22 Compensation and/or variation of wafer level produced lenses and resultant structures

Publications (1)

Publication Number Publication Date
ATE551624T1 true ATE551624T1 (de) 2012-04-15

Family

ID=23018745

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01946677T ATE551624T1 (de) 2001-02-09 2001-06-22 Kompensation und/oder variation von auf wafern produzierten linsen und daraus resultierenden strukturen

Country Status (5)

Country Link
US (2) US6836612B2 (de)
EP (1) EP1362247B1 (de)
AT (1) ATE551624T1 (de)
CA (1) CA2439233C (de)
WO (1) WO2002065165A2 (de)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7388714B2 (en) * 2002-09-18 2008-06-17 Dmetrix, Inc. Independent focus compensation for a multi-axis imaging system
TWI230834B (en) * 2003-12-31 2005-04-11 Ind Tech Res Inst High-transmissivity polarizing module constituted with sub-wavelength structure
JP2008519289A (ja) * 2004-09-14 2008-06-05 シーディーエム オプティックス， インコーポレイテッド 低い高さのイメージングシステムおよび関連方法
US9158855B2 (en) * 2005-06-16 2015-10-13 Buzzmetrics, Ltd Extracting structured data from weblogs
KR20100009056A (ko) * 2008-07-17 2010-01-27 삼성전자주식회사 프린트 헤드 및 이를 채용한 화상형성장치
WO2010074743A1 (en) 2008-12-22 2010-07-01 Tessera North America, Inc. Focus compensation for thin cameras
US8885257B2 (en) * 2009-10-20 2014-11-11 Flir Systems Trading Belgium Bvba Focus compensation for optical elements and applications thereof
US8848301B2 (en) 2009-10-20 2014-09-30 Flir Systems Trading Belgium Bvba Focus compensation for optical elements and applications thereof
EP2606391B1 (de) 2010-08-17 2021-07-07 Heptagon Micro Optics Pte. Ltd. Verfahren zur herstellung mehrerer optischer vorrichtungen für kameras
KR101131782B1 (ko) 2011-07-19 2012-03-30 디지털옵틱스 코포레이션 이스트 집적 모듈용 기판
US10444477B2 (en) * 2011-08-25 2019-10-15 Ams Sensors Singapore Pte. Ltd. Wafer-level fabrication of optical devices with front focal length correction
CN102891155B (zh) * 2012-09-27 2015-08-19 豪威科技(上海)有限公司 用于制作镜头的晶圆级贴合方法
US9595553B2 (en) * 2012-11-02 2017-03-14 Heptagon Micro Optics Pte. Ltd. Optical modules including focal length adjustment and fabrication of the optical modules
CN105579902B (zh) * 2013-09-23 2019-06-28 Lg伊诺特有限公司 一种制造相机模块的方法
WO2015050499A1 (en) * 2013-10-01 2015-04-09 Heptagon Micro Optics Pte. Ltd. Lens array modules and wafer-level techniques for fabricating the same
US11137246B2 (en) * 2019-01-31 2021-10-05 Himax Technologies Limited Optical device
WO2021153629A1 (ja) * 2020-01-30 2021-08-05 古河電気工業株式会社 光モジュールおよび光学装置
CN113933922A (zh) * 2021-10-22 2022-01-14 中国科学院光电技术研究所 用于高分辨率成像的超薄复合材料衍射透镜及其制备方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6232520A (ja) 1985-08-05 1987-02-12 Hitachi Ltd 送水系システムの流量配分制御方法
JPH058441A (ja) * 1991-06-29 1993-01-19 Kyocera Corp 画像装置
US5444572A (en) * 1992-11-27 1995-08-22 Lockheed Missiles & Space Company, Inc. Wavefront corrector for scanning microlens arrays
US6124974A (en) * 1996-01-26 2000-09-26 Proxemics Lenslet array systems and methods
US20020019305A1 (en) * 1996-10-31 2002-02-14 Che-Kuang Wu Gray scale all-glass photomasks
US6562523B1 (en) * 1996-10-31 2003-05-13 Canyon Materials, Inc. Direct write all-glass photomask blanks
JPH10270672A (ja) * 1997-03-25 1998-10-09 Sony Corp 固体撮像素子
US20030227684A1 (en) * 2002-01-09 2003-12-11 Akihiro Goto Diffractive optical element, refractive optical element, illuminating optical apparatus, exposure apparatus and exposure method

Also Published As

Publication number Publication date
WO2002065165A2 (en) 2002-08-22
US6934460B2 (en) 2005-08-23
US6836612B2 (en) 2004-12-28
EP1362247B1 (de) 2012-03-28
CA2439233A1 (en) 2002-08-22
WO2002065165A3 (en) 2003-02-27
EP1362247A2 (de) 2003-11-19
US20050047748A1 (en) 2005-03-03
US20040165823A1 (en) 2004-08-26
CA2439233C (en) 2008-02-05

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